Mr. In Wook Cho Profile

In Wook Cho

at Hanyang Univ

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Publications (3)

Proceedings Article | 12 December 2009 Paper

Possible line edge roughness reduction by anisotropic molecular resist

Hyunsu Kim, In Wook Cho, Hakjin Jang, Mihwa Kang, Seong Wook Kim, Hye-Keun Oh

Proceedings Volume 7520, 75201L (2009) https://doi.org/10.1117/12.837234

KEYWORDS: Line edge roughness, Polymers, Monte Carlo methods, Diffusion, Line width roughness, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Edge roughness, Computer simulations

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Proceedings Article | 1 April 2009 Paper

Line edge and width roughness dependency on each ingredient of extreme ultraviolet molecular resist

Hyunsu Kim, In Wook Cho, Seong-Sue Kim, Han-Ku Cho, Hye-Keun Oh

Proceedings Volume 7273, 72732E (2009) https://doi.org/10.1117/12.814055

KEYWORDS: Line edge roughness, Monte Carlo methods, Extreme ultraviolet lithography, Diffusion, Molecules, Extreme ultraviolet, Image processing, Lithography, Polymers, Line width roughness

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Proceedings Article | 1 April 2009 Paper

Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography

In Wook Cho, Joon-Min Park, Hyunsu Kim, Joo-Yoo Hong, Seong-Sue Kim, Han-Ku Cho, Hye-Keun Oh

Proceedings Volume 7273, 72732D (2009) https://doi.org/10.1117/12.814108

KEYWORDS: Line edge roughness, Line width roughness, Photoresist processing, Lithography, Polymers, Surface roughness, Diffusion, Glasses, Extreme ultraviolet lithography, Monte Carlo methods

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