Mr. Masayuki Hatano Profile

Masayuki Hatano

at KIOXIA Corp

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 1 May 2023 Presentation + Paper

Fabrication of dual damascene structure with nanoimprint lithography and dry-etching

Norikazu Takeuchi, Genna Hasegawa, Toshiaki Komukai, Takahiro Iwasaki, Masayuki Hatano, Motofumi Komori, Takuya Kono

Proceedings Volume 12497, 124970E (2023) https://doi.org/10.1117/12.2657912

KEYWORDS: Silica, Photoresist processing, Electron beam lithography, Resistance, Semiconducting wafers, Fabrication, Optical lithography, Lithography

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SPIE Journal Paper | 4 March 2022

Improvement of productivity by spin-coating and flash imprint lithography

Takahiro Iwasaki, Hirokazu Miyoshi, Anupam Mitra, Masayuki Hatano, Kazuya Fukuhara, Motofumi Komori, Takuya Kono, Tetsuro Nakasugi

JM3, Vol. 21, Issue 01, 011008, (March 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.011008

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Lithography, Head, Photoresist processing, Coating, System on a chip, Overlay metrology, Capillaries, Ultraviolet radiation

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Proceedings Article | 22 February 2021 Presentation

Improvement of productivity by spin coating nanoimprint lithography

Takahiro Iwasaki, Hirokazu Miyoshi, Mitra Anupam, Masayuki Hatano, Motofumi Komori, Takuya Kono

Proceedings Volume 11610, 116100A (2021) https://doi.org/10.1117/12.2583676

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Photoresist processing, Lithography, Semiconductors, Diffusion, Coating, Capillaries

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Proceedings Article | 26 March 2019 Paper

Half-pitch 14nm direct patterning with nanoimprint lithography

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Hirokazu Kato, Kazuya Fukuhara, Tetsuro Nakasugi

Proceedings Volume 10958, 109580H (2019) https://doi.org/10.1117/12.2514685

KEYWORDS: Nanoimprint lithography, Optical lithography, Semiconducting wafers, Image processing, Distortion, Overlay metrology, Photoresist processing, Lithography, Particles, Photomasks

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Proceedings Article | 2 May 2018 Presentation + Paper

Improvement of nano-imprint lithography performance for device fabrication

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Kei Kobayashi, Hirokazu Kato, Masato Suzuki, Kazuya Fukuhara, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 10584, 105840V (2018) https://doi.org/10.1117/12.2297294

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Optical alignment, Overlay metrology, Distortion, Particles, Optical lithography, Photoresist processing, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 21 March 2018 Paper

Material development for high-throughput nanoimprint lithography

Kei Kobayashi, Takayuki Nakamura, Hirokazu Kato, Masayuki Hatano, Hiroshi Tokue, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung, Takuya Kono

Proceedings Volume 10584, 105841F (2018) https://doi.org/10.1117/12.2297307

KEYWORDS: Nanoimprint lithography, Photoresist processing, Optical lithography, Image processing, Ultraviolet radiation, Diffusion, Interfaces, Lithography, Liquids, Etching

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Proceedings Article | 21 March 2017 Presentation + Paper

Study of nanoimprint lithography (NIL) for HVM of memory devices

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Kei Kobayashi, Masato Suzuki, Kazuya Fukuhara, Masafumi Asano, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 10144, 1014406 (2017) https://doi.org/10.1117/12.2257951

KEYWORDS: Nanoimprint lithography, Overlay metrology, Lithography, Line edge roughness, Semiconductors, Critical dimension metrology, Nanotechnology, Semiconducting wafers, Optical lithography, Particles, Distortion, Optical alignment, Inspection

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Proceedings Article | 22 March 2016 Paper

Design for nanoimprint lithography: total layout refinement utilizing NIL process simulation

Sachiko Kobayashi, Motofumi Komori, Inanami Ryoichi, Kyoji Yamashita, Akiko Mimotogi, Ji-Young Im, Masayuki Hatano, Takuya Kono, Shimon Maeda

Proceedings Volume 9777, 977708 (2016) https://doi.org/10.1117/12.2219052

KEYWORDS: Nanoimprint lithography, Lithography, Design for manufacturing, Photoresist processing, Computer simulations, Computational lithography, Design for manufacturability, Nanolithography, Optical lithography, Ultraviolet radiation, Double patterning technology, Calibration, Semiconductors, Optics manufacturing

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Proceedings Article | 22 March 2016 Paper

NIL defect performance toward high volume mass production

Masayuki Hatano, Kei Kobayashi, Hiroyuki Kashiwagi, Hiroshi Tokue, Takuya Kono, Nakasugi Tetsuro, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 9777, 97770B (2016) https://doi.org/10.1117/12.2218972

KEYWORDS: Defect detection, Process control, Nanoimprint lithography, Lithography, Line edge roughness, Semiconductors, Critical dimension metrology, Silicon, Semiconducting wafers, Industrial chemicals, Contamination, Chemical analysis, Photoresist processing, Extreme ultraviolet lithography, Photomasks, Image processing

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Proceedings Article | 28 March 2014 Paper

The prospects of design for roll to roll lithography: layout refinement utilizing process simulation

Sachiko Kobayashi, Mitsuko Shimizu, Satoshi Tanaka, Yohko Furutono, Masayuki Hatano, Kazuto Matsuki, Ryoichi Inanami, Shoji Mimotogi

Proceedings Volume 9049, 904911 (2014) https://doi.org/10.1117/12.2046771

KEYWORDS: Design for manufacturing, Ultraviolet radiation, Lithography, Optical lithography, Photoresist processing, Semiconductors, Computational lithography, Manufacturing, Source mask optimization, Directed self assembly

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Proceedings Article | 6 May 2005 Paper

Study of EB-tree

Kazuo Tawarayama, Shunko Magoshi, Shinji Sato, Masayuki Hatano

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598923

KEYWORDS: Semiconducting wafers, Metals, Backscatter, Electron beam lithography, Copper, Lithography, Electron beam direct write lithography, Monte Carlo methods, Critical dimension metrology, Tungsten

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Showing 5 of 11 publications

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