Azo-polymeric materials present in the last decade a great interest due to their applications. Our materials are based on polysiloxanic chains, modified with different azo-benzenic groups. This new class of hybrid polymer (organic/inorganic) gives a large potential of applications in biology, chemistry, sensors, microelectronics etc.
Due to photo-chromic properties of the azo-polymers it is possible to apply two kinds of techniques for surface relief
gratings (SRG) generation, necessary for using the polymers in enumerated applications: continuous or pulsed light
irradiation. Our work was focused on SRG generation on azo-polymers by pulsed light irradiation, with a Lloyd
interferometric set-up. The resulting structures were analyzed, from optical point of view, by three methods: white light interferometry (WLI), optical microscopy and diffraction efficiency. All determination has been done in correlations with the irradiation parameters: fluence and number of pulses. We can say that the pulsed radiation interferometric patterning of azo-polysiloxanes is an efficacy and controllable technology to obtain surface relief gratings very necessary for the biological applications (cell culture) and optical methods analyses are useful for rapid determinations.
In this paper we are analyzing the coupling between laser radiation and surface in order to set the optimum
work conditions to obtain nanoparticles by laser ablation in liquids (LAL). In this idea we have studied the
effects induced with a 355 nm wavelength Nd:YAG pulsed laser on an aluminum target situated in distilled
water with non contact profilometry (WLI Xi-100) and by optical microscopy (Carl Zeiss microscope). We
have measured, analyzed and intercompared the characteristics of the formed craters (diameter, depth and
shape) on the aluminum target as a function of the laser radiation parameters (incident fluence, number of
pulses).
Aluminium nanoparticles were produced by pulsed laser ablation of a sample of pure aluminium situated in distilled
water. This technique provides the possibility to generate a large variety of nanoparticles that are free of both surfaceactive
substances and counter-ions The sample was irradiated by the focused output of the third harmonics of pulsed
nanosecond Nd : YAG laser operating at 10 Hz frequency. The typical thickness of the liquid above the target was 10
mm. In order to select the most efficient material removal conditions the irradiation print on the ablated surface was
analyzed as a function of the irradiation parameters (incident laser fluence, irradiation pulses number or irradiation
time) with optical microscopy and white light interferometry. The presence of the ablated aluminium nanoparticles in
the liquid was evidenced by SEM. For SEM measurement, one drop of solution containing Al nanoparticles was placed
on a gold coated silicon substrate and dried. The minimum diameter of nanoparticles estimated by SEM was under 100
nm. The SEM results show also clusters of spherical particles together with well-defined singles. In order to improve
the quantity of the ablated material the irradiation cell was mounted on a computer-driven X-Y stage and translated
during laser exposure.
UV laser beam interaction with painting layers in case of aged mock-ups was investigated and ablation and cleaning
thresholds were estimated as a function of each layer and sub-layer composition. Ablation depth measurements as a
function of incident laser intensities and subsequent irradiation pulse number was measured with white light
interferometry (WLI) and profilometric methods, demonstrating a selectivity of the removal of painting layers from submicrometric
domain to micrometric domain as a function of surface cleaning needs. The laser cleaning station was
designed and developed after careful evaluation of the irradiation conditions proper to the removal of painting layers. A
Q-switched Nd:Yag laser radiation is delivered to the artwork through a mirror system consisting in an articulated arm
and a laser head. A complete control of the incident laser parameters was envisaged with the laser remote control
interface. The system also comprises diagnosis and monitoring tools for the remote control of the cleaning operation.
The prototype is controlled by an integrated interface based on a user-friendly software to perform the available
operations (e.g. laser cleaning, LIBS, colorimetry, live color monitoring, multispectral analysis, database management).
The user interface is also used to start the treatment of a new work, to review or continue a previously started work.
The reorganization processes at submicron level of the polymeric materials have been investigated because of
their applications in optoelectronics and bio-science. We have obtained surface relief modulation in single step
processing on the photo resist and polysiloxane films. But for technical applications the time evolution and
stability of the induced surface structure is an important parameter and is a problem to be discussed. In case of
single step surface relief formation on polymeric materials the process is connected with the photochromic
behavior of the materials. As it is known the UV light induced effects on the material structure are reversible
under the action of visible light, but with different speeds. In this report is analyzed the time evolution of the
surface modulation obtained under the action of the UV light for azopolymers with different structures.
In micro- and nano- device fabrication technology, localized material removal is one of the basic operations for structure
formation. Classical methods for structure formation on the surface of a silicon wafer are based mainly on chemical
processing, starting with photo etching, chemical etching, and chemical-mechanical linearization. In order to propose
new methods of higher quality from the point of view of both environment protection and processing quality, we have
studied the possibility of thin films controlled removal under the action of laser radiation. We are presenting some
qualitative results of laser induced surface removal of polymer thin films, of interest for microelectronic industry (e.g.
photoresist), under the action of different laser sources. As laser sources we have used the most spread and
commercially available laser systems with different wavelengths and pulse lengths in order to compare their action on
the surfaces and to establish the characteristic parameters for removal of thin layers for surface cleaning.
This paper deals with optical characterization of photo-polymer gratings for parameter control. The gratings were
obtained using the photoinduced single step inscription of refractive optical elements technique. The optical
characterization was done by measuring the specular and diffracted orders of a laser beam incident on the grating. This
technique is specifically known as scatterometry. The laser was a He-Ne with 633 nm wavelength. The measured
diffraction efficiencies contain information about the parameters to be determined of the grating, such as pitch, linewidth
and shape of the ridges.
Surface-relief photo-polymer gratings obtained through the novel technique of photoinduced single step inscription in
photopolymers are characterized through various investigations means, with an emphasis on scatterometry. The
characterization of the gratings is necessary not only for insight in the creation process of gratings but also for checking
the reproducibility and uniformity. The diffraction efficiencies of the various orders diffracted by the grating were
measured and they were fitted to theoretical predictions corresponding to various structure models of the gratings. The
fitting procedure is used to provide the parameters of the gratings, such as the width, the grating height, the pitch or
shape factors, such as the wall angles for a trapezoidal structure. The shape of the gratings was quite complicated and the
fitting, for this reason, a challenge. Numerous models were proposed, tried and their advantages and shortcomings
discussed.
The permanently development of microelectronics production by continuously increasing of devices densities meantime with corresponding decreasing of processing line till further submicronic range. The processing of huge diversity of materials as metals, polymers, ceramics, silicon, germanium, other materials III-Vs, glass, diamond, hard metal oxides, composites is need. On this paper will be presented our advanced studies and of experiments realized with very good results for a full range of those materials by micro and nanoprocessing for to realize the best accuracy, according with microelectronics technical requirements specified as below:
1. The microdrilling for microvias used for MCM's, MEMS and MOEMS application.
2. The high precision microcutting and scribing used for individual chips separation Isingulation on processed wafers
of micro and optoelectronics applications
3. 2D I3D processing for microlens, microlens array and microalveoles fabrication
4. Microengraving of KOP (Potasium dihydrogen phosphate) crystal by laser microablation
5. Micro and nano cleaning of thin and ultrathin layers need for production of microelectronics devices production.
The interest to use laser surface processing in microtechnology as a friendly method from the technologic and environmental point of view lead our studies about laser radiation interaction with photo-resist and metallic thin films. In this view we have tried in our experiments to process metallic thin films deposited on silicon substrate by using laser radiation. To obtain a good quality of the metallic thin film removal from the silicon surface a careful selection of the incident laser intensity, number of pulses and irradiation geometry is needed. The threshold value for the laser cleaning intensity depends on the number of incident laser pulses. A careful experimental estimation of the cleaning conditions from the point of view of incident laser energy, fluence, intensity and irradiation geometry was realized for aluminum, copper, and chromium thin films.
Laser induced surface cleaning is the adequate method in a large variety of industrial domains as microelectronics, optics, photonics. By comparison to chemical and/or mechanical cleaning, laser cleaning has the advantage of a very good selectivity on the surface and in depth of the material, no surface contamination, without stress in the material volume and environmental safe. It seems that laser cleaning can be developed in a method to be currently used in microelectronic industry. For an efficient laser cleaning of metallic thin films without damage of the silicon wafer, a careful optimization of the incident laser energy, fluence, intensity and number of laser pulses is needed. We have developed an analytical procedure to study the temperature fields in pulsed laser heated solids, for a deeper knowledge of the laser-thin film substrate interaction.
The research is carried on as a project in the frame of the PHARE-TTQM program, a cooperation of INFLPR Bucharest, PRO OPTICA SA Bucharest and FORTH-IESL Heraklion-Greece. A new laser ablation technique, based on the enhanced free running (EFR) mode of operation of a Nd:YAG laser, is presented. In the EFR degree(s) mode it is possible to achieve a regular temporal structure of the laser spiking combined with the control of both amplitude and separation of the individual spikes. The stable fluence and power density of the spikes will increase the precision of the EFR laser ablation in comparison with the short free running technique. The short duration of the EFR spikes, combined with their large time separation, reduces the level of the thermal damage of the substrate. A surface processing laser device operating in EFR mode is under development with PHARE financial support in the Laser Department of INFLPR. Preliminary study of ablation of stone samples from Stavropoleos Monastery, Bucharest, using FORTH-IESL laser facilities, is presented.
Reactive pulsed laser ablation deposition of thin films is a technique which has already given good results for the formation of metal and semiconductor oxide and nitride films. To improve the quality of the deposited films it is important to understand the ablation process and the materials transport phenomena from the target to the collecting substrate. Optical emission spectroscopy of the plasma plume, formed by the interaction of the laser pulse with the target is generally used to try to understand the reaction mechanisms during the transport process. An eight speed camera was also used to determine plasma plume expansion velocity and the total duration of luminous emission of the plume. The effect of ambient pressure in the ablation chamber on the plasma composition was observed.
We report a YBa2Cu3O7 PLD method designed to reduce the oxygen deficiency in the as deposited YBCO superconducting thin films.OPtical dissociation of O2 buffer gas in front of the plume using a second IR laser pulse simultaneously with the UV laser beam producing the ablation plasma is proposed as a method for oxidation enhancement and oxygen enrichment in the deposited film. Oxides enhancement measurements were performed by optical spectroscopy on YO, BaO and CuO lines at large distances from the target surface. Temporal evolution of ionic, neutral and oxide lines was analyzed in 400-620 nm region, in correlation with plasma expansion in the ambient gas.
UV laser induced ablation of YBCO superconducting targets was studied in the initial and late evolution stages in order to control and optimize the thin film deposition process. The optimum irradiation energy was estimated using an acoustic method allowing ablation threshold and congruent ablation threshold estimation. The ablation threshold dependence on incident laser spot area and target density was studied also and recommends that the proper fluence has to be considered as a function of specific irradiation conditions. Plasma expansion analyses was performed in order to estimate the parameters that control the composition and energy of the ablated particles. Temporal and spatial resolved spectra were recorded and evidenced a high density of ionized species in the initial expansion stages, atomic emission being significant at late stages or in colder regions of the plume, where the oxide emission becomes also notable. Also a supplementary IR laser radiation focused in front of the plume for IR oxygen dissociation evidenced the oxidation enhancement at the interaction of the dissociation front with the plume species.
Laser radiation interaction with materials is a complex process in which creation of acoustic waves or stress waves is a part of it. As a function of the laser radiation energy and intensity incident on steel target surface ultrasound signals were registered and studied. Thermoelastic, ablation and breakdown mechanisms of generation of acoustic waves were analyzed.
Emission characteristic of laser produced plasma for two pulse lengths of the laser beam at 10.6 micrometers wavelength was studied. Emission lines in Al and Pb plasma were registered in the visible region their time evolution was analyzed and plasma temperature was estimated. A second maximum in intensity of the emissions lines after the laser pulse extinction was put into evidence for short laser pulses as compared with the smooth decay in time of lines for long laser pulses.
In this paper, we report an all-optical method for the determination of the electro-optic coefficient of the photorefractive crystals. Two laser beams with the wavelength (lambda) equals 632.8 nm interfere in a Bi12TiO20 (BTO) crystal, inducing a phase grating on which they are self-diffracting. The photoinduced space-charge field is anharmonic as a consequence of the high contrast of the incident light fringe pattern imposed by the condition of large diffraction efficiency. Our analytical evaluation of the light intensity in the diffraction orders (in the Raman-Nath regime) and processing of the experimental results led to the determination of the electro-optic coefficient, r. The values of the electro-optic coefficient, obtained for different BTO crystal samples, are in agreement with those reported in literature and obtained by electro-optical methods.
Two improved quantitative versions of the Schlieren and the focusing
methods for the measurement of the refractive index proffle (RIP) in
opttcal inhomogeneous axally-symmetric media are presented.
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