Mr. Hideo Hata Profile

Hideo Hata

Manager at Canon Inc

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Author

Publications (8)

Proceedings Article | 7 March 2008 Paper

Performance of the FPA-7000AS7 1.35 NA immersion exposure system for 45-nm mass production

Keiji Yoshimura, Hitoshi Nakano, Hideo Hata, Nobuyoshi Deguchi, Masamichi Kobayashi, Takeaki Ebihara, Yoshio Kawanobe, Tsuneo Kanda

Proceedings Volume 6924, 69241O (2008) https://doi.org/10.1117/12.771876

KEYWORDS: Semiconducting wafers, Particles, Distortion, Liquids, Inspection, Bridges, Polarization, Thin film coatings, Scanning probe microscopy, Overlay metrology

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Proceedings Article | 26 March 2007 Paper

Immersion exposure tool for the 45-nm HP mass production

Hiroaki Kubo, Hideo Hata, Fumio Sakai, Nobuyoshi Deguchi, Takehiko Iwanaga, Takeaki Ebihara

Proceedings Volume 6520, 65201X (2007) https://doi.org/10.1117/12.711360

KEYWORDS: Polarization, Semiconducting wafers, Imaging systems, Defect inspection, Refractive index, Overlay metrology, Metrology, Sensors, Optical alignment, Glasses

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Proceedings Article | 15 March 2006 Paper

Development status of a 193-nm immersion exposure tool

Takahito Chibana, Hitoshi Nakano, Hideo Hata, Nobuhiro Kodachi, Naoto Sano, Mikio Arakawa, Yoichi Matsuoka, Youji Kawasaki, Sunao Mori, Keiko Chiba

Proceedings Volume 6154, 61541V (2006) https://doi.org/10.1117/12.657010

KEYWORDS: Contamination, Semiconducting wafers, Transmittance, Immersion lithography, Defect inspection, Water, Liquids, Particles, Laser irradiation, Scanners

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Proceedings Article | 12 May 2005 Paper

Development of ArF immersion exposure tool

Hitoshi Nakano, Hideo Hata, Kazuhiro Takahashi, Mikio Arakawa, Takahito Chibana, Tokuyuki Honda, Keiko Chiba, Sunao Mori

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600492

KEYWORDS: Semiconducting wafers, Water, Contamination, Control systems, Immersion lithography, Scanners, Transmittance, Temperature metrology, Optical lithography, Microfluidics

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Proceedings Article | 28 May 2004 Paper

Evaluation systems of F2 laser lithography materials

Yasuo Itakura, Youichi Kawasa, Keiji Egawa, Akira Sumitani, Hironao Sasaki, Iwao Higasikawa, Shigeo Irie, Kiyoshi Fujii, Toshiro Itani, Hitoshi Nakano, Hideo Hata

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534839

KEYWORDS: Transmittance, Pellicles, Photomasks, Fluorine, Lithography, Laser irradiation, Semiconducting wafers, Vacuum ultraviolet, Contamination, Laser development

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Proceedings Article | 28 May 2004 Paper

Development of 157-nm full-field scanners

Hideo Hata, Hideki Nogawa, Shigeyuki Suda

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537726

KEYWORDS: Projection systems, Birefringence, Lithography, Crystals, Scanners, Combined lens-mirror systems, Wavefront aberrations, Semiconducting wafers, Pellicles, Photoresist processing

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Proceedings Article | 26 June 2003 Paper

Development status of a 157-nm full-field scanner

Hitoshi Nakano, Hideo Hata, Hideki Nogawa, Nobuyoshi Deguchi, Michio Kohno, Yuji Chiba

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485509

KEYWORDS: Projection systems, Semiconducting wafers, Oxygen, Reticles, Optical coatings, Transmittance, Birefringence, Crystals, Scanners, Helium

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Proceedings Article | 30 July 2002 Paper

System design of a 157-nm scanner

Hideki Nogawa, Hideo Hata, Michio Kohno

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474609

KEYWORDS: Projection systems, Birefringence, Crystals, Semiconducting wafers, Scanners, Contamination, Wafer-level optics, Reticles, Pellicles, Optical design

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Showing 5 of 8 publications

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