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Shengrui Zhang
at Dongfang Jingyuan Electron Ltd
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Publications (1)
Proceedings Article | 10 April 2024 Presentation + Paper
A novel flow of full-chip OPC model calibration and verification by utilizing SEM image contours
Proceedings Volume 12954, 129540K (2024) https://doi.org/10.1117/12.3010034
KEYWORDS: Optical proximity correction, Calibration, Contour modeling, Scanning electron microscopy, Data modeling, Data acquisition, Contour extraction, Image quality, Critical dimension metrology, Process modeling
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