Mr. Masaki Nakano Profile

Masaki Nakano

Researcher at EUVA

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 18 March 2009 Paper

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, Krzysztof Nowak, Yabu Takayuki, Yanagida Tatsuya, Takashi Suganuma, Takeshi Asayama, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Masato Moriya, Toshihiro Nishisaka, Tamotsu Abe, Akira Sumitani, Hitoshi Nagano, Youichi Sasaki, Shinji Nagai, Yukio Watanabe, Georg Soumagne, Takanobu Ishihara, Osamu Wakabayashi, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 7271, 727108 (2009) https://doi.org/10.1117/12.813639

KEYWORDS: Plasma, Tin, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Laser development, Pulsed laser operation, Extreme ultraviolet lithography, Ions, Laser systems engineering

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Proceedings Article | 21 March 2008 Paper

Sn droplet target development for laser produced plasma EUV light source

Masaki Nakano, Takayuki Yabu, Hiroshi Someya, Tamotsu Abe, Georg Soumagne, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 692130 (2008) https://doi.org/10.1117/12.771820

KEYWORDS: Tin, Extreme ultraviolet, Electrodes, Laser development, Plasma, Light sources, Laser irradiation, Chemical species, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 20 March 2008 Paper

CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography

Akira Endo, Hideo Hoshino, Takashi Suganuma, Krzysztof Nowak, Tatsuya Yanagida, Takayuki Yabu, Takeshi Asayama, Yoshifumi Ueno, Masato Moriya, Masaki Nakano, Hiroshi Someya, Toshihiro Nishisaka, Tamotsu Abe, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6921, 69210T (2008) https://doi.org/10.1117/12.771959

KEYWORDS: Tin, Carbon dioxide lasers, Extreme ultraviolet, Ions, Magnetism, Mirrors, Plasma, Pulsed laser operation, Light sources, Carbon dioxide

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Proceedings Article | 13 September 2007 Paper

CO2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography

Akira Endo, Tamotsu Abe, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6703, 670309 (2007) https://doi.org/10.1117/12.732254

KEYWORDS: Gas lasers, Tin, Carbon monoxide, Extreme ultraviolet, Plasma, Pulsed laser operation, Carbon dioxide lasers, Light sources, Magnetism, Ions

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Proceedings Article | 21 March 2007 Paper

Characterization of various Sn targets with respect to debris and fast ion generation

Yoshifumi Ueno, Hideo Hoshino, Tatsuya Ariga, Taisuke Miura, Masaki Nakano, Hiroshi Komori, Georg Soumagne, Akira Endo, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6517, 65173B (2007) https://doi.org/10.1117/12.711226

KEYWORDS: Tin, Gas lasers, Ions, Plasma, Carbon monoxide, Nd:YAG lasers, Extreme ultraviolet, Glasses, Solids, Mirrors

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Proceedings Article | 19 March 2007 Paper

Laser-produced EUV light source development for HVM

Akira Endo, Hideo Hoshino, Takashi Suganuma, Masato Moriya, Tatsuya Ariga, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Tamotsu Abe, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6517, 65170O (2007) https://doi.org/10.1117/12.711097

KEYWORDS: Gas lasers, Carbon monoxide, Tin, Extreme ultraviolet, Plasma, Pulsed laser operation, Nd:YAG lasers, Light sources, Optical amplifiers, Ions

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Proceedings Article | 23 March 2006 Paper

Development of CO₂ laser produced Xe plasma EUV light source for microlithography

Hakaru Mizoguchi, Akira Endo, Tatsuya Ariga, Taisuke Miura, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Hiroshi Komori, Akira Sumitani, Tamotsu Abe, Takashi Suganuma, Georg Soumagne, Hiroshi Someya, Yuichi Takabayashi, Koichi Toyoda

Proceedings Volume 6151, 61510S (2006) https://doi.org/10.1117/12.656941

KEYWORDS: Gas lasers, Carbon monoxide, Plasma, Pulsed laser operation, Xenon, Extreme ultraviolet, Ions, Magnetism, Laser irradiation, Oscillators

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Proceedings Article | 6 May 2005 Paper

Laser-produced-plasma light source for EUV lithography

Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Hiroshi Komori, Yuichi Takabayashi, Tatsuya Ariga, Yoshifumi Ueno, Yasunori Wada, Akira Endo, Koichi Toyoda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599333

KEYWORDS: Extreme ultraviolet, Light sources, Xenon, Laser applications, Gas lasers, Laser systems engineering, Nd:YAG lasers, Oscillators, Amplifiers, Extreme ultraviolet lithography

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Proceedings Article | 3 November 2004 Paper

High-average-power EUV light source for the next-generation lithography by laser-produced Xe plasma

Masaki Nakano, Tamotsu Abe, Akira Endo

Proceedings Volume 5537, (2004) https://doi.org/10.1117/12.555468

KEYWORDS: Xenon, Extreme ultraviolet, Plasma, Light sources, Extreme ultraviolet lithography, Liquids, Lithography, Nd:YAG lasers, Oscillators, Amplifiers

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Proceedings Article | 20 May 2004 Paper

Performance of a 10-kHz laser-produced-plasma light source for EUV lithography

Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi, Akira Endo, Koichi Toyoda, Yasuhiro Horiike

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536076

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Plasma, Extreme ultraviolet lithography, Deformable mirrors, Mirrors, Liquids, Nd:YAG lasers, Oscillators

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Proceedings Article | 30 July 2002 Paper

Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems

Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Masayuki Konishi, Takashi Suganuma, Masaki Nakano, Toshio Yamashita, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474613

KEYWORDS: Oscillators, Pulsed laser operation, Amplifiers, Refractor telescopes, Laser development, Laser systems engineering, Projection systems, Laser stabilization, Spectroscopy, Mirrors

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Proceedings Article | 26 July 1999 Paper

Performance of a highly stable 2-kHz operation KrF laser

Tatsuo Enami, Masaki Nakano, Takayuki Watanabe, Ayako Ohbo, Tsukasa Hori, Takashi Ito, Toshihiro Nishisaka, Akira Sumitani, Osamu Wakabayashi, Hakaru Mizoguchi, Hiroaki Nakarai, Naoto Hisanaga, Takeshi Matsunaga, Hirokazu Tanaka, Tatsuya Ariga, Syouich Sakanishi, Takeshi Okamoto, Ryoichi Nodomi, Takashi Suzuki, Yuichi Takabayashi, Hitoshi Tomaru, Kiyoharu Nakao

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354313

KEYWORDS: Excimer lasers, Magnetism, Pulsed laser operation, Contamination, Semiconductors, Laser applications, Laser development, Fluctuations and noise, Fabry–Perot interferometers

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Showing 5 of 12 publications

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