Dr. Remi Vallat Profile

Dr. Remi Vallat

at imec

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Publications (4)

Proceedings Article | 10 April 2024 Presentation

Sustainability challenges and opportunities for dry etching from advanced packaging to advanced patterning

Philippe Bézard, Remi Vallat, Atefeh Fathzadeh, Konstantina Fillipidou

Proceedings Volume PC12958, (2024) https://doi.org/10.1117/12.3014622

KEYWORDS: Optical lithography, Sustainability, Gases, Dry etching, Advanced patterning, Advanced packaging, Semiconducting wafers, Passivation, Etching, Pollution control

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Proceedings Article | 9 April 2024 Presentation + Paper

Material and process optimization for EUV pattern rectification by DSA

Lander Verstraete, Hyo Seon Suh, Julie Van Bel, Byeong-U Bak, Seong Eun Kim, Remi Vallat, Philippe Bezard, Matteo Beggiato, Christophe Beral

Proceedings Volume 12956, 129560G (2024) https://doi.org/10.1117/12.3010817

KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Annealing, Bridges, Extreme ultraviolet lithography, Polymethylmethacrylate, Materials processing

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Proceedings Article | 1 May 2023 Presentation + Paper

Scaled-down deposited underlayers for EUV lithography

Mihir Gupta, Joao Antunes Afonso, Philippe Bezard, Remi Vallat, Roberto Fallica, Hyo Seon Suh, Sandip Halder, Danilo De Simone, Zecheng Liu, Fanyong Ran, Hideaki Fukuda, Yiting Sun, David De Roest, Daniele Piumi

Proceedings Volume 12498, 124980R (2023) https://doi.org/10.1117/12.2660376

KEYWORDS: Film thickness, Extreme ultraviolet lithography, Etching, Adhesion, Line width roughness, Line edge roughness, Surface roughness, Lithography, Interfaces

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Proceedings Article | 1 May 2023 Presentation + Paper

Mitigating stochastics in EUV lithography by directed self-assembly

L. Verstraete, Hyo Seon Suh, Julie Van Bel, Purnota Hannan Timi, Remi Vallat, Philippe Bezard, Jelle Vandereyken, Matteo Beggiato, Amir-Hossein Tamaddon, Christophe Beral, Waikin Li, Mihir Gupta, Roberto Fallica

Proceedings Volume 12497, 124970I (2023) https://doi.org/10.1117/12.2657939

KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Extreme ultraviolet lithography, Bridges, Etching

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