Dr. Hinderk M. Buss Profile

Dr. Hinderk M. Buss

at SIGMA-C Software AG

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 15 March 2006 Paper

In quest of predictive lithography simulation

Christian Kalus, Hinderk Buß, Peter Brooker

Proceedings Volume 6154, 61541S (2006) https://doi.org/10.1117/12.654770

KEYWORDS: Mathematical modeling, Lithography, Diffusion, Optical lithography, Photoresist materials, Systems modeling, Process modeling, Differential equations, Calibration, Finite element methods

Read Abstract +

In its chapter "Modeling," the International Technology Roadmap for Semiconductor 2005 edition stipulates the need for "Multi-generation lithography system models." Most lithographers would share this opinion that even if the equipment needs constant refurbishing, the software should survive at least a couple of technology generations. Fortunately, the table in which the statement appeared in the ITRS roadmap was accurately entitled "difficult challenges." This article will shed some light on the process of progressive modeling while making clear that, in all likelihood, formidable challenges will remain. The very core of simulation is a physical / chemical model of the real world. Lithographers need a sound model for the next technology node, not a short-sighted one, despite the fact that this is very difficult to achieve. This paper will use the parable of the ichthyologist as a starting point for the problem. It will translate the parable into the "deep waters" of lithography, showcasing lithography simulation as it has evolved over the years. Finally, it will present a small, yet decisive, recent step toward predictive lithography simulation. This example will include an improvement in the model for the post-exposure bake of chemically amplified resists, as well as a non-comprehensive list of foreseeable challenges.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years