Dr. Remko Aubert Profile

Dr. Remko Aubert

at imec

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Publications (7)

Proceedings Article | 28 April 2023 Poster + Paper

Hydrogen recycling for EUV

Zachary Dunbar, Remko Aubert, Joost Van Ongeval, Tom Vandeweyer, Eric Hendrickx

Proceedings Volume 12494, 124941G (2023) https://doi.org/10.1117/12.2672627

KEYWORDS: Hydrogen, Extreme ultraviolet, Scanners, Extreme ultraviolet lithography, Contamination, Vacuum, Nitrogen, EUV optics, Carbon, Sustainability

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Proceedings Article | 28 April 2023 Presentation + Paper

CNT pellicles: recent optimization and exposure results

Joost Bekaert, Emily Gallagher, Marina Timmermans, Ivan Pollentier, Rik Jonckheere, Remko Aubert, Eric Hendrickx

Proceedings Volume 12494, 124940E (2023) https://doi.org/10.1117/12.2660595

KEYWORDS: Pellicles, Semiconducting wafers, Scanners, Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Plasma, Hydrogen

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SPIE Journal Paper | 27 May 2021

Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve van Look, Remko Aubert, Vineet Nair, Marina Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gökay Yeğen, Par Broman

JM3, Vol. 20, Issue 02, 021005, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.021005

KEYWORDS: Pellicles, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon nanotubes, Semiconducting wafers, Scattering, Reticles, Particles, Line width roughness

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Proceedings Article | 23 February 2021 Presentation + Paper

CNT pellicles: imaging results of the first full-field EUV exposures

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve Van Look, Remko Aubert, Vineet Nair, Marina Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gokay Yeğen, Pär Broman

Proceedings Volume 11609, 116090Z (2021) https://doi.org/10.1117/12.2584724

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Proceedings Article | 22 February 2021 Presentation + Paper

Metal layer single EUV expose at pitch 28 nm: how bright field and NTD resist advantages align

Joern-Holger Franke, Andreas Frommhold, Natalia Davydova, Remko Aubert, Vineet Vijayakrishnan Nair, Tatiana Kovalevich, David Rio, Joost Bekaert, Erik Wang, Gijsbert Rispens, Mark Maslow, Eric Hendrickx

Proceedings Volume 11609, 116090R (2021) https://doi.org/10.1117/12.2584733

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Proceedings Article | 4 November 2020 Presentation + Paper

Study of EUV reticle storage effects through exposure on EBL2 and NXE

Rik Jonckheere, Chien-Ching Wu, Veronique de Rooij-Lohmann, Dorus Elstgeest, Henk Lensen, Philipp Hönicke, Michael Kolbe, Victor Soltwisch, Claudia Zech, Frank Scholze, Remko Aubert, Vineet Nair, Eric Hendrickx

Proceedings Volume 11517, 115170Z (2020) https://doi.org/10.1117/12.2573125

KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Ruthenium, Scanners, Contamination, Integrated circuits, Semiconductors, X-rays

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Proceedings Article | 13 October 2020 Presentation + Paper

Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry

Vineet Vijayakrishnan Nair, Lieve Van Look , Remko Aubert, Eric Hendrickx

Proceedings Volume 11517, 115170O (2020) https://doi.org/10.1117/12.2572993

KEYWORDS: Scanners, Extreme ultraviolet lithography, Semiconducting wafers, Ellipsometry, EUV optics, Metrology, Calibration, Photomasks, Critical dimension metrology, Time metrology

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Showing 5 of 7 publications

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