We present a method for optimizing a free-form illuminator implemented using a diffractive optical element (DOE). The
method, which co-optimizes the source and mask taking entire images of circuit clips into account, improves the
common process-window and 2-D image fidelity. We compare process-windows for optimized standard and free-form
DOE illuminations for arrays and random placements of contact holes at the 45 nm and 32 nm nodes. Source-mask cooptimization
leads to a better-performing source compared to source-only optimization. We quantify the effect of typical
DOE manufacturing defects on lithography performance in terms of NILS and common process-window.
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