Dr. Makoto Sugihara Profile

Dr. Makoto Sugihara

at Toyohashi Univ of Technology

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 18 March 2009 Paper

Optimal character-size exploration for increasing throughput of MCC lithographic systems

Makoto Sugihara

Proceedings Volume 7271, 72710L (2009) https://doi.org/10.1117/12.813884

KEYWORDS: Photomasks, Lithography, Vestigial sideband modulation, Electron beams, Binary data, Bismuth, Semiconducting wafers, Mathematical modeling, Transistors, Beam shaping

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Proceedings Article | 15 March 2007 Paper

Technology mapping technique for enhancing throughput of multi-column-cell systems

Makoto Sugihara, Yusuke Matsunaga, Kazuaki Murakami

Proceedings Volume 6517, 65170Z (2007) https://doi.org/10.1117/12.710507

KEYWORDS: Photomasks, Lithography, Vestigial sideband modulation, Logic, Semiconducting wafers, Electron beams, Silicon, Software development, Laser induced breakdown spectroscopy, Maskless lithography

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Proceedings Article | 20 October 2006 Paper

CP mask optimization for enhancing the throughput of MCC systems

Makoto Sugihara, Kenta Nakamura, Yusuke Matsunaga, Kazuaki Murakami

Proceedings Volume 6349, 63494B (2006) https://doi.org/10.1117/12.685501

KEYWORDS: Photomasks, Vestigial sideband modulation, Logic, Source mask optimization, Computer programming, Lithography, Systems modeling, Binary data, Projection systems, Manufacturing

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Proceedings Article | 20 May 2006 Paper

A CP mask development methodology for MCC systems

Makoto Sugihara, Taiga Takata, Kenta Nakamura, Yusuke Matsunaga, Kazuaki Murakami

Proceedings Volume 6283, 62833J (2006) https://doi.org/10.1117/12.681838

KEYWORDS: Photomasks, Logic, Vestigial sideband modulation, Semiconducting wafers, Silicon, Maskless lithography, Lithography, Electron beams, Manufacturing, Beam shaping

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Proceedings Article | 23 March 2006 Paper

Technology mapping technique for throughput enhancement of character projection equipment

Makoto Sugihara, Taiga Takata, Kenta Nakamura, Ryoichi Inanami, Hiroaki Hayashi, Katsumi Kishimoto, Tetsuya Hasebe, Yukihiro Kawano, Yusuke Matsunaga, Kazuaki Murakami, Katsuya Okumura

Proceedings Volume 6151, 61510Z (2006) https://doi.org/10.1117/12.656153

KEYWORDS: Photomasks, Logic, Vestigial sideband modulation, Electron beams, Laser induced breakdown spectroscopy, Software development, Maskless lithography, Semiconducting wafers, Manufacturing, Lithography

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