Dr. John S. Taylor Profile

Dr. John S. Taylor

at jstaylor.precision

SPIE Involvement:

Author

Publications (26)

Proceedings Article | 20 October 2006 Paper

Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques

A. Barty, K. Goldberg, P. Kearney, S. Rekawa, B. LaFontaine, O. Wood, J. Taylor, H.-S. Han

Proceedings Volume 6349, 63492M (2006) https://doi.org/10.1117/12.686742

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Reflectivity, Multilayers, Signal detection, Imaging systems, Coating, Defect detection, Printing

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SPIE Journal Paper | 1 April 2006

Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers

Sasa Bajt, Zu Rong Dai, Erik Nelson, Mark Wall, Jennifer Alameda, Nhan Nguyen, Sherry Baker, Jeffrey Robinson, John Taylor, Andrew Aquila, Nora Edwards

JM3, Vol. 5, Issue 02, 023004, (April 2006) https://doi.org/10.1117/12.10.1117/1.2201027

KEYWORDS: Ruthenium, Silicon, Molybdenum, Extreme ultraviolet lithography, Reflectivity, Electrons, Oxides, Resistance, Transmission electron microscopy, Oxidation

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Proceedings Article | 22 March 2006 Paper

Visible light point-diffraction interferometer for testing of EUVL optics

Seiji Takeuchi, Osamu Kakuchi, Kenji Yamazoe, Yoshio Gomei, Todd Decker, Michael Johnson, Donald Phillion, John Taylor

Proceedings Volume 6151, 61510E (2006) https://doi.org/10.1117/12.656275

KEYWORDS: Wavefronts, Interferometers, Polarization, Optical testing, Calibration, Monochromatic aberrations, Visible radiation, Extreme ultraviolet lithography, Near field optics, Zernike polynomials

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Proceedings Article | 8 September 2005 Paper

Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems

Kenneth Goldberg, Patrick Naulleau, Senajith Rekawa, Paul Denham, J. Liddle, Eric Gullikson, Keith Jackson, Erik Anderson, John Taylor, Gary Sommargren, Henry Chapman, Donald Phillion, Michael Johnson, Anton Barty, Regina Soufli, Eberhard Spiller, Christopher Walton, Sasa Bajt

Proceedings Volume 5900, 59000G (2005) https://doi.org/10.1117/12.618066

KEYWORDS: Extreme ultraviolet, Optical testing, Interferometry, EUV optics, X-ray optics, X-rays, Lenses, Light sources, Astronomical imaging, X-ray astronomy

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Proceedings Article | 18 August 2005 Paper

Construction and testing of wavefront reference sources for interferometry of ultra-precise imaging systems

Michael Johnson, Donald Phillion, Gary Sommargren, Todd Decker, John Taylor, Yoshio Gomei, Osamu Kakuchi, Seiji Takeuchi

Proceedings Volume 5869, 58690P (2005) https://doi.org/10.1117/12.623185

KEYWORDS: Wavefronts, Mirrors, Extreme ultraviolet lithography, Calibration, Silicon, Metrology, Charge-coupled devices, Polarization, Cameras, Monochromatic aberrations

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Proceedings Article | 18 August 2005 Paper

Calibration of symmetric and non-symmetric errors for interferometry of ultra-precise imaging systems

Donald Phillion, Gary Sommargren, Michael Johnson, Todd Decker, John Taylor, Yoshio Gomei, Osamu Kakuchi, Seiji Takeuchi

Proceedings Volume 5869, 58690R (2005) https://doi.org/10.1117/12.623187

KEYWORDS: Wavefronts, Interferometers, Optical testing, Calibration, Mirrors, Spherical lenses, Interferometry, Phase interferometry, Extreme ultraviolet lithography, CCD cameras

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Proceedings Article | 6 May 2005 Paper

A dual-mode actinic EUV mask inspection tool

Yanwei Liu, Anton Barty, Eric Gullikson, John Taylor, J. Liddle, Obert Wood

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598559

KEYWORDS: Photomasks, Zone plates, Extreme ultraviolet, Inspection, Imaging systems, Multilayers, Defect inspection, EUV optics, Microscopes, Semiconducting wafers

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Proceedings Article | 6 May 2005 Paper

Substrate smoothing for high-temperature condenser operation in EUVL source environments

Regina Soufli, Sherry Baker, Susan Ratti, Jeff Robinson, Sasa Bajt, Jennifer Alameda, Eberhard Spiller, John Taylor, Eric Gullikson, Franklin Dollar, Andrew Aquila, Robert Bristol

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.606466

KEYWORDS: Extreme ultraviolet lithography, Aluminum, Annealing, Silicon, Atomic force microscopy, Multilayers, Reflectivity, Coating, Extreme ultraviolet, Ceramics

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Proceedings Article | 6 May 2005 Paper

Oxidation resistance of Ru-capped EUV multilayers

Sasa Bajt, Zu Rong Dai, Erik Nelson, Mark Wall, Jennifer Alameda, Nhan Nguyen, Sherry Baker, Jeffrey Robinson, John Taylor, Miles Clift, Andy Aquila, Eric Gullikson, N. V. Ginger Edwards

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.597443

KEYWORDS: Ruthenium, Reflectivity, Silicon, Multilayers, Oxides, Electron beams, Resistance, Molybdenum, Extreme ultraviolet lithography, Oxidation

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Proceedings Article | 6 May 2005 Paper

Actinic inspection of multilayer defects on EUV masks

Anton Barty, Yanwei Liu, Eric Gullikson, John Taylor, Obert Wood

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598488

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Defect inspection, Signal detection, Defect detection, Visible radiation, Light scattering, Scattering, Extreme ultraviolet lithography

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Proceedings Article | 20 May 2004 Paper

Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, Kevin Bradley, Rene Delano, Paul Denham, Bob Gunion, Bruce Harteneck, Brian Hoef, Hanjing Huang, Keith Jackson, Gideon Jones, Drew Kemp, James Liddle, Ron Oort, Al Rawlins, Senajith Rekawa, Farhad Salmassi, Ron Tackaberry, Carl Chung, Layton Hale, Don Phillion, Gary Sommargren, John Taylor

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.556538

KEYWORDS: Reticles, Semiconducting wafers, Sensors, Fiber optic illuminators, Printing, Extreme ultraviolet lithography, Metrology, Wafer-level optics, Scanners, Lithography

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Proceedings Article | 16 June 2003 Paper

System and process learning in a full-field high-power EUVL alpha tool

William Ballard, Daniel Tichenor, Donna O'Connell, Luis Bernardez, Robert Lafon, Richard Anderson, Alvin Leung, Kenneth Williams, Steven Haney, Yon Perras, Karen Jefferson, Therese Porter, Daniel Knight, Pamela Barr, James Van de Vreugde, Richard Campiotti, Mark Zimmerman, Terry Johnson, Leonard Klebanoff, Philip Grunow, Samuel Graham, Dean Buchenauer, William Replogle, Tony Smith, John Wronosky, Joel Darnold, Kenneth Blaedel, Henry Chapman, John Taylor, Layton Hale, Gary Sommargren, Eric Gullikson, Patrick Naulleau, Kenneth Goldberg, Sang Hun Lee, Harry Shields, Randall St. Pierre, Samuel Ponti

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482791

KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet, Sensors, Extreme ultraviolet lithography, Lithography, Projection systems, Xenon, EUV optics, Fiber optic illuminators

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Proceedings Article | 1 July 2002 Paper

Performance upgrades in the EUV engineering test stand

Daniel Tichenor, William Replogle, Sang Hun Lee, William Ballard, Alvin Leung, Glenn Kubiak, Leonard Klebanoff, Samual Graham, John Goldsmith, Karen Jefferson, John Wronosky, Tony Smith, Terry Johnson, Harry Shields, Layton Hale, Henry Chapman, John Taylor, Donald Sweeney, James Folta, Gary Sommargren, Kenneth Goldberg, Patrick Naulleau, David Attwood, Eric Gullikson

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472328

KEYWORDS: Semiconducting wafers, Sensors, Extreme ultraviolet, Reticles, Projection systems, Extreme ultraviolet lithography, Printing, Lithography, Fiber optic illuminators, Wavefronts

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Proceedings Article | 1 July 2002 Paper

Vendor capability for low-thermal-expansion mask substrates for EUV lithography

Kenneth Blaedel, John Taylor, Scott Hector, Pei-yang Yan, Arun Ramamoorthy, Peter Brooker

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472273

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Polishing, Optical spheres, Inspection, Manufacturing, Reflectivity, Surface finishing, Zerodur, Interferometers

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Proceedings Article | 20 December 2001 Paper

Initial results from the EUV engineering test stand

Daniel Tichenor, Avijit Ray-Chaudhuri, Sang Hun Lee, Henry Chapman, William Replogle, Kurt Berger, Richard Stulen, Glenn Kubiak, Leonard Klebanoff, John Wronosky, Donna O'Connell, Alvin Leung, Karen Jefferson, William Ballard, Layton Hale, Kenneth Blaedel, John Taylor, James Folta, Eberhard Spiller, Regina Soufli, Gary Sommargren, Donald Sweeney, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Jeffrey Bokor, David Attwood, Uwe Mickan, Ralph Hanzen, Eric Panning, Pei-yang Yan, John Bjorkholm, Charles Gwyn

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450953

KEYWORDS: Extreme ultraviolet, Reticles, Projection systems, Semiconducting wafers, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Plasma, Sensors, Mirrors

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Proceedings Article | 2 November 2001 Paper

Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur

Mark Davis, Alexander Marker, Lutz Aschke, Fredi Schubert, Ewald Moersen, Heiko Kohlmann, Ina Mitra, Jochen Alkemper, Rudolf Mueller, John Taylor, Kenneth Blaedel, Scott Hector

Proceedings Volume 4452, (2001) https://doi.org/10.1117/12.446884

KEYWORDS: Zerodur, Extreme ultraviolet lithography, Temperature metrology, Refractive index, Photomasks, Glasses, Polishing, Error analysis, Projection systems, Interferometers

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Proceedings Article | 20 August 2001 Paper

Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution

Regina Soufli, Eberhard Spiller, Mark Schmidt, Courtney Davidson, R. Fred Grabner, Eric Gullikson, Benjamin Kaufmann, Stanley Mrowka, Sherry Baker, Henry Chapman, Russell Hudyma, John Taylor, Christopher Walton, Claude Montcalm, James Folta

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436695

KEYWORDS: Multilayers, Mirrors, Reflectivity, Optical coatings, Extreme ultraviolet lithography, Scattering, Extreme ultraviolet, Light scattering, Imaging systems, Cameras

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Proceedings Article | 20 August 2001 Paper

System integration and performance of the EUV engineering test stand

Daniel Tichenor, Avijit Ray-Chaudhuri, William Replogle, Richard Stulen, Glenn Kubiak, Paul Rockett, Leonard Klebanoff, Karen Jefferson, Alvin Leung, John Wronosky, Layton Hale, Henry Chapman, John Taylor, James Folta, Claude Montcalm, Regina Soufli, Eberhard Spiller, Kenneth Blaedel, Gary Sommargren, Donald Sweeney, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Jeffrey Bokor, Phillip Batson, David Attwood, Keith Jackson, Scott Hector, Charles Gwyn, Pei-yang Yan

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436665

KEYWORDS: Extreme ultraviolet, Semiconducting wafers, Reticles, Projection systems, Sensors, Xenon, Mirrors, Optical alignment, Fiber optic illuminators, Multilayers

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Proceedings Article | 22 January 2001 Paper

Predictive model of the cost of extreme-ultraviolet lithography masks

Scott Hector, Patrick Kearney, Claude Montcalm, James Folta, Christopher Walton, William Tong, John Taylor, Pei-yang Yan, Charles Gwyn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410754

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Inspection, Coating, Optical lithography, Lithography, Process modeling, Defect detection, Ion beams

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Proceedings Article | 21 July 2000 Paper

EUVL printing results of a low-thermal expansion material (LTEM) mask

William Tong, John Taylor, Scott Hector, Melissa Shell, Guojing Zhang, Patrick Kearney, Christopher Walton, Cindy Larson, James Wasson, Pawitter Mangat, Donna O'Connell, Daniel Folk

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390038

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Silicon, Manufacturing, Printing, Distortion, Lithography, Extreme ultraviolet, Reflectivity

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Proceedings Article | 21 July 2000 Paper

EUV engineering test stand

Daniel Tichenor, Glenn Kubiak, William Replogle, Leonard Klebanoff, John Wronosky, Layton Hale, Henry Chapman, John Taylor, James Folta, Claude Montcalm, Russell Hudyma, Kenneth Goldberg, Patrick Naulleau

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390083

KEYWORDS: Extreme ultraviolet, Reticles, Projection systems, Mirrors, Semiconducting wafers, Distortion, Optical alignment, Fiber optic illuminators, Tolerancing, Optical design

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Proceedings Article | 30 December 1999 Paper

Mask substrate requirements and development for extreme ultraviolet lithography (EUVL)

William Tong, John Taylor, Scott Hector, Melissa Shell

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373338

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Silicon, Surface finishing, Distortion, Extreme ultraviolet, Chemical mechanical planarization, Printing, Atomic force microscopy

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Proceedings Article | 25 June 1999 Paper

Sub-100-nm lithographic imaging with an EUV 10X microstepper

John Goldsmith, Kurt Berger, Dan Bozman, Gregory Cardinale, Daniel Folk, Craig Henderson, Donna O'Connell, Avijit Ray-Chaudhuri, Kenneth Stewart, Daniel Tichenor, Henry Chapman, Richard Gaughan, Russell Hudyma, Claude Montcalm, Eberhard Spiller, John Taylor, Jeffrey Williams, Kenneth Goldberg, Eric Gullikson, Patrick Naulleau, Jonathan Cobb

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351097

KEYWORDS: Cameras, Extreme ultraviolet, Imaging systems, Lithography, Extreme ultraviolet lithography, Projection systems, Photoresist developing, Photomasks, Wavefronts, Photoresist materials

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Proceedings Article | 25 June 1999 Paper

EUV scattering and flare of 10X projection cameras

Eric Gullikson, Sherry Baker, John Bjorkholm, Jeffrey Bokor, Kenneth Goldberg, John Goldsmith, Claude Montcalm, Patrick Naulleau, Eberhard Spiller, Daniel Stearns, John Taylor, James Underwood

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351162

KEYWORDS: Scattering, Cameras, Mirrors, Extreme ultraviolet, Spatial frequencies, Point spread functions, Light scattering, Multilayers, Laser scattering, Coating

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Proceedings Article | 5 June 1998 Paper

Fabrication and testing of optics for EUV projection lithography

John Taylor, Gary Sommargren, Donald Sweeney, Russell Hudyma

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309619

KEYWORDS: Extreme ultraviolet lithography, Aspheric lenses, Reflectivity, Mirrors, Surface finishing, Scattering, Spherical lenses, Optical fabrication, Extreme ultraviolet, Wavefronts

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Proceedings Article | 8 September 1995 Paper

Performance evaluation of bound diamond ring tools

Mark Piscotty, John Taylor, Kenneth Blaedel

Proceedings Volume 2536, (1995) https://doi.org/10.1117/12.218428

KEYWORDS: Diamond, Optics manufacturing, Manufacturing, Spindles, Spherical lenses, Glasses, Scanning electron microscopy, Precision optics, Surface roughness, Abrasives

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