Dr. Kenji Yamazoe Profile

Dr. Kenji Yamazoe

at TSMC North America

SPIE Involvement:

Conference Program Committee | Author

Proceedings Article | 19 May 2011 Paper

Collaborative research on emerging technologies and design

Andrew Neureuther, Juliet Rubinstein, Marshal Miller, Kenji Yamazoe, Eric Chin, Cooper Levy, Lynn Wang, Nuo Xu, Costas Spanos, Kun Qian, Kameshwar Poolla, Justin Ghan, Anand Subramanian, Tsu-Jae King Liu, Xin Sun, Kwangok Jeong, Puneet Gupta, Abde Kaqalwalla, Rani Ghaida, Tuck Boon Chan

Proceedings Volume 8081, 80810N (2011) https://doi.org/10.1117/12.899394

KEYWORDS: Photomasks, Double patterning technology, Lithography, Image processing, Line edge roughness, Algorithm development, Reticles, Inspection, Design for manufacturing, Device simulation

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Proceedings Article | 8 April 2011 Paper

Quantitative evaluation of mask phase defects from through-focus EUV aerial images

Iacopo Mochi, Kenneth Goldberg, Ryan Xie, Pei-Yang Yan, Kenji Yamazoe

Proceedings Volume 7969, 79691X (2011) https://doi.org/10.1117/12.881652

KEYWORDS: Reconstruction algorithms, Extreme ultraviolet, Atomic force microscopy, Photomasks, Inspection, Algorithm development, Computer simulations, Microscopes, Phase measurement, Imaging systems

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Proceedings Article | 10 March 2010 Paper

Automatic numerical determination of lateral influence functions for fast-CAD

Marshal Miller, Kenji Yamazoe, Andrew Neureuther

Proceedings Volume 7640, 764031 (2010) https://doi.org/10.1117/12.846630

KEYWORDS: Photomasks, Composites, Convolution, Polarization, Monochromatic aberrations, Lithography, Electromagnetism, Calibration, Binary data, Detection and tracking algorithms

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Proceedings Article | 4 March 2010 Paper

Aerial image calculation by eigenvalues and eigenfunctions of a matrix that includes source, pupil, and mask

Kenji Yamazoe, Andrew Neureuther

Proceedings Volume 7640, 76400N (2010) https://doi.org/10.1117/12.846666

KEYWORDS: Diffraction, Matrices, Image acquisition, Principal component analysis, Imaging systems, Coherence imaging, Fourier transforms, System on a chip, Coherence (optics), Light sources

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Proceedings Article | 30 September 2009 Paper

Extensions of boundary layer modeling of photomask topography effects to fast-CAD using pattern matching

Marshal Miller, Kenji Yamazoe, Andrew Neureuther

Proceedings Volume 7488, 74883H (2009) https://doi.org/10.1117/12.829657

KEYWORDS: Photomasks, Composites, Monochromatic aberrations, Fourier transforms, Lithography, Zernike polynomials, Airborne remote sensing, Polarization, Electromagnetism, Semiconducting wafers

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SPIE Journal Paper | 1 July 2009

Aerial image back propagation with two-dimensional transmission cross coefficient

Kenji Yamazoe, Yoshiyuki Sekine, Tokuyuki Honda

JM3, Vol. 8, Issue 03, 031406, (July 2009) https://doi.org/10.1117/12.10.1117/1.3206980

KEYWORDS: Fourier transforms, Linear filtering, Image transmission, Resolution enhancement technologies, Computer simulations, Phase shifting, Photomasks, Binary data, Coherence imaging, Lithography

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Proceedings Article | 19 May 2008 Paper

Extension of the 2D-TCC technique to optimize mask pattern layouts

Manabu Hakko, Kenji Yamazoe, Miyoko Kawashima, Yoshiyuki Sekine, Masakatsu Ohta, Tokuyuki Honda

Proceedings Volume 7028, 70280Z (2008) https://doi.org/10.1117/12.793041

KEYWORDS: Photomasks, Calcium, Optical proximity correction, Curium, Printing, Semiconducting wafers, Resolution enhancement technologies, Model-based design, Scanning electron microscopy, Computer simulations

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Proceedings Article | 7 March 2008 Paper

Mask optimization for arbitrary patterns with 2D-TCC resolution enhancement technique

Miyoko Kawashima, Kenji Yamazoe, Yoshiyuki Sekine, Manabu Hakko, Masakatsu Ohta, Tokuyuki Honda

Proceedings Volume 6924, 69240F (2008) https://doi.org/10.1117/12.771943

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Source mask optimization, Photomasks, Fourier transforms, Critical dimension metrology, Scattering, Cadmium, Image enhancement, Image transmission

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Proceedings Article | 30 October 2007 Paper

Resolution enhancement by aerial image approximation with 2D-TCC

Kenji Yamazoe, Yoshiyuki Sekine, Miyoko Kawashima, Manabu Hakko, Tomomi Ono, Tokuyuki Honda

Proceedings Volume 6730, 67302H (2007) https://doi.org/10.1117/12.746862

KEYWORDS: Reticles, SRAF, Image enhancement, Fourier transforms, Resolution enhancement technologies, Light sources, Image resolution, Polarization, Printing, Binary data

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Proceedings Article | 22 March 2006 Paper

Visible light point-diffraction interferometer for testing of EUVL optics

Seiji Takeuchi, Osamu Kakuchi, Kenji Yamazoe, Yoshio Gomei, Todd Decker, Michael Johnson, Donald Phillion, John Taylor

Proceedings Volume 6151, 61510E (2006) https://doi.org/10.1117/12.656275

KEYWORDS: Wavefronts, Interferometers, Polarization, Optical testing, Calibration, Monochromatic aberrations, Visible radiation, Extreme ultraviolet lithography, Near field optics, Zernike polynomials

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Proceedings Article | 12 May 2005 Paper

Analysis of imaging properties for hyper-NA ArF immersion lithography

Yoshiyuki Sekine, Miyoko Kawashima, Kenji Yamazoe, Tokuyuki Honda, Akinori Ohkubo, Yasuhiro Kishikawa, Yuichi Iwasaki, Akiyoshi Suzuki

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600500

KEYWORDS: Photomasks, Projection systems, Refractive index, Water, Diffraction, Polarization, Immersion lithography, Critical dimension metrology, Microfluidics, Imaging systems

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Proceedings Article | 28 May 2004 Paper

Evaluation of IDEALSmile for 90-nm FLASH memory contact holes imaging with ArF scanner

Pietro Cantu, Gianfranco Capetti, Sara Loi, Marco Lupo, Annalisa Pepe, Kenji Saitoh, Kenji Yamazoe, Yasuo Hasegawa, Junji Iwasa, Olivier Toublan

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534065

KEYWORDS: Monochromatic aberrations, Printing, Photomasks, Optical proximity correction, Scanners, Binary data, Resolution enhancement technologies, Lithography, Spherical lenses, Visualization

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Proceedings Article | 1 August 2002 Paper

New resolution enhancement method realizing the limit of single mask exposure

Kenji Yamazoe, Masanobu Hasegawa, Kenji Saitoh, Akiyoshi Suzuki

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477002

KEYWORDS: Photomasks, Binary data, Optical lithography, Resolution enhancement technologies, Lithography, Printing, Semiconducting wafers, Projection systems, Double patterning technology

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Proceedings Article | 30 July 2002 Paper

Challenging the limit of single mask exposure

Kenji Yamazoe, Masanobu Hasegawa, Kenji Saitoh, Akiyoshi Suzuki

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474549

KEYWORDS: Photomasks, Binary data, Lithography, Lithographic illumination, Optical lithography, Printing, Resolution enhancement technologies, Double patterning technology, Scanners, Reticles

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Showing 5 of 14 publications

Conference Committee Involvement (4)

Optical and EUV Nanolithography XXXVIII

23 February 2025 | San Jose, California, United States

Optical and EUV Nanolithography XXXVII

26 February 2024 | San Jose, California, United States

Optical and EUV Nanolithography XXXVI

27 February 2023 | San Jose, California, United States

Optical and EUV Nanolithography XXXV

25 April 2022 | San Jose, California, United States

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