Dr. Guy A. DeRose Profile

Dr. Guy A. DeRose

Assoc Dir of Tech Operations KNI at California Institute of Technology

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 1 May 2023 Presentation + Paper

Enhancing the sensitivity of a high resolution negative-tone metal organic photoresist for extreme ultra violet lithography

Scott Lewis, Hayden Alty, Michaela Vockenhuber, Guy DeRose, Dimitrios Kazazis, Grigore Timco, James Mann, Paul Winpenny, Axel Scherer, Yasin Ekinci, Richard Winpenny

Proceedings Volume 12498, 124980X (2023) https://doi.org/10.1117/12.2658324

KEYWORDS: Extreme ultraviolet lithography, Etching, Electron beam lithography, Monte Carlo methods, Electron beams, Mercury, Silicon, Molecules, Dry etching

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SPIE Journal Paper | 2 June 2022

Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography

Scott Lewis, Hayden Alty, Michaela Vockenhuber, Guy DeRose, Antonio Fernandez Mato, Dimitrios Kazazis, Paul Winpenny, Richard Grindell, Grigore Timco, Axel Scherer, Yasin Ekinci, Richard E. Winpenny

JM3, Vol. 21, Issue 04, 041404, (June 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041404

KEYWORDS: Extreme ultraviolet lithography, Selenium, Electron beam lithography, Monte Carlo methods, Metals, Mercury, Molecules, Chemical species, Photomicroscopy, Absorption

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Proceedings Article | 3 October 2018 Paper

Design and implementation of the next generation electron beam resists for the production of EUVL photomasks

Scott Lewis, Guy DeRose, Hayden Alty, Matthew Hunt, Jarvis Li, Alex Werthiem, Trevor Fowler, Sang Kook Lee, Christopher Muryn, Grigore Timco, Axel Scherer, Stephen Yeates, Richard Winpenny

Proceedings Volume 10810, 108100N (2018) https://doi.org/10.1117/12.2501808

KEYWORDS: Chromium, Silicon, Etching, Molecules, Scattering, Nanostructures, Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Electron beam lithography

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Proceedings Article | 19 January 2005 Paper

Lithographic nanofabrication of optical cavities

Guy DeRose, Marko Loncar, Mark Adams, Michael Hochberg, Axel Scherer

Proceedings Volume 5592, (2005) https://doi.org/10.1117/12.571540

KEYWORDS: Photonic crystals, Refractive index, Optical resonators, Sensors, Lithography, Laser resonators, Spectroscopy, Chemical analysis, Quantum wells, Nanofabrication

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Proceedings Article | 1 June 2004 Paper

Annular Bragg defect mode resonators

Jacob Scheuer, William Green, Guy DeRose, Amnon Yariv

Proceedings Volume 5333, (2004) https://doi.org/10.1117/12.544590

KEYWORDS: Resonators, Reflectors, Luminescence, Refractive index, Reactive ion etching, Optical pumping, Environmental sensing, Bessel functions, Semiconductors, Quantum wells

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Proceedings Article | 10 June 2002 Paper

Fundamental approach for optoelectronic and microfluidic integration for miniaturizing spectroscopic devices

Mark Adams, Guy DeRose, Stephen Quake, Axel Scherer

Proceedings Volume 4647, (2002) https://doi.org/10.1117/12.469818

KEYWORDS: Microfluidics, Imaging systems, Absorption, Spectroscopes, Silicon, Optoelectronic devices, Sensors, Light sources, Optoelectronics, Visible radiation

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Showing 5 of 6 publications

Conference Committee Involvement (1)

Nanofabrication: Technologies, Devices, and Applications II

23 October 2005 | Boston, MA, United States

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