Dr. Ruiqi Tian Profile

Dr. Ruiqi Tian

at NXP Semiconductors

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 6 December 2004 Paper

A multi-objective floorplanner for shuttle mask optimization

Gang Xu, Ruiqi Tian, David Pan, Martin Wong

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569345

KEYWORDS: Reticles, Manufacturing, Inspection, Computer programming, Very large scale integration, Photomasks, Semiconducting wafers, Wafer manufacturing, Chemical mechanical planarization, Algorithms

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Cost of ownership reduction for OPC development and production

Chi-Min Yuan, Bob Jarvis, Kevin Lucas, Robert Boone, Ruiqi Tian, Alfred Reich

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535279

KEYWORDS: Lithography, Optical lithography, Optical proximity correction

Read Abstract +

Proceedings Article | 3 May 2004 Paper

Combining OPC and design for printability into 65-nm logic designs

Kevin Lucas, Chi-Min Yuan, Robert Boone, Kirk Strozewski, Jason Porter, Ruiqi Tian, Karl Wimmer, Jonathan Cobb, Bill Wilkinson, Olivier Toublan

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.537655

KEYWORDS: Lithography, Reticles, Logic, Optical lithography, Metals, Manufacturing, Design for manufacturing, Optical proximity correction, Yield improvement, Model-based design

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Shuttle mask floorplanning

Gang Xu, Ruiqi Tian, Martin Wong, Alfred Reich

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517568

KEYWORDS: Mirrors, Manufacturing, Inspection, Space mirrors, Very large scale integration, Photomasks, Computer aided design, Semiconducting wafers, Wafer manufacturing, Algorithms

Read Abstract +

Proceedings Article | 12 July 2002 Paper

Implications of tiling for performance and design flow

Ertugrul Demircan, Ruiqi Tian, Warren Grobman

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475690

KEYWORDS: Oxides, Polishing, Calibration, Metals, Copper, Resistance, Capacitance, Electromagnetism, Model-based design, Chemical mechanical planarization

Read Abstract +

Proceedings Article | 26 July 1999 Paper

Practicing extension of 248-nm DUV optical lithography using trim-mask PSM

Michael Kling, Nigel Cave, Bradley Falch, Chong-Cheng Fu, Kent Green, Kevin Lucas, Bernard Roman, Alfred Reich, John Sturtevant, Ruiqi Tian, Drew Russell, Linard Karklin, Yao-Ting Wang

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354297

KEYWORDS: Reticles, Optical lithography, Deep ultraviolet, Etching, Manufacturing, Photomasks, Optical proximity correction, Optics manufacturing, Binary data, Phase shifts

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years