Dr. Michael D. Stewart Profile

Dr. Michael D. Stewart

Project Coordinator/Research Fellowr at Canon Nanotechnologies Inc

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Author

Publications (13)

Proceedings Article | 21 March 2007 Paper

Photocurable silicon-based materials for imprinting lithography

Jianjun Hao, Michael Lin, Frank Palmieri, Yukio Nishimura, Huang-Lin Chao, Michael Stewart, Austin Collins, Kane Jen, C. Grant Willson

Proceedings Volume 6517, 651729 (2007) https://doi.org/10.1117/12.712261

KEYWORDS: Silicon, Dielectrics, Molecules, Lithography, Annealing, Bromine, Front end of line, Back end of line, Chlorine, Optical lithography

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Proceedings Article | 23 March 2006 Paper

Multi-level step and flash imprint lithography for direct patterning of dielectrics

Frank Palmieri, Michael Stewart, Jeff Wetzel, Jianjun Hao, Yukio Nishimura, Kane Jen, Colm Flannery, Bin Li, Huang-Lin Chao, Soo Young, Woon Kim, Paul Ho, C. Willson

Proceedings Volume 6151, 61510J (2006) https://doi.org/10.1117/12.655604

KEYWORDS: Dielectrics, Copper, Sol-gels, Polymers, Silicon, Optical lithography, Chemical mechanical planarization, Liquids, Polymerization, Lithography

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Proceedings Article | 8 November 2005 Paper

Design and fabrication of highly complex topographic nano-imprint template for dual Damascene full 3-D imprinting

Susan MacDonald, Greg Hughes, Michael Stewart, Frank Palmieri, C. Grant Willson

Proceedings Volume 5992, 59922F (2005) https://doi.org/10.1117/12.632312

KEYWORDS: Metals, Etching, Quartz, Copper, Photomasks, Optical lithography, Manufacturing, Lithography, Semiconducting wafers, Dielectrics

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Proceedings Article | 6 May 2005 Paper

Direct imprinting of dielectric materials for dual damascene processing

Michael Stewart, Jeffery Wetzel, Gerard Schmid, Frank Palmieri, Ecron Thompson, Eui Kyoon Kim, David Wang, Ken Sotodeh, Kane Jen, Stephen Johnson, Jianjun Hao, Michael Dickey, Yukio Nishimura, Richard Laine, Douglas Resnick, C. Willson

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599977

KEYWORDS: Dielectrics, Silicon, Copper, Semiconducting wafers, Optical lithography, Etching, Lithography, Metals, Nanoimprint lithography, Plasma etching

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SPIE Journal Paper | 1 January 2005

Nanofabrication with step and flash imprint lithography

Michael Stewart, Stephen Johnson, Sidlgata Sreenivasan, Douglas Resnick, Carlton Willson

JM3, Vol. 4, Issue 01, 011002, (January 2005) https://doi.org/10.1117/12.10.1117/1.1862650

KEYWORDS: Lithography, Optical alignment, Photomasks, Nanoimprint lithography, Nanofabrication, Printing, Optical lithography, Etching, Overlay metrology, Polymers

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Proceedings Article | 14 May 2004 Paper

Resolution limitations in chemically amplified photoresist systems

Gerard Schmid, Michael Stewart, Chia-Ying Wang, Bryan Vogt, Vivek Prabhu, Eric Lin, C. Willson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536656

KEYWORDS: Diffusion, Photoresist materials, Polymers, Molecules, Scattering, Interfaces, Lithography, Distance measurement, Manufacturing, Chemically amplified resists

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Proceedings Article | 12 June 2003 Paper

Diffusion-induced line-edge roughness

Michael Stewart, Gerard Schmid, Dario Goldfarb, Marie Angelopoulos, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483734

KEYWORDS: Diffusion, Surface roughness, Line edge roughness, Polymers, Atomic force microscopy, Monte Carlo methods, Lithography, Photoresist materials, Molecules, Photomasks

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Proceedings Article | 24 July 2002 Paper

Acid mobility in chemically amplified photoresists

Michael Stewart, Darren Becker, Timothy Stachowiak, Gerard Schmid, Timothy Michaelson, Hoang Tran, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474168

KEYWORDS: Diffusion, Polymers, Glasses, Photoresist materials, Molecules, Adaptive optics, Temperature metrology, Systems modeling, Chemical reactions, Chemical analysis

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In a chemically amplified resist the exposure energy is used to generate a catalytic species, which promotes a solubility-switching reaction during a post exposure processing step. Using an absorbed photon to generate a catalyst, instead of using it to directly cause a solubility-switching photochemical reaction, allows for much lower exposure doses to be used for patterning since the catalytic species can eventually promote multiple solubility-switching events instead of just one. Some level of catalyst mobility is necessary to achieve the amplification effect as the catalyst must move from reaction site to reaction site, but any catalyst mobility creates the possibility of movement from exposed regions into unexposed regions causing image blur or line width spreading. As the catalyst diffuses in the resist, it promotes chemical reactions; these chemical reactions complicate analyses of catalyst diffusion by changing the chemical environment of the diffusant. Thus, the material properties of the surrounding resin are changing, sometimes drastically, as the catalyst diffuses. In addition to simple changes in material type, the chemical reaction also generates a transient material state as reaction by-products either remain in the resist film or desorb. The variation in lifetime of this transient state is another factor that must be considered in a full analysis. This work reports a method to separate reaction effects from catalyst diffusion effects. Acid diffusion in polymers which are close structural analogues to poly(4-t-butyloxycarbonyloxystrene) (TBOCST), while being unreactive to diffusing acidic molecules, was studied. Specifically, the diffusion properties of photogenerated perfluorobutanesulfonic acid in the unreactive TBOCST analogues poly(4-isopropyloxycarbonyloxystyrene) and poly(4-neopentyloxycarbonyloxysytrene) are reported. Measuring and understanding diffusion in these analogue polymers provides insight into the more complicated, and more important, reaction-diffusion processes of TBOCST.

Proceedings Article | 24 July 2002 Paper

Mesoscale simulation of positive tone chemically amplified photoresists

Gerard Schmid, Sean Burns, Michael Stewart, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474237

KEYWORDS: Monte Carlo methods, Polymers, Photoresist materials, Ions, Computer simulations, Molecules, Lithography, Line edge roughness, Chemically amplified resists, Polymer thin films

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Proceedings Article | 24 August 2001 Paper

Mechanistic understanding of line-end shortening

Michael Stewart, Gerard Schmid, Sergei Postnikov, C. Grant Willson

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436844

KEYWORDS: Diffusion, Polymers, Photomasks, Semiconducting wafers, Imaging systems, Photoresist materials, Diffraction, Printing, Image acquisition, Lithography

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Proceedings Article | 23 June 2000 Paper

Study of acid transport using IR spectroscopy and SEM

Michael Stewart, Mark Somervell, Hoang Tran, Sergei Postnikov, C. Grant Willson

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388353

KEYWORDS: Diffusion, Scanning electron microscopy, Sensors, Polymers, Infrared spectroscopy, Glasses, Photoresist materials, Information operations, Temperature metrology, Silicon

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Proceedings Article | 23 June 2000 Paper

Recent advances in a molecular level lithography simulation

Gerard Schmid, Vivek Singh, Lewis Flanagin, Michael Stewart, Sean Burns, C. Grant Willson

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388354

KEYWORDS: Polymers, Computer simulations, Molecules, Diffusion, Lithography, Monte Carlo methods, Photoresist materials, Performance modeling, Deep ultraviolet, Polymer thin films

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Proceedings Article | 25 June 1999 Paper

Step and flash imprint lithography: a new approach to high-resolution patterning

Matthew Colburn, Stephen Johnson, Michael Stewart, S. Damle, Todd Bailey, Bernard Choi, M. Wedlake, Timothy Michaelson, S. Sreenivasan, John Ekerdt, C. Grant Willson

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351155

KEYWORDS: Etching, Semiconducting wafers, Lithography, Silicon, Photomasks, Quartz, Ultraviolet radiation, Liquids, Interfaces, Chromium

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Showing 5 of 13 publications

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