Dr. Lynne Gignac Profile

Dr. Lynne Gignac

at IBM TJ Watson Research Ctr

SPIE Involvement:

Author

Proceedings Article | 9 April 2024 Presentation + Paper

Etching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmas

Juliano Borges, Hongwen Yan, Devi Koty, Sophia Rogalskyj, Lynne Gignac, Leonidas Ocola, Marinus Hopstaken, Steve Molis, Andrew Simon, John Arnold, Jeffrey Shearer, Robert Bruce

Proceedings Volume 12958, 129580E (2024) https://doi.org/10.1117/12.3010015

KEYWORDS: Etching, Plasmas, Mixtures, Argon, Iridium, Chlorine, Chemistry, Thin films, Silicon

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Proceedings Article | 25 May 2022 Presentation + Paper

Study of surface interactions for encapsulation of phase change memory materials

L. Buzi, D. Koty, M. Hopstaken, J. Bruley, L. Gignac, M. Sagianis, D. Farmer, H. Miyazoe, A. Mosden, S. Engelmann, R. Bruce

Proceedings Volume 12056, 1205609 (2022) https://doi.org/10.1117/12.2614303

KEYWORDS: Plasma, Etching, Plasma enhanced chemical vapor deposition, Oxygen, Argon, Refractive index, Hydrogen, FT-IR spectroscopy, Wet etching

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Proceedings Article | 25 March 2016 Paper

High chi block copolymer DSA to improve pattern quality for FinFET device fabrication

HsinYu Tsai, Hiroyuki Miyazoe, Ankit Vora, Teddie Magbitang, Noel Arellano, Chi-Chun Liu, Michael Maher, William Durand, Simon Dawes, James Bucchignano, Lynne Gignac, Daniel Sanders, Eric Joseph, Matthew Colburn, C. Grant Willson, Christopher Ellison, Michael Guillorn

Proceedings Volume 9779, 977910 (2016) https://doi.org/10.1117/12.2219544

KEYWORDS: Line edge roughness, Line width roughness, Lithography, Polymers, Etching, Semiconductors, Manufacturing, Directed self assembly, Silicon, Plasma, Oxygen

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Proceedings Article | 2 April 2014 Paper

CDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wires

Shimon Levi, Ishai Schwarzband, Yakov Weinberg, Roger Cornell, Ofer Adan, Guy Cohen, Lynne Gignac, Sarunya Bangsaruntip, Sean Hand, Jason Osborne, Adam Feinstein

Proceedings Volume 9050, 905008 (2014) https://doi.org/10.1117/12.2047031

KEYWORDS: Atomic force microscopy, Metrology, 3D metrology, Silicon, Semiconducting wafers, Scanning electron microscopy, Data modeling, 3D modeling, Calibration, Nanowires

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SPIE Journal Paper | 25 September 2013

Pattern transfer of directed self-assembly patterns for CMOS device applications

Hsin-Yu Tsai, Hiroyuki Miyazoe, Sebastian Engelmann, Lynne Gignac, James Bucchignano, David Klaus, Christopher Breslin, Eric Joseph, Joy Cheng, Daniel Sanders, Michael Guillorn, Chi-Chun Liu

JM3, Vol. 12, Issue 04, 041305, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.041305

KEYWORDS: Etching, Optical lithography, Photomasks, Silicon, Carbon, Polymethylmethacrylate, Plasma, Metals, Line edge roughness, Directed self assembly

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Proceedings Article | 18 April 2013 Paper

Buckling characterization of gate all around silicon nanowires

Shimon Levi, Ishai Schwarzband, Yakov Weinberg, Roger Cornell, Ofer Adan, Guy Cohen, Cheng Cen, Lynne Gignac

Proceedings Volume 8681, 868130 (2013) https://doi.org/10.1117/12.2013810

KEYWORDS: Sensors, Signal detection, Silicon, Scanning electron microscopy, 3D metrology, Transmission electron microscopy, Oxides, Semiconducting wafers, Metrology, Nanowires

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Proceedings Article | 29 March 2013 Paper

Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications

Hsin-Yu Tsai, Hiroyuki Miyazoe, Sebastian Engelmann, Sarunya Bangsaruntip, Isaac Lauer, Jim Bucchignano, Dave Klaus, Lynne Gignac, Eric Joseph, Joy Cheng, Dan Sanders, Michael Guillorn

Proceedings Volume 8685, 86850L (2013) https://doi.org/10.1117/12.2014259

KEYWORDS: Etching, Line edge roughness, Optical lithography, Silicon, Annealing, Polymethylmethacrylate, Photomasks, Electron beam lithography, Directed self assembly

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Proceedings Article | 14 May 2012 Open Access

Past, present, and future of backscatter electron (BSE) imaging

Oliver Wells, Michael Gordon, Lynne Gignac

Proceedings Volume 8378, 837802 (2012) https://doi.org/10.1117/12.920001

KEYWORDS: Scanning electron microscopy, Sensors, Backscatter, Electron beams, Electron microscopes, Lenses, Magnetism, CRTs, Semiconductors, Copper

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Proceedings Article | 10 April 2012 Paper

Roughness metrology of gate all around silicon nanowire devices

Shimon Levi, Ishai Schwarzband, Roman Kris, Ofer Adan, Guy Cohen, Sarunya Bangsaruntip, Lynne Gignac

Proceedings Volume 8324, 83240H (2012) https://doi.org/10.1117/12.918402

KEYWORDS: Scanning electron microscopy, Line edge roughness, Stochastic processes, Metrology, Semiconducting wafers, Silicon, Critical dimension metrology, Calibration, Smoothing, Nanowires

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Showing 5 of 9 publications

Conference Committee Involvement (1)

Scanning Microscopies 2015

29 September 2015 | Monterey, California, United States

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