Dr. Klaus Kornitzer Profile

Dr. Klaus Kornitzer

Dr. at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Publications (2)

Proceedings Article | 4 December 2008 Paper

Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner

Wim de Boeij, Gerald Dicker, Marten de Wit, Frank Bornebroek, Mark Zellenrath, Harm-Jan Voorma, Bart Smeets, Rene Toussaint, Bart Paarhuis, Marteijn de Jong, Dirk Hellweg, Klaus Kornitzer

Proceedings Volume 7140, 71401B (2008) https://doi.org/10.1117/12.805381

KEYWORDS: Semiconducting wafers, Scanners, Fiber optic illuminators, Lithography, Imaging systems, Overlay metrology, Polarization, Monochromatic aberrations, Reticles, Optical design

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Proceedings Article | 26 June 2003 Paper

Performance of a high-NA dual-stage 193-nm TWINSCAN Step and Scan system for 80-nm applications

Jos de Klerk, Louis Jorritsma, Eelco van Setten, Richard Droste, Richard du Croo de Jongh, Steven Hansen, Dan Smith, Mark van de Kerkhof, Frank van de Mast, Paul Graeupner, Thomas Rohe, Klaus Kornitzer

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485372

KEYWORDS: Imaging systems, Photomasks, Semiconducting wafers, Control systems, Binary data, Reticles, Optics manufacturing, Critical dimension metrology, Phase shifts, Distortion

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