Dr. Gottlieb S. Oehrlein Profile

Dr. Gottlieb S. Oehrlein

at Univ of Mayland College Park

SPIE Involvement:

Author | Editor

Publications (5)

Proceedings Article | 26 March 2019 Paper

Oxygen effects in thin films for high-resolution , 3-color lithography

Sandra Gutierrez Razo, Nikolaos Liaros, Adam Pranda, Gottlieb Oehrlein, John Fourkas, John Petersen

Proceedings Volume 10958, 1095814 (2019) https://doi.org/10.1117/12.2516544

KEYWORDS: Oxygen, Thin films, Photoresist materials, Polymerization, Lithography, Optical lithography, Glasses, Bioalcohols, Visible radiation, Water

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Proceedings Article | 19 March 2018 Paper

The state of the art in multicolor visible photolithography

Nikolaos Liaros, Zuleykhan Tomova, Sandra Gutierrez Razo, Samuel Cohen, John Fourkas, Steven Wolf, Matthew Thum, Daniel Falvey, Hannah Ogden, Amy Mullin, Adam Pranda, Gottlieb Oehrlein, John Petersen

Proceedings Volume 10584, 1058407 (2018) https://doi.org/10.1117/12.2297653

KEYWORDS: Photoresist materials, Optical lithography, Lithography, Thin films, Absorption, Molecules, Microscopy, Stimulated emission depletion microscopy, Etching, Point spread functions

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Proceedings Article | 19 March 2018 Paper

Thin films for high-resolution, 3-color lithography

Sandra Gutierrez Razo, Adam Pranda, Nikolaos Liaros, Samuel Cohen, John Fourkas, Gottlieb Oehrlein, Hannah Ogden, Amy Mullin, Steven Wolf, Daniel Falvey, John Petersen

Proceedings Volume 10584, 1058418 (2018) https://doi.org/10.1117/12.2299681

KEYWORDS: Visible radiation, Thin films, Lithography, Semiconducting wafers, Photoresist materials, Silicon, Etching, Optical lithography, Resistance, Plasma

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SPIE Journal Paper | 23 December 2013 Open Access

Special Section Guest Editorial: Advanced Plasma-Etch Technology

Qinghuang Lin, Ying Zhang, Gottlieb Oehrlein

JM3, Vol. 12, Issue 04, 041301, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.041301

KEYWORDS: CMOS technology, Optical lithography, Plasma etching, Etching, Plasma, Semiconductors, Lithography, Extreme ultraviolet, Line edge roughness, Directed self assembly

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