Mr. Kentaro Matsunaga Profile

Kentaro Matsunaga

Researcher

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 16 April 2011 Paper

Paper

The resist-core spacer patterning process for fabrication of 2xnm node semiconductor devices

Koutarou Sho, Tomoya Oori, Kazunori Iida, Katsutoshi Kobayashi, Keisuke Kikutani, Katsumi Yamamoto, Fumiki Aiso, Kentaro Matsunaga, Eishi Shiobara, Koji Hashimoto

Proceedings Volume 7972, 79720C (2011) https://doi.org/10.1117/12.877616

KEYWORDS: Etching, Photomasks, Lithography, Optical lithography, Semiconductors, Scanning electron microscopy, Photoresist processing, Silica, Double patterning technology, Critical dimension metrology

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Proceedings Article | 16 April 2011 Paper

Paper

Performance of EUV molecular resists based on fullerene derivatives

Hiroaki Oizumi, Kentaro Matsunaga, Koji Kaneyama, Julius Joseph Santillan, Gousuke Shiraishi, Toshiro Itani

Proceedings Volume 7972, 797209 (2011) https://doi.org/10.1117/12.879302

KEYWORDS: Fullerenes, Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Photoresist processing, Semiconducting wafers, Semiconductors, Etching, Scanning electron microscopy

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Proceedings Article | 8 April 2011 Paper

Paper

Manufacturability of 2x-nm devices with EUV tool

Kazuo Tawarayama, Yumi Nakajima, Suigen Kyoh, Hajime Aoyama, Kentaro Matsunaga, Shunko Magoshi, Satoshi Tanaka, Yumi Hayashi, Ichiro Mori

Proceedings Volume 7969, 79691L (2011) https://doi.org/10.1117/12.879333

KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Reactive ion etching, Extreme ultraviolet, Lithography, Lithographic illumination, Semiconducting wafers, Yield improvement, Semiconductors, Photoresist processing

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Proceedings Article | 5 April 2011 Paper

Paper

Resolution capability of SFET with slit and dipole illumination

Yuusuke Tanaka, Kentaro Matsunaga, Shunko Magoshi, Seiichiro Shirai, Kazuo Tawarayama, Hiroyuki Tanaka

Proceedings Volume 7969, 79690Q (2011) https://doi.org/10.1117/12.870332

KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Photomasks, Extreme ultraviolet, Wafer-level optics, Modulation, Control systems, Projection systems, Lithography

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Proceedings Article | 25 March 2011 Paper

Paper

Development status of EUV resist materials and processing at Selete

Kentaro Matsunaga, Gousuke Shiraishi, Julius Joseph Santillian, Koji Kaneyama, Hiroaki Oizumi, Toshiro Itani

Proceedings Volume 7969, 796905 (2011) https://doi.org/10.1117/12.878432

KEYWORDS: Lithography, Line width roughness, Photoresist processing, Extreme ultraviolet, Extreme ultraviolet lithography, Polymers, Etching, Semiconductors, Manufacturing, Scanning electron microscopy

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Proceedings Article | 31 March 2010 Paper

Paper

Study on acid diffusion length effect with PAG-blended system and anion-bounded polymer system

Shinji Tarutani, Hideaki Tsubaki, Hidenori Takahashi, Takayuki Itou, Kentaro Matsunaga, Gousuke Shiraishi, Toshiro Itani

Proceedings Volume 7639, 76391O (2010) https://doi.org/10.1117/12.846033

KEYWORDS: Polymers, Diffusion, Lithography, Line width roughness, Semiconducting wafers, Polymer thin films, Extreme ultraviolet lithography, Research management, Optical lithography, Photoresist processing

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Proceedings Article | 26 March 2010 Paper

Paper

Development of EUV resists based on various new materials

Hiroaki Oizumi, Kazuyuki Matsumaro, Julius Santillan, Gousuke Shiraishi, Koji Kaneyama, Kentaro Matsunaga, Toshiro Itani

Proceedings Volume 7639, 76390R (2010) https://doi.org/10.1117/12.846429

KEYWORDS: Fullerenes, Extreme ultraviolet lithography, Line width roughness, Extreme ultraviolet, Lithography, Semiconductors, Manufacturing, Photoresist processing, Scanning electron microscopy, Etching

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Proceedings Article | 23 March 2010 Paper

Paper

Alternative resist processes for LWR reduction in EUVL

Koji Kaneyama, Kentaro Matsunaga, Gousuke Shiraishi, Julius Joseph Santillan, Toshiro Itani

Proceedings Volume 7636, 763633 (2010) https://doi.org/10.1117/12.846073

KEYWORDS: Line width roughness, Photoresist processing, Scanning electron microscopy, Extreme ultraviolet lithography, Extreme ultraviolet, Protactinium, Semiconducting wafers, Lithography, Standards development, Cooling systems

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Proceedings Article | 23 March 2010 Paper

Paper

Fabrication of 35nm via-hole patterns for interconnect test chips with EUV lithography

Yuusuke Tanaka, Hajime Aoyama, Kazuo Tawarayama, Shunko Magoshi, Daisuke Kawamura, Kentaro Matsunaga, Takashi Kamo, Yukiyasu Arisawa, Taiga Uno, Hiroyuki Tanaka, Naofumi Nakamura, Eiichi Soda, Noriaki Oda, Shuichi Saito, Ichiro Mori

Proceedings Volume 7636, 76362D (2010) https://doi.org/10.1117/12.846315

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Metals, Extreme ultraviolet, Semiconducting wafers, Critical dimension metrology, Semiconductors, Anisotropy, Error analysis

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Proceedings Article | 23 March 2010 Paper

Paper

Applicability of extreme ultraviolet lithography to fabrication of half pitch 35nm interconnects

Hajime Aoyama, Yuusuke Tanaka, Kazuo Tawarayama, Naofumi Nakamura, Eiichi Soda, Noriaki Oda, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Kentaro Matsunaga, Daisuke Kawamura, Toshihiko Tanaka, Hiroyuki Tanaka, Shuichi Saito, Ichiro Mori

Proceedings Volume 7636, 76361N (2010) https://doi.org/10.1117/12.846325

KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Photomasks, Etching, Photoresist processing, Overlay metrology, Lithography, Scanning electron microscopy

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Proceedings Article | 23 March 2010 Paper

Paper

Process liability evaluation for beyond 22nm node using EUVL

Kazuo Tawarayama, Hajime Aoyama, Kentaro Matsunaga, Yukiyasu Arisawa, Taiga Uno, Shunko Magoshi, Suigen Kyoh, Yumi Nakajima, Ryoichi Inanami, Satoshi Tanaka, Ayumi Kobiki, Yukiko Kikuchi, Daisuke Kawamura, Kosuke Takai, Koji Murano, Yumi Hayashi, Ichiro Mori

Proceedings Volume 7636, 76361O (2010) https://doi.org/10.1117/12.846265

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Manufacturing, Lithography, Etching, Extreme ultraviolet, Photoresist processing, Reactive ion etching, Silica, Metals

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Proceedings Article | 20 March 2010 Paper

Paper

Development of resist material and process for hp-2x-nm devices using EUV lithography

Kentaro Matsunaga, Hiroaki Oizumi, Koji Kaneyama, Gousuke Shiraishi, Kazuyuki Matsumaro, Julius Joseph Santillan, Toshiro Itani

Proceedings Volume 7636, 76360S (2010) https://doi.org/10.1117/12.846088

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photoresist processing, Line width roughness, Extreme ultraviolet, Manufacturing, Materials processing, Semiconductors, Analytical research, Semiconducting wafers

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Proceedings Article | 1 April 2009 Paper

Paper

Feasibility studies of coating method for planarization process

Kentaro Matsunaga, Tomoya Oori, Hirokazu Kato, Eishi Shiobara, Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Yusuke Horiguchi, Tomoya Ohashi, Satoshi Takei, Shinichi Ito

Proceedings Volume 7273, 72734E (2009) https://doi.org/10.1117/12.813647

KEYWORDS: Ultraviolet radiation, Coating, Lithography, Materials processing, Atomic force microscopy, Critical dimension metrology, Semiconducting wafers, Photoresist processing, Polymers, Scanning transmission electron microscopy

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Proceedings Article | 15 April 2008 Paper

Paper

LWR reduction in low-k1 ArF-immersion lithography

Kentaro Matsunaga, Tomoya Oori, Hirokazu Kato, Daisuke Kawamura, Eishi Shiobara, Yuichiro Inatomi, Tetsu Kawasaki, Mitsuaki Iwashita, Shinichi Ito

Proceedings Volume 6923, 69231E (2008) https://doi.org/10.1117/12.771922

KEYWORDS: Photoresist processing, Line width roughness, Vacuum ultraviolet, Etching, Photomasks, Immersion lithography, Image processing, Lithography, Natural surfaces, Semiconducting wafers

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Proceedings Article | 2 April 2007 Paper

Paper

Defectivity reduction studies for ArF immersion lithography

Kentaro Matsunaga, Takehiro Kondoh, Hirokazu Kato, Yuuji Kobayashi, Kei Hayasaki, Shinichi Ito, Akira Yoshida, Satoru Shimura, Tetsu Kawasaki, Hideharu Kyoda

Proceedings Volume 6519, 65191T (2007) https://doi.org/10.1117/12.711331

KEYWORDS: Bridges, Semiconducting wafers, Immersion lithography, Lithography, Scanners, 193nm lithography, Structural health monitoring, Digital watermarking, Thin film coatings, Defect inspection

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Proceedings Article | 29 March 2006 Paper

Paper

Pattern defect study using cover material film in immersion lithography

Daisuke Kawamura, Tomoyuki Takeishi, Kentarou Matsunaga, Eishi Shiobara, Yasunobu Oonishi, Shinichi Ito

Proceedings Volume 6153, 61531Q (2006) https://doi.org/10.1117/12.655505

KEYWORDS: Semiconducting wafers, Coating, Immersion lithography, Particles, Inspection, Silicon, Wafer inspection, Wafer testing, Water, Digital watermarking

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Proceedings Article | 4 May 2005 Paper

Paper

Influence of the watermark in immersion lithography process

Daisuke Kawamura, Tomoyuki Takeishi, Koutarou Sho, Kentarou Matsunaga, Naofumi Shibata, Kaoru Ozawa, Satoru Shimura, Hideharu Kyoda, Tetsu Kawasaki, Seiki Ishida, Takayuki Toshima, Yasunobu Oonishi, Shinichi Ito

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599314

KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Digital watermarking, Immersion lithography, Silicon, Photoresist processing, Thin film coatings, Coating, Liquids, Water

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Proceedings Article | 14 May 2004 Paper

Paper

Advances in resist pattern transfer process using 157-nm lithography

Takamitsu Furukawa, Takuya Hagiwara, Etsurou Kawaguchi, Kentaro Matsunaga, Toshifumi Suganaga, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535177

KEYWORDS: Reactive ion etching, Lithography, Photomasks, Photoresist processing, Etching, Binary data, Semiconductors, Optical lithography, Lithographic illumination, Line edge roughness

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Proceedings Article | 14 May 2004 Paper

Paper

Airborne contamination control for 157-nm lithography: influence of ammonia contamination

Hidefumi Matsui, Junichi Kitano, Kosuke Yoshihara, Etsurou Kawaguchi, Takamitsu Furukawa, Kentaro Matsunaga, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534975

KEYWORDS: Contamination, Lithography, Polymers, Coating, Transmittance, Adsorption, Contamination control, Critical dimension metrology, Polymer thin films, Spectroscopy

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Proceedings Article | 24 August 2001 Paper

Paper

Dependence of resist profile on exposed area ratio

Eishi Shiobara, Daisuke Kawamura, Kentaro Matsunaga, Yasunobu Onishi

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436896

KEYWORDS: Ear, Semiconducting wafers, Photomasks, Photoresist processing, Lithography, Semiconductors, Image processing, Process control, Critical dimension metrology, Scanning electron microscopy

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Proceedings Article | 29 June 1998 Paper

Paper

Resist edge roughness with reducing pattern size

Eishi Shiobara, Daisuke Kawamura, Kentaro Matsunaga, Toru Koike, Shoji Mimotogi, Tsukasa Azuma, Yasunobu Onishi

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312421

KEYWORDS: Edge roughness, Solids, Photography, Excimer lasers, Radium, Laser scanners, 3D scanning, Scanning electron microscopy, Microelectronics, Quenching (fluorescence)

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Showing 5 of 21 publications

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