Dr. Joseph Pankert Profile

Dr. Joseph Pankert

Vice President at Philips Lighting BV

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Publications (8)

Proceedings Article | 29 January 2008 Paper

VCSEL-based miniature laser-Doppler interferometer

Armand Pruijmboom, Marcel Schemmann, Jochen Hellmig, Jeroen Schutte, Holger Moench, Joseph Pankert

Proceedings Volume 6908, 69080I (2008) https://doi.org/10.1117/12.775131

KEYWORDS: Sensors, Vertical cavity surface emitting lasers, Laser scattering, Modulation, Speckle pattern, Light scattering, Laser optics, Doppler effect, Signal detection, Laser applications

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Proceedings Article | 3 May 2007 Paper

Status report on EUV source development and EUV source applications in EUVL

Vivek Bakshi, Rainer Lebert, Bernhard Jägle, Christian Wies, Uwe Stamm, Juergen Kleinschmidt, Guido Schriever, Christian Ziener, Marc Corthout, Joseph Pankert, Klaus Bergmann, Willi Neff, André Egbert, Deborah Gustafson

Proceedings Volume 6533, 653315 (2007) https://doi.org/10.1117/12.737183

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Xenon, Plasma, Tin, Electrodes, Photomasks, Scanners, Lithography, Mirrors

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Proceedings Article | 23 March 2006 Paper

EUV sources for the alpha-tools

Joseph Pankert, Rolf Apetz, Klaus Bergmann, Marcel Damen, Günther Derra, Oliver Franken, Maurice Janssen, Jeroen Jonkers, Jürgen Klein, Helmar Kraus, Thomas Krücken, Andreas List, Micheal Loeken, Arnaud Mader, Christof Metzmacher, Willi Neff, Sven Probst, Ralph Prümmer, Oliver Rosier, Stefan Schwabe, Stefan Seiwert, Guido Siemons, Dominik Vaudrevange, Dirk Wagemann, Achim Weber, Oliver Zitzen

Proceedings Volume 6151, 61510Q (2006) https://doi.org/10.1117/12.657066

KEYWORDS: Tin, Extreme ultraviolet, Scanners, Lamps, Electrodes, Reflectivity, Control systems, Extreme ultraviolet lithography, Interfaces, Control systems design

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Proceedings Article | 16 June 2005 Paper

Progress on EUV-source development, tool integration and applications

Rainer Lebert, Bernhard Jagle, Christian Wies, Uwe Stamm, Juergen Kleinschmidt, Kai Gaebel, Guido Schriever, Joseph Pankert, Klaus Bergmann, Willi Neff, Andre Egbert

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637333

KEYWORDS: Extreme ultraviolet, Plasma, Extreme ultraviolet lithography, Lithography, Metrology, Xenon, Photomasks, Tin, Reflectivity, Magnetism

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Proceedings Article | 6 May 2005 Paper

Integrating Philips’ extreme UV source in the alpha-tools

Joseph Pankert, Rolf Apetz, Klaus Bergmann, Guenther Derra, Maurice Janssen, Jeroen Jonkers, Jurgen Klein, Thomas Kruecken, Andreas List, Michael Loeken, Christof Metzmacher, Willi Neff, Sven Probst, Ralph Prummer, Oliver Rosier, Stefan Seiwert, Guido Siemons, Dominik Vaudrevange, Dirk Wagemann, Achim Weber, Peter Zink, Oliver Zitzen

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598650

KEYWORDS: Tin, Lamps, Extreme ultraviolet, Reflectivity, Xenon, Ruthenium, Control systems, Electrodes, Extreme ultraviolet lithography, Chemical species

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Proceedings Article | 20 May 2004 Paper

Status of Philips' extreme UV source

Joseph Pankert, Klaus Bergmann, Juergen Klein, Willi Neff, Oliver Rosier, Stefan Seiwert, Christopher Smith, Sven Probst, Dominik Vaudrevange, Guido Siemons, Rolf Apetz, Jeroen Jonkers, Michael Loeken, Guenther Derra, Thomas Kruecken, Peter Zink

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538041

KEYWORDS: Tin, Xenon, Extreme ultraviolet, Plasma, Lamps, Ions, Electrodes, Diffusion, Physics, Chemical species

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Proceedings Article | 16 June 2003 Paper

Physical properties of the HCT EUV source

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483611

KEYWORDS: Extreme ultraviolet, Xenon, Plasma, Tin, Ions, Electrodes, Ionization, Extreme ultraviolet lithography, Magnetism, Scanners

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Proceedings Article | 1 July 2002 Paper

Physical properties of the HCT EUV source

Joseph Pankert, Klaus Bergmann, J. Klein, Willi Neff, Oliver Rosier, Stefan Seiwert, Christopher Smith, Rolf Apetz, Jeroen Jonkers, Michael Loeken, Guenther Derra

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472271

KEYWORDS: Extreme ultraviolet, Optical filters, Electrodes, Deep ultraviolet, Image filtering, Xenon, Extreme ultraviolet lithography, Lamps, Switching, Mirrors

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Showing 5 of 8 publications

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