Mr. Hyunwook Ok Profile

Hyunwook Ok

at Samsung Advanced Institute of Technology

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Author

Publications (7)

Proceedings Article | 19 January 2009 Paper

Chromatic aberration reduction through optical feature modeling

Jooyoung Kang, Hyunwook Ok, JaemGuyn Lim, Seong-Deok Lee

Proceedings Volume 7250, 72500U (2009) https://doi.org/10.1117/12.805763

KEYWORDS: Chromatic aberrations, Chromium, Sensors, Image sensors, Digital filtering, Cameras, Optical filters, Image processing, Signal analyzers, Gaussian filters

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Proceedings Article | 3 March 2008 Paper

Robust local restoration of space-variant blur image

Jaeguyn Lim, Jooyoung Kang, Hyunwook Ok

Proceedings Volume 6817, 68170S (2008) https://doi.org/10.1117/12.766456

KEYWORDS: Image restoration, Point spread functions, Modulation transfer functions, Image sensors, Image filtering, Image processing, Sensors, Filtering (signal processing), Refraction, Cameras

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Proceedings Article | 12 February 2007 Paper

Visibility improvement based on gray matching experiment between dark and ambient condition in mobile display

Inji Kim, Hyunwook Ok, DuSik Park

Proceedings Volume 6492, 64920R (2007) https://doi.org/10.1117/12.704682

KEYWORDS: Visibility, LCDs, Eye, Light sources and illumination, Solids, Electronic imaging, Image processing, Reflective displays, Human vision and color perception, Image enhancement

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SPIE Journal Paper | 1 October 2006

Preferred skin color reproduction on the display

DuSik Park, Youngshin Kwak, Hyunwook Ok, Chang-Yeong Kim

JEI, Vol. 15, Issue 04, 041203, (October 2006) https://doi.org/10.1117/12.10.1117/1.2400850

KEYWORDS: Skin, Color reproduction, Chromium, Mahalanobis distance, Image quality, Algorithm development, Color and brightness control algorithms, Transform theory, Image processing, Imaging devices

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Proceedings Article | 28 June 2005 Paper

ArF photoresist parameter optimization for mask error enhancement factor reduction

Chang Lee, Seok Han, Kyoung Park, Sangwoong Yoon, Hye Kang, Hyun Oh, Ji Lee, Young Kim, Tae Kim, Hye-Keun Oh

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617210

KEYWORDS: Photomasks, Semiconducting wafers, Photoresist materials, Line edge roughness, Absorbance, Critical dimension metrology, Polymers, Photoresist processing, Diffusion, Optical properties

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Proceedings Article | 12 May 2005 Paper

The evaluation of aberration effects according to pattern shape and duty ratio

Ji-Eun Lee, Seung-Wook Park, Chang-Ho Lee, Hyun-Wook Oh, So-Yoon Bae, Hye-Keun Oh

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600470

KEYWORDS: Monochromatic aberrations, Distortion, Spherical lenses, Scattering, Light sources, Lithography, Light scattering, Critical dimension metrology, Projection systems, Zernike polynomials

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Proceedings Article | 4 May 2005 Paper

ArF photoresist parameter optimization for mask error enhancement factor reduction

Chang Ho Lee, Seok Han, Kyung Sil Park, Hye Young Kang, Hyun Wook Oh, Ji Eun Lee, Kyung Me Kim, Young Ho Kim, Tae Sung Kim, Hye-Keun Oh

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600308

KEYWORDS: Photomasks, Semiconducting wafers, Photoresist materials, Line edge roughness, Absorbance, Critical dimension metrology, Polymers, Photoresist processing, Diffusion, Optical properties

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Showing 5 of 7 publications

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