Dr. Lynn Y. Cai Profile

Dr. Lynn Y. Cai

Senior Engineering Manager

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 20 March 2018 Presentation + Paper

A novel processing platform for post tape out flows

Hien Vu, Soohong Kim, James Word, Lynn Cai

Proceedings Volume 10587, 105870R (2018) https://doi.org/10.1117/12.2297240

KEYWORDS: Optical proximity correction, Photomasks, Data processing, Resolution enhancement technologies, SRAF, Computing systems, Parallel processing, Integrated circuits, Design for manufacturability

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Proceedings Article | 13 March 2012 Paper

Full field lithographical verification using scanner and mask intrafield fingerprint

J. Planchot, L. Depre, E. Yesilada, F. Robert, F. Sundermann, H. Y. Liu, L. Cai, F. Chen

Proceedings Volume 8326, 832617 (2012) https://doi.org/10.1117/12.916151

KEYWORDS: Scanners, Photomasks, Semiconducting wafers, Scanning electron microscopy, Lithography, Critical dimension metrology, Fiber optic illuminators, Metals, Optical proximity correction, Bridges

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Proceedings Article | 12 March 2008 Paper

Low-k1 logic design using gridded design rules

Michael Smayling, Hua-yu Liu, Lynn Cai

Proceedings Volume 6925, 69250B (2008) https://doi.org/10.1117/12.772875

KEYWORDS: Logic, Optical proximity correction, Critical dimension metrology, Scanners, Semiconducting wafers, Optical lithography, Etching, Photomasks, Resolution enhancement technologies, Fiber optic illuminators

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Proceedings Article | 20 May 2006 Paper

Simultaneous layout, process, and model optimization within an integrated design-for-yield environment

Dmitri Lapanik, Lynn Cai, Chung-Shin Kang, Bob Naber, Jason Sweis, Wolf Staud

Proceedings Volume 6283, 62832S (2006) https://doi.org/10.1117/12.681806

KEYWORDS: Process modeling, Optimization (mathematics), Resolution enhancement technologies, Manufacturing, Optical proximity correction, Photomasks, Calibration, Image processing, Semiconducting wafers, Systems modeling

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Proceedings Article | 5 May 2005 Paper

Lithography yield check for IC design

Lynn Cai, Ting Chen

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600636

KEYWORDS: Optical proximity correction, Lithography, Resolution enhancement technologies, Silicon, Photomasks, Yield improvement, Manufacturing, Semiconducting wafers, Imaging systems, Semiconductors

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Proceedings Article | 24 May 2004 Paper

Simulation-based mask quality control in a production environment

Linyong Pang, Jiunn-Hung Chen, Lynn Cai, Don Lee, Brian Chu, Vinsent Huang, Te-Yang Fang

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536081

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Inspection, Scanning electron microscopy, Decision support systems, Optical proximity correction, Tolerancing, Control systems, Defect detection

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Proceedings Article | 17 December 2003 Paper

Enhanced dispositioning of reticle defects for advanced masks using virtual stepper with automated defect severity scoring

Linyong Pang, Alex Lu, Jacky Chen, Eric Guo, Lynn Cai, Jiunn-Hung Chen

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518211

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Reticles, Optical proximity correction, Virtual reality, Artificial intelligence, Tolerancing, Decision support systems, Printing

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Proceedings Article | 27 December 2002 Paper

Automated defect severity analysis for binary and PSM mask defects

Lynn Cai, Jiunn-Hung Chen, Lin-Hsin Tu, Brian Chu, Noah Chen, Te Yang Fang, W. B. Shieh

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467436

KEYWORDS: Photomasks, Semiconducting wafers, Decision support systems, Binary data, Inspection, Scanning electron microscopy, Tolerancing, Optical proximity correction, Defect detection, Critical dimension metrology

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Proceedings Article | 16 July 2002 Paper

Defect printability analysis study using virtual stepper system in a production environment

Shao-Yung Chiou, Henrry Lei, WeiJyh Liu, M. Chu, Daryl Chiang, Steve Tuan, Chia-Lung Hong, Michael Chang, Jiunn-Hung Chen, Kevin Chan, Qi-De Qian, Lynn Cai, Linyong Pang

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473465

KEYWORDS: Photomasks, Semiconducting wafers, Binary data, Virtual reality, Inspection, Scanning electron microscopy, Decision support systems, Reticles, Phase shifts, Scanners

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Proceedings Article | 14 September 2001 Paper

Automatic defect severity scoring for 193-nm reticle defect inspection

Linard Karklin, Mark Altamirano, Lynn Cai, Khoi Phan, Chris Spence

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435716

KEYWORDS: Photomasks, Reticles, Lithography, Inspection, Optical proximity correction, Semiconducting wafers, Virtual reality, Resolution enhancement technologies, Decision support systems, Critical dimension metrology

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Proceedings Article | 5 September 2001 Paper

Enhanced dispositioning of reticle defects using the Virtual Stepper with automated defect severity scoring

Lynn Cai, Khoi Phan, Chris Spence, Linyong Pang, Kevin Chan

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438388

KEYWORDS: Semiconducting wafers, Photomasks, Reticles, Virtual reality, Scanning electron microscopy, Decision support systems, Critical dimension metrology, Optical proximity correction, Inspection, Tolerancing

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Showing 5 of 11 publications

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