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JongSeop Kim
at SK hynix system ic Inc
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Publications (1)
Proceedings Article | 12 November 2024 Presentation + Paper
New EUV mask and blanks for DRAM 1a nm and beyond
Hiroshi Hanekawa, Yoshiaki Ikuta, Jongsub Kim, Hyunman Jo, Sangjin Jo, Euisang Park, Sungha Woo, Chanha Park
Proceedings Volume 13215, 132150E (2024) https://doi.org/10.1117/12.3034600
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Hydrogen, Scanners, Plasma, Optical properties, Lithography, Reflectivity, Inspection, Dry etching
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