Mr. Hans-Joachim Doering Profile

Hans-Joachim Doering

Senior Scientist at Vistec Electron Beam Lithography Group

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Author

Publications (17)

Proceedings Article | 21 March 2012 Paper

Paper

Optimization of MSB for future technology nodes

Hans-Joachim Doering, Thomas Elster, Matthias Klein, Joachim Heinitz, Marc Schneider, Ulf Weidenmüller, Matthias Slodowski, Ines Stolberg, Wolfgang Dorl

Proceedings Volume 8323, 83232D (2012) https://doi.org/10.1117/12.916394

KEYWORDS: Line width roughness, Stochastic processes, Monte Carlo methods, Distortion, Beam shaping, Photomasks, Optical simulations, Vestigial sideband modulation, Electronics, Error analysis

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In the ITRS roadmap [1] increasingly long mask write and cycle time is explicitly addressed as a difficult challenge in mask fabrication for the 16nm technology node and beyond. Write time reduction demands have to be seen in relation to corresponding performance parameters like Line Width Roughness (LWR), resolution, placement as well as CD Uniformity. The previously presented Multi Shaped Beam (MSB) approach [2, 3] is considered a potential solution for high throughput mask write application. In order to fully adapt the MSB concept to future industry's requirements specific optimizations are planned. The key element for achieving write time reduction is a higher probe current at the target, which can be obtained by increasing the number of beamlets as well as applying a higher current density. In the present paper the approach of a 256 beamlet MSB design will be discussed. For a given image field size along with a beamlet number increase both beamlet pitch and size have to be optimized. Out of previous investigations, one finding was that by changing the demagnification after the beam forming section of the MSB column the overall performance can be optimized. Based on first electron-optical simulations for a new final lens a larger demagnification turned out to be advantageous. Stochastic beam blur simulation results for the MSB reduction optics will be presented. During the exposure of a pattern layout the number of used beams, their shape and their distribution within the image field varies, which can lead to space charge distortion effects. In regard to this MSB simulation results obtained for an image field of approximately 10x10ìm² will be presented. For the 256 beamlet MSB design and resist sensitivities of 20μC/cm², 40μC/cm² and 100μC/cm² write time and LWR simulations have been performed. For MSB pattern data fracturing an optimized algorithm has been used, which increased the beamlet utilization factor (indicates the mean number of beamlets which are used per multi-shot). Finally an update with regard to the required changes of the data path architecture for the 256 beamlet MSB approach will be given. Data integrity as an important aspect of the production worthiness of such a systems will be discussed specifically.

Proceedings Article | 2 April 2011 Paper

Paper

Multi-shaped beam: development status and update on lithography results

Matthias Slodowski, Hans-Joachim Doering, Wolfgang Dorl, Ines Stolberg

Proceedings Volume 7970, 79700E (2011) https://doi.org/10.1117/12.879446

KEYWORDS: Beam shaping, Calibration, Lithography, Photomasks, Vestigial sideband modulation, Electronics, Prototyping, Integrated optics, Sensors, Electron beams

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Proceedings Article | 2 April 2011 Paper

Paper

MSB for ILT masks

Juergen Gramss, Ulf Weidenmueller, Arnd Stoeckel, Renate Jaritz, Hans-Joachim Doering, Monika Boettcher

Proceedings Volume 7985, 798504 (2011) https://doi.org/10.1117/12.896883

KEYWORDS: Photomasks, Vestigial sideband modulation, Beam shaping, Lithography, Optical simulations, Logic devices, Optical proximity correction, Standards development, Statistical analysis, Scanning electron microscopy

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Proceedings Article | 25 September 2010 Paper

Paper

Multi-shaped-beam (MSB): an evolutionary approach for high throughput e-beam lithography

Matthias Slodowski, Hans-Joachim Döring, Ines Stolberg, Wolfgang Dorl

Proceedings Volume 7823, 78231J (2010) https://doi.org/10.1117/12.868977

KEYWORDS: Beam shaping, Vestigial sideband modulation, Electron beam direct write lithography, Electron beam lithography, Semiconducting wafers, Lithography, Photomasks, Electron beams, Microelectromechanical systems, Optical lithography

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Proceedings Article | 25 September 2010 Paper

Paper

Multi-shaped e-beam technology for mask writing

Juergen Gramss, Arnd Stoeckel, Ulf Weidenmueller, Hans-Joachim Doering, Martin Bloecker, Martin Sczyrba, Michael Finken, Timo Wandel, Detlef Melzer

Proceedings Volume 7823, 782309 (2010) https://doi.org/10.1117/12.865708

KEYWORDS: Photomasks, Vestigial sideband modulation, Beam shaping, Metals, Lithography, Electron beam lithography, Optical proximity correction, Source mask optimization, Computational lithography, Integrated optics

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Proceedings Article | 3 April 2010 Paper

Paper

Multi-shaped beam proof of lithography

Matthias Slodowski, Hans-Joachim Doering, Wolfgang Dorl, Ines Stolberg

Proceedings Volume 7637, 763715 (2010) https://doi.org/10.1117/12.846529

KEYWORDS: Beam shaping, Vestigial sideband modulation, Lithography, Electrodes, Calibration, Mask making, Model-based design, Photomasks, Optical proximity correction, Critical dimension metrology

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Proceedings Article | 18 March 2009 Paper

Paper

Optimization of BSE-detector for e-beam direct write lithography

H. Alves, P. Hahmann, M. Slodowski, C. Frase, D. Gnieser, Klaus-Peter Johnsen, H. Bosse

Proceedings Volume 7271, 72712O (2009) https://doi.org/10.1117/12.814156

KEYWORDS: Sensors, Signal to noise ratio, Monte Carlo methods, Signal detection, Lithography, Etching, Scattering, Electron beams, Direct write lithography, Vestigial sideband modulation

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Proceedings Article | 18 March 2009 Paper

Paper

Coulomb blur advantage of a multi-shaped beam lithography approach

Matthias Slodowski, Hans-Joachim Doering, Thomas Elster, Ines Stolberg

Proceedings Volume 7271, 72710Q (2009) https://doi.org/10.1117/12.814113

KEYWORDS: Beam shaping, Stochastic processes, Vestigial sideband modulation, Monte Carlo methods, Lithography, Electron beam lithography, Electron beams, Objectives, Image segmentation, Standards development

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Proceedings Article | 3 May 2007 Paper

Paper

Electron beam direct write: shaped beam overcomes resolution concerns

Ines Stolberg, Laurent Pain, Johannes Kretz, Monika Boettcher, Hans-Joachim Doering, Juergen Gramss, Peter Hahmann

Proceedings Volume 6533, 65330J (2007) https://doi.org/10.1117/12.736974

KEYWORDS: Electron beam direct write lithography, Electron beams, Vestigial sideband modulation, Semiconductors, Prototyping, Manufacturing, Photomasks, Beam shaping, Electron beam lithography, Lithography

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Proceedings Article | 16 June 2005 Paper

Paper

Mask manufacture for projection mask-less lithography (PML2): MEMS-technology for a programmable aperture plate system

K. Reimer, M. Witt, D. Kahler, J. Eichholz, L. Ratzmann, W. Brunger, H.-J, Doring, E. Haugeneder, S. Eder-Kapl, R. Nowak

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637320

KEYWORDS: Electrodes, Semiconducting wafers, Lithography, Silicon, Photomasks, Microsystems, Etching, Manufacturing, Microelectromechanical systems, Optical lithography

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Proceedings Article | 16 June 2005 Paper

Paper

Demonstrators: a vital step forward for projection mask-less lithography (PML2)

Christoph Brandstaetter, Ernst Haugeneder, Hans-Joachim Doering, Thomas Elster, Joachim Heinitz, Olaf Fortagne, Stefan Eder-Kapl, Gertraud Lammer, Peter Jochl, Hans Loeschner, Klaus Reimer, Juergen Saniter, Maati Talmi, Ramona Eberhardt, Klaus Kroenert

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637298

KEYWORDS: Lithography, Semiconducting wafers, Electron beams, Free space optics, Wafer-level optics, Scintillators, Receivers, Channel projecting optics, Imaging systems, Electron beam lithography

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Proceedings Article | 6 May 2005 Paper

Paper

Proof-of-concept tool development for projection mask-less lithography (PML2)

Hans-Joachim Doering, Thomas Elster, Joachim Heinitz, Olaf Fortagne, Christoph Brandstaetter, Ernst Haugeneder, Stefan Eder-Kapl, Gertraud Lammer, Hans Loeschner, Klaus Reimer, Joerg Eichholz, Juergen Saniter

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600458

KEYWORDS: Semiconducting wafers, Lithography, Wafer-level optics, Electronics, Free space optics, Receivers, Electron beams, Electrodes, Manufacturing, Channel projecting optics

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Proceedings Article | 20 May 2004 Paper

Paper

Projection maskless lithography

Christoph Brandstatter, Hans Loeschner, Gerhard Stengl, Gertraud Lammer, Herbert Buschbeck, Elmar Platzgummer, Hans-Joachim Doring, Thomas Elster, Olaf Fortagne

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535412

KEYWORDS: Semiconducting wafers, Wafer-level optics, Lithography, Electron beams, Electrodes, Photomasks, Optics manufacturing, Magnetism, Stochastic processes, Monte Carlo methods

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Proceedings Article | 3 February 2000 Paper

Paper

Advanced writing strategies for high-end mask making

Melchior Lemke, Juergen Gramss, Hans-Joachim Doering, Hans Eichhorn, Gerhard Schubert

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377107

KEYWORDS: Photomasks, Mask making, Beam shaping, Lithography, Data processing, Magnesium, Microsystems, Image registration, Edge roughness, Vestigial sideband modulation

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Proceedings Article | 25 August 1999 Paper

Paper

Mask-writing system architecture and toolkit approach for 1G DRAM and beyond

Christian Ehrlich, Juergen Gramss, Hans-Joachim Doering

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360241

KEYWORDS: Photomasks, Lithography, Reticles, Electron beam lithography, Beam shaping, Manufacturing, Mask making, Metrology, Optical proximity correction, Semiconductors

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Proceedings Article | 25 June 1999 Paper

Paper

Production data from a Leica ZBA31H+ shaped e-beam mask writer located at the Photronics facility, Manchester, England

Stephen Johnson, Dominic Loughran, Peter Osborne, Pierre Sixt, Hans-Joachim Doering

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351124

KEYWORDS: Process control, Optical proximity correction, Photomasks, Raster graphics, Beam shaping, Reticles, Critical dimension metrology, Opacity, Lithography, Etching

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Proceedings Article | 23 April 1999 Paper

Paper

Initial results from a Leica ZBA31H+ shaped E-beam mask writer located at the Photronics Advanced Mask Shop in Manchester, England

Stephen Johnson, Paul Marshall, Peter Osborne, Hans-Joachim Doering, Christian Ehrlich

Proceedings Volume 3665, (1999) https://doi.org/10.1117/12.346229

KEYWORDS: Photomasks, Reticles, Laser applications, Optical proximity correction, Metrology, Edge roughness, Electron beam lithography, Photoresist processing, Plasma, Microsystems

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Showing 5 of 17 publications

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