Mr. Neil G. Bradon Profile

Neil G. Bradon

at Intel Ireland Ltd

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 8 April 2011 Paper

EUV processing investigation on state of the art coater/developer system

H. Shite, N. Bradon, T. Shimoaoki, S. Kobayashi, K. Nafus, H. Kosugi, P. Foubert, J. Hermans, E. Hendrickx, M. Goethals, R. Gronheid, C. Jehoul

Proceedings Volume 7969, 796937 (2011) https://doi.org/10.1117/12.879406

KEYWORDS: Photoresist processing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Standards development, Manufacturing, Particles, Critical dimension metrology

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Proceedings Article | 23 March 2010 Paper

Further investigation of EUV process sensitivities for wafer track processing

Neil Bradon, K. Nafus, H. Shite, J. Kitano, H. Kosugi, M. Goethals, S. Cheng, J. Hermans, E. Hendrickx, B. Baudemprez, D. Van Den Heuvel

Proceedings Volume 7636, 763630 (2010) https://doi.org/10.1117/12.846610

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Photomasks, Photoresist processing, Manufacturing, Wafer testing, Lithography, Reticles

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Proceedings Article | 18 March 2009 Paper

Investigation of EUV-process sensitivities for wafer-track processing

Neil Bradon, Heiko Weichert, K. Nafus, S. Hatakeyama, J. Kitano, H. Kosugi, K. Yoshihara, M. Goethals, J. Hermans

Proceedings Volume 7271, 727148 (2009) https://doi.org/10.1117/12.814189

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Critical dimension metrology, Finite element methods, Double patterning technology, Image processing, Standards development, Lithography

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