The 3D shape measurement technology based on structured-light with a single camera has many advantageous aspects on usability, such as non-contact, high precision, high speed etc. There are various kinds of software accepting its measurement results readily. That is why it has been widely used in reality. System calibration is the key step before it begins normal scanning, and the setting of parameters in calibration directly affects the accuracy of the measurement. Some problems exist in the process of its calibration, such as the process is complicated and hard to operate, always taking low accuracy for the scanning result. This paper aims to find methods to solve the problems. The 3D scanning system used in the research is composed of a Canada-made Point Grey CMOS industrial camera (FL3-U3-13Y3M-C) with a China-made lens, a Texas instrument projector DLP LightCrafter 4500 EVM.
The parameters that can be set in the process of system calibration are discussed in the paper, and the scanning results with parameter change are evaluated based on the indicators of camera and projector’s reprojection error, scanning resolution and point cloud’s uniformity. The research concludes that the distance between the projector and the calibration board is a key factor needs to be controlled. It can be set up properly based on the indicators for the quality of scanned data, which improves the speed of system calibration and keep the collected point cloud data more stable.
As one of the most interesting II–IV compound semiconductors, ZnO has large band gap (3.37 eV) and high excitonic binding energy (60 meV). Based on this, it has attracted a great deal of attention for applications in ultraviolet light-emitting devices (LED) and photodetectors. There are many preparation methods to prepare ZnO films, such as metal organic chemical vapor deposition (MOCVD), magnetron sputtering, vacuum thermal evaporation, and so on. Among them, there are many advantages on using magnetron sputtering to form ZnO thin films, such as good adhesion, good thickness uniformity, high density of films, so we take advantage of this method in our experiment. In this work, we present a simple, rapid and cost effective method to fabricate ordered periodic substrates by preparing single layer polystyrene microspheres masks, with 300, 600, 800and 1100 nm in diameters. Then the layer of zinc oxide thin films on the mask by RF magnetron sputtering technique have been deposited, and two-dimensional zinc oxide nano-array samples were obtained at last. Using this active plasmonic substrate, the optical properties of ZnO films on polystyrene microspheres template has been investigated.
As one of the most interesting II–IV compound semiconductors, ZnO has large band gap (3.37 eV) and high excitonic binding energy (60 meV). Based on this, it has attracted a great deal of attention for applications in ultraviolet light-emitting devices (LED) and photodetectors. There are many preparation methods to prepare ZnO films, such as metal organic chemical vapor deposition (MOCVD), magnetron sputtering, vacuum thermal evaporation, and so on. Among them, there are many advantages on using magnetron sputtering to form ZnO thin films, such as good adhesion, good thickness uniformity, high density of films, so we take advantage of this method in our experiment. In this work, we present a simple, rapid and cost effective method to fabricate ordered periodic substrates by preparing single layer polystyrene microspheres masks, with 300, 600, 800and 1100 nm in diameters. Then the layer of zinc oxide thin films on the mask by RF magnetron sputtering technique have been deposited, and two-dimensional zinc oxide nano-array samples were obtained at last. Using this active plasmonic substrate, the optical properties of ZnO films on polystyrene microspheres template has been investigated.
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