Ms. Karla A. Romero Profile

Karla A. Romero

at AMD Saxony Mfg GmbH

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Author

Publications (2)

Proceedings Article | 21 March 2007 Paper

Minimizing poly end cap pull back by application of DFM and advanced etch approaches for 65nm and 45nm technologies

Russell Callahan, Gunter Grasshoff, Stefan Roling, Joseph Shannon, Asuka Nomura, Sarah McGowan, Cyrus Tabery, Karla Romero

Proceedings Volume 6521, 65211Q (2007) https://doi.org/10.1117/12.712161

KEYWORDS: Etching, Chemistry, Fluorine, Chlorine, Lithography, Bromine, Line edge roughness, Manufacturing, Semiconducting wafers, Optical proximity correction

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Proceedings Article | 13 March 2006 Paper

CD analysis of advanced photolithography and its impact on critical design structures

Karla Romero, Rolf Seltmann, Gert Burbach, Rolf Stephan, Joerg Paufler, David Greenlaw

Proceedings Volume 6156, 61560D (2006) https://doi.org/10.1117/12.657131

KEYWORDS: Transistors, Critical dimension metrology, Optical lithography, Line edge roughness, Structural design, Image processing, Scanners, Monochromatic aberrations, Semiconducting wafers, Etching

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