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Hongwen Yan
at IBM Thomas J Watson Research Ctr
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Publications (1)
Proceedings Article | 9 April 2024 Presentation + Paper
Etching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmas
Juliano Borges, Hongwen Yan, Devi Koty, Sophia Rogalskyj, Lynne Gignac, Leonidas Ocola, Marinus Hopstaken, Steve Molis, Andrew Simon, John Arnold, Jeffrey Shearer, Robert Bruce
Proceedings Volume 12958, 129580E (2024) https://doi.org/10.1117/12.3010015
KEYWORDS: Etching, Plasmas, Mixtures, Argon, Iridium, Chlorine, Chemistry, Thin films, Silicon
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