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Hisaya Sakaguchi
at KLA Japan
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Author
Publications (1)
Proceedings Article | 16 September 2013 Paper
In-die mask registration for multi-patterning
F. Laske, S. Kunitani, T. Kamibayashi, M. Yamana, A. Fuse, M. Wagner, K.-D. Roeth, M. Ferber, M. Daneshpanah, S. Czerkas, H. Sakaguchi
Proceedings Volume 8880, 888024 (2013) https://doi.org/10.1117/12.2027200
KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Reticles, Image registration, Overlay metrology, Model-based design, Manufacturing, Lithography, Error analysis
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