Dr. James A. Folta Profile

Dr. James A. Folta

Optics Production Group Leader/Engineer at Lawrence Livermore National Lab

SPIE Involvement:

Author

Publications (33)

Proceedings Article | 12 September 2021 Presentation + Paper

Ion beam sputtering of large scale dichroic mirror for fifth-harmonic separation

Mathias Mende, Konrad Schrader, Wolfgang Ebert, James Folta, Christopher Stolz

Proceedings Volume 11872, 118720F (2021) https://doi.org/10.1117/12.2597747

KEYWORDS: Coating, Thin films, Sputter deposition, Refractive index, High laser damage threshold optical coatings, High harmonic generation, Dielectric mirrors

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Proceedings Article | 5 March 2021 Presentation

The National Ignition Facility laser performance status

Jean-Michel Di Nicola, Steven Yang, Tiziana Bond, Mark Bowers, Leyen Chang, Simon Cohen, Michael Erickson, Catalin Filip, Jim Folta, Abe Handler, Tom Lanier, Ken Manes, Brian Olejniczak, Shahida Rana, Mike Shaw, Stanley Sommer, Mary Spaeth, Bruno Van Wonterghem, Pam Whitman, Clay Widmayer, J. Nan Wong, Paul Wegner, Dan Kalantar, David Alessi, Saroja Ammula, Brandon Buckley, Alica Calonico Soto, Wren Carr, Jason Chou, Alex Deland, Peter DeVore, Gaylen Erbert, Nathan Gottesman, Apurva Gowda, John Heebner, Charles Orth, Vincent Hernandez, Sandrine Herriot, Ron House, Chris Kinsella, Brian MacGowan, Kathleen Mccandless, Ryan Muir, Mario Ordonez, Ernesto Padilla, Alan Pao, Larry Pelz, Brett Raymond, Tayyab Suratwala, Alex Wargo, Lei Wang, Doug Larson

Proceedings Volume 11666, 1166604 (2021) https://doi.org/10.1117/12.2586868

KEYWORDS: National Ignition Facility, Diagnostics, Fusion energy, Physics, Neodymium glass lasers, Laser development

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Proceedings Article | 21 February 2020 Presentation + Paper

Precision diagnostic system enhancements and recommissioning for advanced laser beam characterization at the National Ignition Facility

A. Handler, S. Cohen, M. Erickson, T. Lanier, M. Ordoñez, N. Gottesman, J. M. Di Nicola, J. Folta, S. Yang, P. Wegner

Proceedings Volume 11259, 1125918 (2020) https://doi.org/10.1117/12.2547355

KEYWORDS: Diagnostics, National Ignition Facility, Cameras, Near field, Wavefronts, Sensors, Signal to noise ratio, Calibration, Near field optics, Imaging systems

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Proceedings Article | 21 February 2020 Presentation + Paper

Spatially resolved B-integral measurements on the NIF laser

M. Erickson, S. Cohen, J. Di Nicola, J. Folta, A. Handler, T. Lanier, B. Olejniczak, C. Widmayer, W. Williams, S. Yang, P. Wegner

Proceedings Volume 11259, 1125917 (2020) https://doi.org/10.1117/12.2546818

KEYWORDS: National Ignition Facility, Sensors, Diagnostics, Beam shaping, Phase shifts, Fusion energy, Phase measurement, Wavefronts, Deformable mirrors, Kerr effect, Shearing interferometers

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Proceedings Article | 21 February 2020 Presentation + Paper

Time-gated measurements of fusion-class laser beam profiles

T. Lanier, S. Cohen, J. Di Nicola, M. Erickson, J. Folta, A. Handler, E. Hurd, B. Olejniczak, T. Tate, C. Widmayer, S. Yang, P. Wegner

Proceedings Volume 11259, 1125915 (2020) https://doi.org/10.1117/12.2546663

KEYWORDS: National Ignition Facility, Diagnostics, Sensors, Cameras, Optical simulations, Near field, Image processing, Amplitude modulation, Pulsed laser operation, Phase shift keying

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Proceedings Article | 6 December 2016 Paper

Impacts of SiO2 planarization on optical thin film properties and laser damage resistance

T. Day, H. Wang, E. Jankowska, B. Reagan, J. Rocca, C. Stolz, P. Mirkarimi, J. Folta, J. Roehling, A. Markosyan, R. Route, M. Fejer, C. Menoni

Proceedings Volume 10014, 1001422 (2016) https://doi.org/10.1117/12.2245058

KEYWORDS: Dielectrophoresis, Silica, Laser induced damage, Thin films, Etching, Hybrid fiber optics, Absorption, Argon, Molybdenum, Ions

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Proceedings Article | 23 September 2015 Paper

Depth determination of critical fluence-limiting defects within planarized and non-planarized mirror coatings

Christopher Stolz, Justin Wolfe, Paul Mirkarimi, James Folta, John Adams, Marlon Menor, Rajesh Raman, Norm Neilsen, Mary Norton, Ronald Luthi, Nick Teslich, Carmen Menoni, Dinesh Patel

Proceedings Volume 9627, 96271C (2015) https://doi.org/10.1117/12.2197349

KEYWORDS: Silica, Mirrors, Laser induced damage, Thin film coatings, Etching, Optical coatings, Resistance, Multilayers, Scanning electron microscopy, Thin films

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Proceedings Article | 3 December 2013 Paper

Defect insensitive 100 J/cm2 multilayer mirror coating process

Christopher Stolz, Justin Wolfe, Paul Mirkarimi, James Folta, John Adams, Marlon Menor, Nick Teslich, Regina Soufli, Carmen Menoni, Dinesh Patel

Proceedings Volume 8885, 888502 (2013) https://doi.org/10.1117/12.2030477

KEYWORDS: Etching, Silica, Multilayers, Coating, Mirrors, Resistance, Laser induced damage, Ion beams, Visualization, Sputter deposition

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Proceedings Article | 2 December 2013 Paper

Mitigation of laser damage on National Ignition Facility optics in volume production

James Folta, Mike Nostrand, John Honig, Nan Wong, Frank Ravizza, Paul Geraghty, Mike Taranowski, Gary Johnson, Glenn Larkin, Doug Ravizza, John Peterson, Brian Welday, Paul Wegner

Proceedings Volume 8885, 88850Z (2013) https://doi.org/10.1117/12.2030475

KEYWORDS: National Ignition Facility, Laser induced damage, Inspection, Laser damage threshold, Microscopes, Silica, Laser optics, Carbon dioxide lasers, Laser energy, Laser ablation

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Proceedings Article | 7 February 2006 Paper

Improved method for laser damage testing coated optics

Michael Borden, James Folta, Christopher Stolz, John Taylor, Justin Wolfe, Andrew Griffin, Michael Thomas

Proceedings Volume 5991, 59912A (2006) https://doi.org/10.1117/12.637825

KEYWORDS: Coating, Laser induced damage, Antireflective coatings, National Ignition Facility, Optical testing, Yield improvement, Silica, Laser optics, Mirrors, Laser development

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Proceedings Article | 21 February 2005 Paper

Performance of thin borosilicate glass sheets at 351 nm

Pamela Whitman, Douglas Hahn, Thomas Soules, Mary Norton, Sham Dixit, Eugene Donohue, James Folta, William Hollingsworth, Mark Maienschein-Cline

Proceedings Volume 5647, (2005) https://doi.org/10.1117/12.585946

KEYWORDS: Glasses, Iron, Absorption, National Ignition Facility, Borosilicate glass, Transmittance, Near field optics, Pulsed laser operation, Fusion energy, Laser irradiation

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Proceedings Article | 16 June 2003 Paper

Understanding particle defect transport in an ultra clean sputter coating process

Christopher Walton, Patrick Kearney, James Folta, Donald Sweeney, Paul Mirkarimi

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484970

KEYWORDS: Particles, Semiconducting wafers, Photomasks, Ion beams, Coating, Extreme ultraviolet lithography, Optical spheres, Ions, Atmospheric particles, Multilayers

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Proceedings Article | 27 December 2002 Paper

Mask blanks and their (sometimes invisible) defects

Emily Fisch, Kenneth Racette, James Folta, Cindy Larson

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467481

KEYWORDS: Photomasks, Inspection, Quartz, Particles, Extreme ultraviolet lithography, Chromium, Lithography, Multilayers, Reticles, Microelectronics

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Proceedings Article | 27 December 2002 Paper

Low-defect EUVL multilayers on standard-format mask blanks

James Folta, Patrick Kearney, Cindy Larson, Michael Crosley, Emily Fisch, Kenneth Racette

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467478

KEYWORDS: Photomasks, Semiconducting wafers, Coating, Multilayers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Silicon, Defect inspection, Standards development

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Proceedings Article | 27 December 2002 Paper

Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks

Alan Stivers, Ted Liang, Michael Penn, Barry Lieberman, Gilbert Shelden, James Folta, Cindy Larson, Paul Mirkarimi, Christopher Walton, Eric Gulliksong, Moonsuk Yi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468199

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect detection, Particles, Gold, Extreme ultraviolet lithography, Semiconducting wafers, Optical spheres, Multilayers

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SPIE Journal Paper | 1 August 2002

Improved reflectance and stability of Mo/Si multilayers

Sasa Bajt, Jennifer Alameda, Troy Barbee, W. Miles Clift, James Folta, Benjamin Kaufmann, Eberhard Spiller

OE, Vol. 41, Issue 08, (August 2002) https://doi.org/10.1117/12.10.1117/1.1489426

KEYWORDS: Multilayers, Reflectivity, Silicon, Interfaces, Molybdenum, Boron, Extreme ultraviolet lithography, Ruthenium, Extreme ultraviolet, Silicon carbide

Proceedings Article | 1 July 2002 Paper

Performance upgrades in the EUV engineering test stand

Daniel Tichenor, William Replogle, Sang Hun Lee, William Ballard, Alvin Leung, Glenn Kubiak, Leonard Klebanoff, Samual Graham, John Goldsmith, Karen Jefferson, John Wronosky, Tony Smith, Terry Johnson, Harry Shields, Layton Hale, Henry Chapman, John Taylor, Donald Sweeney, James Folta, Gary Sommargren, Kenneth Goldberg, Patrick Naulleau, David Attwood, Eric Gullikson

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472328

KEYWORDS: Semiconducting wafers, Sensors, Extreme ultraviolet, Reticles, Projection systems, Extreme ultraviolet lithography, Printing, Lithography, Fiber optic illuminators, Wavefronts

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Proceedings Article | 1 July 2002 Paper

Advances in low-defect multilayers for EUVL mask blanks

James Folta, J. Courtney Davidson, Cindy Larson, Christopher Walton, Patrick Kearney

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472287

KEYWORDS: Photomasks, Ions, Extreme ultraviolet lithography, Semiconducting wafers, Multilayers, Ion beams, Etching, Silicon, Coded apertures, Molybdenum

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Proceedings Article | 11 March 2002 Paper

Multilayer coating requirements for extreme ultraviolet lithography masks

Scott Hector, Eric Gullikson, Paul Mirkarimi, Eberhard Spiller, Patrick Kearney, James Folta

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458369

KEYWORDS: Reflectivity, Multilayers, Photomasks, Coating, Mirrors, Extreme ultraviolet lithography, Semiconducting wafers, Projection systems, Silicon, Lithographic illumination

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Proceedings Article | 20 December 2001 Paper

Improved reflectance and stability of Mo/Si multilayers

Sasa Bajt, Jennifer Alameda, Troy Barbee, W. Miles Clift, James Folta, Benjamin Kaufmann, Eberhard Spiller

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450946

KEYWORDS: Multilayers, Reflectivity, Silicon, Boron, Ruthenium, Molybdenum, Interfaces, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide

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Proceedings Article | 20 December 2001 Paper

Initial results from the EUV engineering test stand

Daniel Tichenor, Avijit Ray-Chaudhuri, Sang Hun Lee, Henry Chapman, William Replogle, Kurt Berger, Richard Stulen, Glenn Kubiak, Leonard Klebanoff, John Wronosky, Donna O'Connell, Alvin Leung, Karen Jefferson, William Ballard, Layton Hale, Kenneth Blaedel, John Taylor, James Folta, Eberhard Spiller, Regina Soufli, Gary Sommargren, Donald Sweeney, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Jeffrey Bokor, David Attwood, Uwe Mickan, Ralph Hanzen, Eric Panning, Pei-yang Yan, John Bjorkholm, Charles Gwyn

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450953

KEYWORDS: Extreme ultraviolet, Reticles, Projection systems, Semiconducting wafers, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Plasma, Sensors, Mirrors

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Proceedings Article | 20 August 2001 Paper

Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution

Regina Soufli, Eberhard Spiller, Mark Schmidt, Courtney Davidson, R. Fred Grabner, Eric Gullikson, Benjamin Kaufmann, Stanley Mrowka, Sherry Baker, Henry Chapman, Russell Hudyma, John Taylor, Christopher Walton, Claude Montcalm, James Folta

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436695

KEYWORDS: Multilayers, Mirrors, Reflectivity, Optical coatings, Extreme ultraviolet lithography, Scattering, Extreme ultraviolet, Light scattering, Imaging systems, Cameras

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Proceedings Article | 20 August 2001 Paper

System integration and performance of the EUV engineering test stand

Daniel Tichenor, Avijit Ray-Chaudhuri, William Replogle, Richard Stulen, Glenn Kubiak, Paul Rockett, Leonard Klebanoff, Karen Jefferson, Alvin Leung, John Wronosky, Layton Hale, Henry Chapman, John Taylor, James Folta, Claude Montcalm, Regina Soufli, Eberhard Spiller, Kenneth Blaedel, Gary Sommargren, Donald Sweeney, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Jeffrey Bokor, Phillip Batson, David Attwood, Keith Jackson, Scott Hector, Charles Gwyn, Pei-yang Yan

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436665

KEYWORDS: Extreme ultraviolet, Semiconducting wafers, Reticles, Projection systems, Sensors, Xenon, Mirrors, Optical alignment, Fiber optic illuminators, Multilayers

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Proceedings Article | 22 January 2001 Paper

Predictive model of the cost of extreme-ultraviolet lithography masks

Scott Hector, Patrick Kearney, Claude Montcalm, James Folta, Christopher Walton, William Tong, John Taylor, Pei-yang Yan, Charles Gwyn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410754

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Inspection, Coating, Optical lithography, Lithography, Process modeling, Defect detection, Ion beams

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Proceedings Article | 21 July 2000 Paper

EUV engineering test stand

Daniel Tichenor, Glenn Kubiak, William Replogle, Leonard Klebanoff, John Wronosky, Layton Hale, Henry Chapman, John Taylor, James Folta, Claude Montcalm, Russell Hudyma, Kenneth Goldberg, Patrick Naulleau

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390083

KEYWORDS: Extreme ultraviolet, Reticles, Projection systems, Mirrors, Semiconducting wafers, Distortion, Optical alignment, Fiber optic illuminators, Tolerancing, Optical design

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Proceedings Article | 21 July 2000 Paper

High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography

Marco Wedowski, James Underwood, Eric Gullikson, Sasa Bajt, James Folta, Patrick Kearney, Claude Montcalm, Eberhard Spiller

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390107

KEYWORDS: Multilayers, Reflectivity, Optical coatings, Reflectometry, Mirrors, Extreme ultraviolet lithography, Calibration, Sensors, Projection systems, Extreme ultraviolet

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Proceedings Article | 23 November 1999 Paper

Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography

Marco Wedowski, Sasa Bajt, James Folta, Eric Gullikson, Ulf Kleineberg, Leonard Klebanoff, Michael Malinowski, W. Miles Clift

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371120

KEYWORDS: Multilayers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Optical coatings, Carbon, Ozone, Mirrors, Contamination, Optical components

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Proceedings Article | 23 November 1999 Paper

Multilayer coated optics for an alpha-class extreme ultraviolet lithography system

Claude Montcalm, R. Fred Grabner, Russell Hudyma, Mark Schmidt, Eberhard Spiller, Christopher Walton, Marco Wedowski, James Folta

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371119

KEYWORDS: Reflectivity, Multilayers, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, Projection systems, Lithography, Optical components, Mirrors, EUV optics

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Proceedings Article | 23 November 1999 Paper

Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography

Sasa Bajt, Ricke Behymer, Paul Mirkarimi, Claude Montcalm, Mark Wall, Marco Wedowski, James Folta

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371125

KEYWORDS: Multilayers, Reflectivity, Beryllium, Extreme ultraviolet lithography, Mirrors, Molybdenum, Extreme ultraviolet, Transmission electron microscopy, Crystals, Interfaces

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Proceedings Article | 19 July 1999 Paper

Micro-electro-mechanical deformable mirrors for advanced adaptive optics applications

J. Decker, Scot Olivier, James Folta, William Cowan

Proceedings Volume 3749, (1999) https://doi.org/10.1117/12.355006

KEYWORDS: Adaptive optics, Microelectromechanical systems, Imaging systems, Deformable mirrors, Atmospheric propagation, Standards development, Laser systems engineering, Wave propagation, Wavefronts, Actuators

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Proceedings Article | 25 June 1999 Paper

Multilayer coating of 10X projection optics for extreme ultraviolet lithography

Claude Montcalm, Eberhard Spiller, Marco Wedowski, Eric Gullikson, James Folta

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351157

KEYWORDS: Reflectivity, Mirrors, Multilayers, Optical coatings, Projection systems, Extreme ultraviolet, Cameras, Extreme ultraviolet lithography, Tolerancing, Adaptive optics

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Proceedings Article | 25 June 1999 Paper

Advances in multilayer reflective coatings for extreme ultraviolet lithography

James Folta, Sasa Bajt, Troy Barbee, R. Fred Grabner, Paul Mirkarimi, Tai Nguyen, Mark Schmidt, Eberhard Spiller, Christopher Walton, Marco Wedowski, Claude Montcalm

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351156

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Optical coatings, Extreme ultraviolet, Mirrors, EUV optics, Lithography, Projection systems, Silicon

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Proceedings Article | 5 June 1998 Paper

Multilayer reflective coatings for extreme-ultraviolet lithography

Claude Montcalm, Sasa Bajt, Paul Mirkarimi, Eberhard Spiller, Frank Weber, James Folta

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309600

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Optical coatings, EUV optics, Silicon, Interfaces, Molybdenum

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Showing 5 of 33 publications

Proceedings Volume Editor (1)

SPIE Conference Volume | 20 December 2001

Soft X-Ray and EUV Imaging Systems II

Conference Committee Involvement (1)

Soft X-Ray and EUV Imaging Systems II

31 July 2001 | San Diego, CA, United States

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