CONFERENCE PROCEEDINGS
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Dr. Kyung-Me Kim
at Samsung Electronics Co Ltd
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Author
Publications (5)
Proceedings Article | 4 May 2005 Paper
ArF photoresist parameter optimization for mask error enhancement factor reduction
Chang Ho Lee, Seok Han, Kyung Sil Park, Hye Young Kang, Hyun Wook Oh, Ji Eun Lee, Kyung Me Kim, Young Ho Kim, Tae Sung Kim, Hye-Keun Oh
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600308
KEYWORDS: Photomasks, Semiconducting wafers, Photoresist materials, Line edge roughness, Absorbance, Critical dimension metrology, Polymers, Photoresist processing, Diffusion, Optical properties
Proceedings Article | 14 May 2004 Paper
Influence of resin properties to resist performance at ArF lithography
Sangwoong Yoon, Myungsun Kim, Hong Lee, Do Kim, Young Hoon Kim, Boo Deuk Kim, Jae Hyun Kim, Kyung-Mee Kim, Shi Yong Lee, Young Ho Kim, Sang-Mun Chon
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533950
KEYWORDS: Line edge roughness, Lithography, Palladium, Polymers, Ultraviolet radiation, Polymerization, Manganese, Photoresist materials, Sensors, Critical dimension metrology
Proceedings Article | 14 May 2004 Paper
Influence of activation energy on LER in chemically amplified KrF photoresists
Jae Hyun Kim, Chang Ho Lee, Seok Bong Park, Won Mi Kim, Sang Sik Moon, Kyung-Mee Kim, Shi Yong Lee, Sangwoong Yoon, Young Ho Kim, Sang-Mun Chon
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533880
KEYWORDS: Diffusion, Photoresist materials, Line edge roughness, Polymers, Atomic force microscopy, Temperature metrology, Scanning electron microscopy, Photoresist developing, Lithography, Glasses
Proceedings Article | 14 May 2004 Paper
Comprehensive analysis of sources of total CD variation in ArF resist perspective
Hyun-Woo Kim, Hyung-Rae Lee, Kyung-Mee Kim, Shi Yong Lee, Bong-Cheol Kim, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534806
KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Line edge roughness, Photoresist processing, Diffusion, Lithography, Temperature metrology, Scanners, Scatterometry
Proceedings Article | 14 May 2004 Paper
Impact of BARC on SEM shrinkage of ArF resist
Shi Yong Lee, Myungsun Kim, Sangwoong Yoon, Kyung-Mee Kim, Jae Hyun Kim, Hyun-Woo Kim, Sang-Gyun Woo, Young Ho Kim, Sang-Mun Chon, Takahiro Kishioka, Yasuhisa Sone, Yasuyuki Nakajima
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533884
KEYWORDS: Scanning electron microscopy, Reflectivity, Critical dimension metrology, Inspection, Polymers, Silicon, Optical lithography, Time metrology, Lithography, Line edge roughness
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