CONFERENCE PROCEEDINGS
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Kyo Otsubo
at Toshiba Materials Co Ltd
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Publications (3)
Proceedings Article | 19 May 2008 Paper
Novel model of haze generation on photomask
Haruko Akutsu, Shinji Yamaguchi, Kyo Otsubo, Makiko Tamaoki, Ayako Shimazaki, Reiko Yoshimura, Fumihiko Aiga, Tsukasa Tada
Proceedings Volume 7028, 702829 (2008) https://doi.org/10.1117/12.793083
KEYWORDS: Air contamination, Photomasks, Raman spectroscopy, Molybdenum, Particles, Chemical analysis, Quartz, Ions, Testing and analysis, Scanning electron microscopy
Proceedings Article | 19 May 2008 Paper
Application of two-fluid nozzles for advanced photomask cleaning process
Kenji Masui, Tetsuo Takemoto, Kyo Otsubo, Mari Sakai, Tomotaka Higaki, Hidehiro Watanabe, Tsutomu Kikuchi, Yoshiaki Kurokawa
Proceedings Volume 7028, 702809 (2008) https://doi.org/10.1117/12.793018
KEYWORDS: Particles, Photomasks, Mask cleaning, Liquids, Mechatronics, Velocity measurements, Phase measurement, Cavitation, Quartz
Proceedings Article | 11 May 2007 Paper
Mask quality assurance in cleaning for haze elimination using flexible mask specifications
Kyo Otsubo, Shinji Yamaguchi, Yukiyasu Arisawa, Hidefumi Mukai, Toshiya Kotani, Hiromitsu Mashita, Hiromitsu Hashimoto, Takashi Kamo, Tomohiro Tsutsui, Osamu Ikenaga
Proceedings Volume 6607, 660708 (2007) https://doi.org/10.1117/12.728921
KEYWORDS: Photomasks, Lithography, Air contamination, Transmittance, Semiconducting wafers, Critical dimension metrology, Semiconductors, Computer simulations, Scanning electron microscopy, Manufacturing
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