Dr. Murat Pak Profile

Dr. Murat Pak

at imec

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Publications (4)

Proceedings Article | 10 April 2024 Poster + Paper

Single mask solution to pattern DRAM LILP layer at 42nm pitch using EUV CAR photoresist

Arijit Das, Kiho Yang, Toto Chen, Pierce Chang, Sheng-Tse Chen, Shu-De Gong, Hyo Seon Suh, Jeonghoon Lee, Jan-Frederik Finoulst, Chris Wilson, Paulina Rincon Delgadillo, Murat Pak

Proceedings Volume PC12953, PC129530Z (2024) https://doi.org/10.1117/12.3011854

KEYWORDS: Critical dimension metrology, Extreme ultraviolet lithography, Optical lithography, Line width roughness, Photoresist materials, Semiconducting wafers, Finite element methods, Printing, Inspection, Cadmium

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Proceedings Article | 21 November 2023 Presentation + Paper

Litho process development for pillars to enable high density 4f2 memory cells at 34nm pitch

M. Pak, A. Dauendorffer, K. Nafus, A. Das, M. Hasan, P. Delgadillo

Proceedings Volume 12750, 1275004 (2023) https://doi.org/10.1117/12.2686265

KEYWORDS: Silicon carbide, Standards development, Optical lithography, Extreme ultraviolet lithography, Array processing, Printing, Photoresist processing, Design and modelling

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Proceedings Article | 26 May 2022 Paper

Orthogonal array pillar process development for high density 4F2 memory cells at 40nm pitch and beyond

Murat Pak, Wesley Zanders, Patrick Wong, Sandip Halder, Romuald Blanc, Laurent Souriau, Jeonghoon Lee, Gouri Sankar Kar

Proceedings Volume 12051, 120510J (2022) https://doi.org/10.1117/12.2618761

KEYWORDS: Semiconducting wafers, Photoresist materials, Array processing, Extreme ultraviolet lithography, Optical lithography, Finite element methods, Etching, Electroluminescence, Critical dimension metrology, Scanning electron microscopy

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Proceedings Article | 26 March 2019 Presentation + Paper

LCDU optimization of STT-MRAM 50nm pitch MTJ pillars for process window improvement

Murat Pak, Davide Crotti, Farrukh Yasin, Monique Ercken, Sandip Halder, Danilo De Simone, Pieter Vanelderen, Laurent Souriau, Hubert Hody, Gouri Sankar Kar

Proceedings Volume 10957, 109570R (2019) https://doi.org/10.1117/12.2515023

KEYWORDS: Etching, Optical lithography, Semiconducting wafers, Critical dimension metrology, Resistance, Magnetism, Photoresist processing, Manufacturing, Printing, Extreme ultraviolet lithography

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