Mr. Leo L. Linehan Profile

Leo L. Linehan

Director R&D at DuPont Electronics & Industrial

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Author

Publications (7)

Proceedings Article | 29 June 1998 Paper

Polymer-bound sensitizer in i-line resist formulations

Premlatha Jagannathan, Charlotte DeWan, Andrew Eckert, Rebecca Mih, Kathleen Martinek, Charles Richwine, Leo Linehan, Wayne Moreau, Randolph Smith

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312385

KEYWORDS: Polymers, Photoresist materials, Energy transfer, Lithography, Deep ultraviolet, Ultraviolet radiation, Absorbance, Microelectronics, Chemically amplified resists, Resistance

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Proceedings Article | 29 June 1998 Paper

Acid diffusion in a chemically amplified negative i-line photoresist

Judy Connolly, K. Rex Chen, Ranee Kwong, Margaret Lawson, Leo Linehan, Wayne Moreau

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312474

KEYWORDS: Diffusion, Photoresist materials, Oxides, Photoresist processing, Semiconducting wafers, Temperature metrology, Critical dimension metrology, Manufacturing, Photochemistry, Image quality

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Proceedings Article | 9 June 1995 Paper

Investigation into the origin of microbridging in chemically amplified negative-tone photoresists

Leo Linehan, Randolph Smith, Judy Dorn, James Fahey, Wayne Moreau, Gary Spinillo, Erik Puttlitz, James Collins

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210418

KEYWORDS: Photoresist materials, Photoresist developing, Standards development, Lithography, Microelectronics, Deep ultraviolet, Image quality, Semiconducting wafers, Photomasks, Chemistry

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Proceedings Article | 9 June 1995 Paper

Characterization of profile dependency on nitride substrate thickness for a chemically amplified I-line negative resist

Erik Puttlitz, James Collins, Thomas Glynn, Leo Linehan

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210380

KEYWORDS: Silicon, Semiconducting wafers, Oxides, Scanning electron microscopy, Interfaces, Photoresist processing, Manufacturing, Wafer-level optics, Optical lithography, Photomasks

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Proceedings Article | 9 June 1995 Paper

Shot-size reduction of photoresist formulations

Wayne Moreau, Kathleen Cornett, James Fahey, Leo Linehan, Warren Montgomery, Marina Plat, Randolph Smith, Robert Wood

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210363

KEYWORDS: Liquids, Semiconducting wafers, Coating, Photoresist materials, Polymers, Electroluminescence, Silicon, Solids, Thin film coatings, Photoresist processing

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Proceedings Article | 16 May 1994 Paper

0.25 um lithography development using positive mode top surface imaging photoresist

Douglas LaTulipe, John Simons, David Seeger, Leo Linehan

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175353

KEYWORDS: Semiconducting wafers, Etching, Photoresist processing, Lithography, Manufacturing, Photoresist developing, Photoresist materials, Silicon, Scanning electron microscopy, Chemistry

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Proceedings Article | 16 May 1994 Paper

I-line negative resist (INR): a negative-tone I-line chemically amplified photoresist

Leo Linehan, Gary Spinillo, Randolph Smith, Wayne Moreau, Barry McCormick, Robert Wood, Erik Puttlitz, James Collins, William Miller

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175347

KEYWORDS: Photoresist materials, Photoresist developing, Silicon, Manufacturing, Lithography, Photomasks, Etching, Microelectronics, Oxygen, Absorbance

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Showing 5 of 7 publications

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