Dr. Michael K. Crawford Profile

Dr. Michael K. Crawford

Research Staff Member at Dupont CR&D

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Author

Publications (7)

Proceedings Article | 15 March 2006 Paper

Second generation fluids for 193nm immersion lithography

Roger French, Weiming Qiu, Min Yang, Robert Wheland, Michael Lemon, Aaron Shoe, Doug Adelman, Michael Crawford, Hoang Tran, Jerald Feldman, Steve McLain, Sheng Peng

Proceedings Volume 6154, 615415 (2006) https://doi.org/10.1117/12.656626

KEYWORDS: Microfluidics, Refractive index, Immersion lithography, Microfluidic imaging, Water, Absorbance, Transparency, Lithography, 193nm lithography, Optical lithography

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SPIE Journal Paper | 1 July 2005

Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k₁ of 0.25

Roger French, Harry Sewell, Min Yang, Sheng Peng, Diane McCafferty, Weiming Qiu, Robert Wheland, Michael Lemon, Louis Markoya, Michael Crawford

JM3, Vol. 4, Issue 03, 031103, (July 2005) https://doi.org/10.1117/12.10.1117/1.2039953

KEYWORDS: Refractive index, Water, Oscillators, Absorption, Absorbance, Lithography, Immersion lithography, Microfluidics, Microfluidic imaging, Glasses

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Proceedings Article | 12 May 2005 Paper

Second generation fluids for 193 nm immersion lithography

Sheng Peng, Roger French, Weiming Qiu, Robert Wheland, Min Yang, Michael Lemon, Michael Crawford

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.606448

KEYWORDS: Water, Oscillators, Refraction, Absorption, Absorbance, Microfluidics, Immersion lithography, Optical lithography, Lithography, Microfluidic imaging

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Proceedings Article | 12 June 2003 Paper

Single-layer fluoropolymer resists for 157-nm lithography

Michael Crawford, William Farnham, Andrew Feiring, Jerald Feldman, Roger French, Kenneth Leffew, Viacheslav Petrov, Weiming Qiu, Frank Schadt, Hoang Tran, Robert Wheland, Fredrick Zumsteg

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485206

KEYWORDS: Absorbance, Polymers, Etching, Silicon, Resistance, Absorption, Fluorine, Lithography, Infrared radiation, Photoresist materials

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Proceedings Article | 24 August 2001 Paper

157-nm imaging using thick single-layer resists

Michael Crawford, Andrew Feiring, Jerald Feldman, Roger French, Viacheslav Petrov, Frank Schadt, Robert Smalley, Fredrick Zumsteg

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436874

KEYWORDS: Absorption, Absorbance, Etching, Polymers, Lithography, Transparency, Vacuum ultraviolet, Photoresist materials, Scanning electron microscopy, Resistance

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Proceedings Article | 23 June 2000 Paper

New materials for 157-nm photoresists: characterization and properties

Michael Crawford, Andrew Feiring, Jerald Feldman, Roger French, Mookkan Periyasamy, Frank Schadt, Robert Smalley, Fredrick Zumsteg, Roderick Kunz, Veena Rao, Ling Liao, Susan Holl

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388319

KEYWORDS: Etching, Transparency, Resistance, Polymers, Plasma etching, Photoresist materials, Plasma, Photoresist developing, Lithography, Absorption

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Proceedings Article | 1 December 1991 Paper

Ionic conductivity and damage mechanisms in KTiOPO4 crystals

Patricia Morris, Michael Crawford, Mark Roelofs, John Bierlein, Thomas Baer

Proceedings Volume 1561, (1991) https://doi.org/10.1117/12.50757

KEYWORDS: Crystals, Ferroelectric materials, Barium, Temperature metrology, Atmospheric optics, Crystal optics, Absorption, Ions, Ion exchange, Laser crystals

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Showing 5 of 7 publications

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