Mr. Masanobu Hasegawa Profile

Masanobu Hasegawa

at Canon Inc

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 21 March 2008 Paper

EUV wavefront measurement of six-mirror optics using EWMS

K. Sugisaki, M. Okada, K. Otaki, Y. Zhu, J. Kawakami, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, H. Yokota, T. Honda, M. Niibe

Proceedings Volume 6921, 69212U (2008) https://doi.org/10.1117/12.772624

KEYWORDS: Wavefronts, Diffusion tensor imaging, Optical testing, Extreme ultraviolet, Projection systems, Mirrors, EUV optics, Wavefront metrology, Interferometers, Optics manufacturing

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Proceedings Article | 24 March 2006 Paper

EUV wavefront metrology at EUVA

Chidane Ouchi, Seima Kato, Masanobu Hasegawa, Takayuki Hasegawa, Hideo Yokota, Katsumi Sugisaki, Masashi Okada, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 6152, 61522O (2006) https://doi.org/10.1117/12.656039

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Diffraction, EUV optics, Projection systems, Extreme ultraviolet lithography, Diffraction gratings, CCD cameras, Mirrors

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Proceedings Article | 17 September 2005 Paper

Comparisons between EUV at-wavelength metrological methods

Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5921, 59210D (2005) https://doi.org/10.1117/12.616676

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Metrology, Diffusion tensor imaging, Charge-coupled devices, EUV optics, Interferometers, Shearing interferometers, Diffraction

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Proceedings Article | 10 May 2005 Paper

Experimental comparison of absolute PDI and lateral shearing interferometer

Yucong Zhu, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Zhiqian Liu, Mikihiko Ishii, Jun Kawakami, Jun Saito, Katsuhiko Murakami, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Masahito Niibe

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600274

KEYWORDS: Wavefronts, Shearing interferometers, Diffraction gratings, Extreme ultraviolet lithography, Extreme ultraviolet, Charge-coupled devices, Diffraction, Interferometers, Photomasks, Monochromatic aberrations

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Proceedings Article | 10 May 2005 Paper

Double-grating lateral shearing interferometer for EUV optics at-wavelength measurement

Zhiqiang Liu, Masashi Okada, Katsumi Sugisaki, Mikihiko Ishii, Yucong Zhu, Katsura Ohtaki, Jun Saito, Akiyoshi Suzuki, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Masahito Niibe, Katsuhiko Murakami

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599456

KEYWORDS: Diffraction, Diffraction gratings, Calibration, Shearing interferometers, Wavefronts, Light sources, Interferometers, Monochromatic aberrations, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 6 May 2005 Paper

Comparison of EUV interferometry methods in EUVA project

Seima Kato, Chidane Ouchi, Masanobu Hasegawa, Akiyoshi Suzuki, Takayuki Hasegawa, Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600468

KEYWORDS: Wavefronts, Optical testing, Diffraction, Charge-coupled devices, Extreme ultraviolet, Monochromatic aberrations, Interferometers, Phase shifts, Calibration, Diffraction gratings

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Proceedings Article | 18 October 2004 Paper

Recent progress of EUV wavefront metrology in EUVA

Masanobu Hasegawa, Chidane Ouchi, Takayuki Hasegawa, Seima Kato, Akinori Ohkubo, Akiyoshi Suzuki, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.562431

KEYWORDS: Wavefronts, Extreme ultraviolet, Optical testing, Diffraction, Wavefront metrology, Interferometers, Shearing interferometers, Diffusion tensor imaging, Spherical lenses, Diffraction gratings

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Proceedings Article | 20 May 2004 Paper

Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI

Katsumi Sugisaki, Masanobu Hasegawa, Seima Kato, Chidane Ouchi, Jun Saito, Masahito Niibe, Akiyoshi Suzuki, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537344

KEYWORDS: Oxygen, Contamination, Tantalum, Extreme ultraviolet, Nickel, Gold, Carbon, Adsorption, Projection systems, Wavefronts

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Proceedings Article | 20 May 2004 Paper

Lateral shearing interferometer for EUVL: theoretical analysis and experiment

Yucong Zhu, Katsumi Sugisaki, Chidane Ouchi, Masanobu Hasegawa, Masahito Niibe, Akiyoshi Suzuki, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537331

KEYWORDS: Wavefronts, Charge-coupled devices, Extreme ultraviolet lithography, Shearing interferometers, Phase shifts, Diffraction gratings, Projection systems, Algorithm development, Diffraction, Extreme ultraviolet

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Proceedings Article | 20 May 2004 Paper

EUV wavefront metrology system in EUVA

Takayuki Hasegawa, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Akiyoshi Suzuki, Katsumi Sugisaki, Katsuhiko Murakami, Jun Saito, Masahito Niibe

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536327

KEYWORDS: Extreme ultraviolet, Wavefronts, Monochromatic aberrations, Wavefront metrology, Photomasks, Metrology, Nickel, Synchrotron technology, Interferometers, Spherical lenses

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Proceedings Article | 16 June 2003 Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, Akiyoshi Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935

KEYWORDS: Extreme ultraviolet, Wavefront metrology, Wavefronts, Optical testing, Interferometers, Shearing interferometers, Diffraction, Mirrors, Extreme ultraviolet lithography, Diffraction gratings

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Proceedings Article | 1 August 2002 Paper

New resolution enhancement method realizing the limit of single mask exposure

Kenji Yamazoe, Masanobu Hasegawa, Kenji Saitoh, Akiyoshi Suzuki

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477002

KEYWORDS: Photomasks, Binary data, Optical lithography, Resolution enhancement technologies, Lithography, Printing, Semiconducting wafers, Projection systems, Double patterning technology

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Proceedings Article | 30 July 2002 Paper

Development of low-loss optical coatings for 157-nm lithography

Ryuji Biro, Kazuho Sone, Shunsuke Niisaka, Minoru Otani, Yasuyuki Suzuki, Chidane Ouchi, Tadahiko Saito, Masanobu Hasegawa, Jun Saito, Akira Tanaka, Akira Matsumoto

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474550

KEYWORDS: Optical coatings, Lithography, Neodymium, Spectroscopy, Fluorine, Vacuum ultraviolet, Lenses, Transmittance, Absorption, Reflection

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Proceedings Article | 30 July 2002 Paper

Challenging the limit of single mask exposure

Kenji Yamazoe, Masanobu Hasegawa, Kenji Saitoh, Akiyoshi Suzuki

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474549

KEYWORDS: Photomasks, Binary data, Lithography, Lithographic illumination, Optical lithography, Printing, Resolution enhancement technologies, Double patterning technology, Scanners, Reticles

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Proceedings Article | 10 December 2001 Paper

Measurement of absorptance of optical coatings for F2 lithography

Chidane Ouchi, Masanobu Hasegawa, Akira Matsumoto, Kazuho Sone

Proceedings Volume 4449, (2001) https://doi.org/10.1117/12.450089

KEYWORDS: Nitrogen, Optical coatings, Lithography, Temperature metrology, Laser development, Contamination, Antireflective coatings, Absorption, Protactinium, Power meters

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Proceedings Article | 5 July 2000 Paper

IDEAL double exposure method for polylevel structures

Carmelo Romeo, Paolo Canestrari, Antonio Fiorino, Masanobu Hasegawa, Kenji Saitoh, Akiyoshi Suzuki

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389013

KEYWORDS: Critical dimension metrology, Lithography, Photomasks, Optical lithography, Semiconducting wafers, Scanning electron microscopy, Reticles, Optical alignment, Phase shifting, Silicon

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Proceedings Article | 30 December 1999 Paper

Practical applications of IDEAL exposure method

Masanobu Hasegawa, Kenji Saitoh, Minoru Yoshii, Akiyoshi Suzuki

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373298

KEYWORDS: Photomasks, Double patterning technology, Lithography, Binary data, Logic devices, Scanning electron microscopy, Photography, Semiconducting wafers, Manufacturing, Optics manufacturing

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Proceedings Article | 25 August 1999 Paper

New approach for realizing k1=0.3 optical lithography

Masanobu Hasegawa, Akiyoshi Suzuki, Kenji Saito, Minoru Yoshii

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360235

KEYWORDS: Photomasks, Optical lithography, Logic devices, Lithography, Scanning electron microscopy, Photography, Resolution enhancement technologies, Double patterning technology, Semiconducting wafers, Binary data

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Showing 5 of 18 publications

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