Ms. Naoko Kihara Profile

Naoko Kihara

at Toshiba Corp

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 26 March 2013 Paper

Orientation and position-controlled block copolymer nanolithography for bit-patterned media

R. Yamamoto, M. Kanamaru, K. Sugawara, N. Sasao, Y. Ootera, T. Okino, H. Hieda, N. Kihara, Y. Kamata, A. Kikitsu

Proceedings Volume 8680, 86801U (2013) https://doi.org/10.1117/12.2012654

KEYWORDS: Beam propagation method, Magnetism, Lithography, Carbon, Nanolithography, Photomasks, Reactive ion etching, Scanning electron microscopy, Servomechanisms, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Evaluation of ordering of directed self-assembly of block copolymers with pre-patterned guides for bit patterned media

Takeshi Okino, Takuya Shimada, Akiko Yuzawa, Ryosuke Yamamoto, Naoko Kihara, Yoshiyuki Kamata, Akira Kikitsu, Takashi Akahane, You Yin, Sumio Hosaka

Proceedings Volume 8323, 83230S (2012) https://doi.org/10.1117/12.916304

KEYWORDS: Magnetism, Beam propagation method, Scanning electron microscopy, Image analysis, Servomechanisms, Reactive ion etching, Electron beam lithography, Etching, Oxygen, Directed self assembly

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Proceedings Article | 2 April 2011 Paper

Nanoimprint process for 2.5Tb/in2 bit patterned media fabricated by self-assembling method

Yasuaki Ootera, Akiko Yuzawa, Takuya Shimada, Ryousuke Yamamoto, Yoshiyuki Kamata, Naoko Kihara, Akira Kikitsu

Proceedings Volume 7970, 79700K (2011) https://doi.org/10.1117/12.878936

KEYWORDS: Beam propagation method, Silicon, Etching, Servomechanisms, Nickel, Nanoimprint lithography, Magnetism, Photomasks, Ultraviolet radiation, Electroplating

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Proceedings Article | 26 May 2010 Paper

Fabrication of ridge-and-groove servo pattern consisting of self-assembled dots for high-density bit patterned media

Yoshiyuki Kamata, Akira Kikitsu, Naoko Kihara, Seiji Morita, Kaori Kimura, Haruhiko Izumi

Proceedings Volume 7748, 774809 (2010) https://doi.org/10.1117/12.863873

KEYWORDS: Servomechanisms, Beam propagation method, Magnetism, Head, Photoemission spectroscopy, Etching, Polymers, Scanning electron microscopy, Distortion, Interference (communication)

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Proceedings Article | 18 March 2009 Paper

Fabrication of sub-10-nm pattern using diblock copolymer

Naoko Kihara, Kazutaka Takizawa, Hiroyuki Hieda

Proceedings Volume 7271, 72712T (2009) https://doi.org/10.1117/12.812210

KEYWORDS: Silicon, Etching, Polymers, Photomasks, Picosecond phenomena, Atomic force microscopy, Semiconducting wafers, Image processing, Particles, Dynamic light scattering

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Proceedings Article | 20 March 2008 Paper

NIL mold manufacturing using self-organized diblock copolymer as patterning template

Naoko Kihara, Hiroyuki Hieda, Katsuyuki Naito

Proceedings Volume 6921, 692126 (2008) https://doi.org/10.1117/12.771630

KEYWORDS: Silicon, Magnetism, Nanoimprint lithography, Nickel, Etching, Oxygen, Photomasks, Scanning electron microscopy, Optical lithography, Ions

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Proceedings Article | 7 July 1997 Paper

Effect of base additive on process latitude in chemically amplified electron-beam resists

Satoshi Saito, Naoko Kihara, Takuya Naito, Makoto Nakase, Tetsuro Nakasugi, Yoshimitsu Kato

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275868

KEYWORDS: Resistance, Quartz, Semiconducting wafers, Polymers, Lithography, Chemically amplified resists, Ultraviolet radiation, Photoresist processing, Scanning electron microscopy, Electron beams

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Proceedings Article | 14 June 1996 Paper

Effect of substituent groups of phenol-derivative dissolution inhibitors on inhibition efficiency

Naoko Kihara, Satoshi Saito, Takuya Naito, Tohru Ushirogouchi, Koji Asakawa, Makoto Nakase

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241818

KEYWORDS: Polymers, Sodium, Molecules, Thermodynamics, Diffusion, Rutherfordium, Polymer thin films, Chromatography, Chemical reactions, Liquids

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Proceedings Article | 16 May 1994 Paper

Quantum chemical studies of chemically amplified resist materials for electron-beam and ArF excimer laser

Tohru Ushirogouchi, Naoko Kihara, Satoshi Saito, Takuya Naito, Koji Asakawa, Tsukasa Tada, Makoto Nakase

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175337

KEYWORDS: Absorption, Excimer lasers, Chemical analysis, Transparency, Electron beams, Chemically amplified resists, Molecules, Molybdenum, Polymers, Plasma etching

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Proceedings Article | 1 June 1992 Paper

Novel chemical amplification positive-resist material for EB lithography

Naoko Kihara, Tohru Ushirogouchi, Tsukasa Tada, Takuya Naito, Satoshi Saito, Osamu Sasaki

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59730

KEYWORDS: Lithography, Absorption, Silicon, Semiconducting wafers, Polymers, Carbonates, Electron beams, Electron beam lithography, X-ray lithography, Silicon films

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Proceedings Article | 1 June 1991 Paper

Preparations and properties of novel positive photosensitive polyimides

Rumiko Hayase, Naoko Kihara, Naohiko Oyasato, S. Matake, Masayuki Oba

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46392

KEYWORDS: Semiconducting wafers, Silicon, Lithography, Photoresist materials, Picture Archiving and Communication System, Dielectrics, Avalanche photodetectors, Optical filters, Scanning electron microscopy, Photography

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Showing 5 of 11 publications

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