MgF2 films are obliquely deposited on glass substrates using a resistive heating Mo boat at both substrate temperatures
of room temperature and 220 °C. These films have obviously columnar microstructures from SEM pictures without
respect to substrate temperatures. The columnar angles of the
MgF2 films increase with the deposition angles. However,
the columnar angle of MgF2 film, deposited at a substrate temperature of room temperature, is not equal to that at 220 °C
when the MgF2 films are prepared at the same deposition angle. Also, the trend of stress behavior of the MgF2 films,
deposited at a substrate temperature of room temperature, is different from that at 220 °C due to the generation of
thermal stress. The behaviors associated with stress in the
MgF2 films are measured using a phase-shifting
Twyman-Green interferometer with the application of a phase reduction algorithm. Anisotropic stress does not develop in the
MgF2 films with tilted columns and the residual stress depends on the deposition and columnar angles in columnar
microstructures of the MgF2 films.
Plasma display panel is one of the most potential flat devices for large-size displays. Magnesium oxide thin films have been used as a protective layer to improve discharge characteristics and the lifetime of panel. So magnesium oxide thin film is worthy to be studied. Magnesium oxide thin films were prepared by e-beam gun evaporation at a substrate temperature of 200°C. Heat annealing treatment and ion assisted deposition effect on thin films were investigated. The relation between these characteristics of films has been studied. The characteristics of the deposited films, including optical properties, crystalline structure, and microstructure were discussed.
Aluminum fluoride thin films have been deposited by magnetron sputtering of aluminum target with CF4 , or CF4 mixed 5% O2 as working gas. To obtain low optical loss and high packing density, the films were investigated under different sputtering power and substrate temperatures. Their optical properties (including the transmittance, refractive index, and extinction coefficient) in the UV range and microstructure (including the cross section morphology, surface roughness, and crystallization) have been studied. AlF3 thin films deposited at low temperature and low sputtering power have better optical quality. The extinction coefficient of AlF3 thin films coated by 25W with CF4 mixed 5% O2 as working gas is smaller than 6.5×10-4 in the wavelength range of 190nm to 300nm
Oblique deposition of lanthanum fluoride thin films was prepared by thermal resistance evaporation. The characteristics (including microstructure, coefficient of tangent rule, birefringence at 193nm and stress) of lanthanum fluoride thin films of have been investigated. The deposition angles increased from 20 to 70 degree, the coefficient of tangent rule decreased from 0.7 to 0.37. When the deposition angles larger than 60 degree, the coefficient held a constant, 0.37. The refractive index at 193nm of oblique deposition films decreased with the deposition angles was larger than 40 degree. The residual stress of films achieved the minimum value at 20-degree deposition angle.
The characteristics of lanthanum fluoride (LaF3) thin films deposited with a resistive heating (RH) boat and by e-beam gun evaporation at different substrate temperatures have been studied. The characteristics of the deposited films, including optical properties, stress, and laser-induced damage threshold (LIDT), were related to the microstructure as well as the stoichiometry of the film. The films exhibit obvious different characteristics between these two processes at various substrate temperatures. It was found that optical properties, stress, and LIDT were affected by the microstructure and composition of the films. To obtain a high value of the LIDT and good optical properties, LaF3 thin films should be deposited by the RH process at a substrate temperature of 300 °C.
Magnesium fluoride thin films were prepared by electron-beam evaporation and ion-assisted deposition. The effects of ion assist and substrate temperature during the deposition on the optical properties and microstructure have been studied. The grain size, the crystallinity and the surface roughness of MgF2 films prepared without IAD all decreased with the decrease of substrate temperature. The MgF2 films deposited with IAD had small grain size, rough surfaces, fluorine deficiency and large optical loss over the 200-500nm wavelength region due to argon-ion bombardment.
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