Dr. Shantanu Saha Profile

Dr. Shantanu Saha

Student at Indian Institute of Technology Bombay

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 1 March 2018 Paper

Temperature-dependent phosphorous dopant activation in ZnO thin film deposited using plasma immersion ion implantation

Punam Murkute, Hemant Ghadi, Shantanu Saha, Vinayak Chavan, Subhananda Chakrabarti

Proceedings Volume 10533, 105332K (2018) https://doi.org/10.1117/12.2288944

KEYWORDS: Zinc oxide, Annealing, Temperature metrology, Zinc, Thin films, Phosphorus, Scanning electron microscopy, Ion implantation, Raman spectroscopy, Plasma

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Proceedings Article | 1 March 2018 Paper

Effect of time varying phosphorus implantation on optoelectronics properties of RF sputtered ZnO thin-films

Punam Murkute, Hemant Ghadi, Shantanu Saha, Vinayak Chavan, Subhananda Chakrabarti

Proceedings Volume 10533, 105332L (2018) https://doi.org/10.1117/12.2288958

KEYWORDS: Zinc oxide, Phosphorus, Thin films, Zinc, Ions, Oxygen, Ion implantation, Excitons, Plasma, Annealing

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Proceedings Article | 24 February 2017 Paper

Enhancement of photoluminescence in RF sputtered ZnMgO thin films by optimizing annealing temperature

P. Murkute, H. Ghadi, S. Saha, S. Chakrabarti

Proceedings Volume 10105, 1010524 (2017) https://doi.org/10.1117/12.2252015

KEYWORDS: Thin films, Annealing, Luminescence, Sputter deposition, Thin film growth, Zinc, Magnesium, Excitons, Zinc oxide

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Proceedings Article | 24 February 2017 Paper

Improvement in grain size and crystallinity of sputtered ZnO thin film with optimized annealing ambient

P. Murkute, S. Saha, H. Ghadi, S. Chakrabarti

Proceedings Volume 10105, 1010521 (2017) https://doi.org/10.1117/12.2251448

KEYWORDS: Argon, Atomic force microscopy, Sputter deposition

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Proceedings Article | 27 February 2016 Paper

Influence of oxygen partial pressure on optical and structural properties of RF sputtered ZnO thin films

P. Murkute, S. Saha, S. Pandey, A. Chatterjee, D. Datta, S. Chakrabarti

Proceedings Volume 9749, 974921 (2016) https://doi.org/10.1117/12.2214006

KEYWORDS: Oxygen, Zinc oxide, Annealing, Temperature metrology, Thin films, Thin film deposition, Silicon, Sputter deposition, Argon, Luminescence, Atomic force microscopy, Excitons

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