CONFERENCE PROCEEDINGS
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Mohammed Fabin Shakila
at Picarro Inc
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 26 May 2022 Poster + Paper
Chemical metrology: a novel approach to measuring critical airborne molecular contamination in photolithography and track tools in real-time
Fabin Shakila, Sanjay Yedur, Jeffrey Headrick, Chris Rella, Feng Dong, Craig Haupt
Proceedings Volume 12053, 1205326 (2022) https://doi.org/10.1117/12.2614269
KEYWORDS: Reticles, Scanners, Optical filters, Contamination, Metrology, Lithography, Chemical analysis, Semiconducting wafers, Optical lithography, Statistical analysis
Proceedings Article | 26 May 2022 Poster + Paper
Real-time monitoring of critical AMC compounds in the photolithography cell using a novel laser-based, multi-species detection system
Sandhya Gopalakrishnan, Fabin Shakila, Jeffrey Headrick, Chris Rella, Heiko Abt, Michael Toepper
Proceedings Volume 12053, 1205323 (2022) https://doi.org/10.1117/12.2614150
KEYWORDS: Reticles, Optical filters, Scanners, Chemical analysis, Optical lithography, Semiconducting wafers, Metrology, Spectroscopy, Contamination, Lithography
Proceedings Article | 26 May 2022 Poster + Paper
Real-time monitoring of acetic acid and PGMEA in a photolithographic multifunction chemical filter using a laser-based multi-species VOC analyzer
Charlotte Pouligny, Vivien Carlini, Laura McHale, Chris Rella, Kai Skog, Fabin Shakila, Ambre Steiner, Thomas Vitrani
Proceedings Volume 12053, 1205321 (2022) https://doi.org/10.1117/12.2614119
KEYWORDS: Chemical analysis, Semiconductors, Optical lithography, Scanners, Optical filters, Air contamination, Absorption, Photoresist materials, Ions, Calibration
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