CONFERENCE PROCEEDINGS
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Shota Yoshimura
at Tokyo Electron Miyagi Ltd
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Author
Publications (3)
Proceedings Article | 22 February 2021 Poster + Presentation + Paper
EUV defect reduction activities using coater/developer and etching technique
Takahiro Shiozawa, Keisuke Yoshida, Noriaki Nagamine, Arnaud Dauendorffer, Satoru Shimura, Kathleen Nafus, Yannick Feurprier, Kenta Ono, Shota Yoshimura, Atsutoshi Inokuchi, Kiyoshi Maeda, Tetsuya Nishizuka, Shinya Morikita, Yoshihide Kihara, Ken Kobayashi
Proceedings Volume 11612, 116120T (2021) https://doi.org/10.1117/12.2583772
KEYWORDS: Extreme ultraviolet, Etching, Extreme ultraviolet lithography, Stochastic processes, Photoresist processing, Particles, Lithographic illumination, High volume manufacturing
Proceedings Article | 25 March 2019 Paper
Robustness of interactive pattern fidelity error as a quality metric for integrated patterning
Proceedings Volume 10960, 109601P (2019) https://doi.org/10.1117/12.2514663
KEYWORDS: Critical dimension metrology, Optical lithography, Overlay metrology, Etching, Stochastic processes, Semiconducting wafers, Statistical analysis
Proceedings Article | 13 March 2018 Paper
EUV via hole pattern fidelity enhancement through novel resist and post-litho plasma treatment
Hidetami Yaegashi, Kyohei Koike, Carlos Fonseca, Fumiko Yamashita, Kumar Kaushik, Shinya Morikita, Kiyohito Ito, Shota Yoshimura, Vadim Timoshkov, Mark Maslow, Tae Kwon Jee, Liesbeth Reijnen, Peter Choi, Mu Feng, Chris Spence, Stijn Schoofs
Proceedings Volume 10586, 1058605 (2018) https://doi.org/10.1117/12.2297661
KEYWORDS: Extreme ultraviolet, Optical lithography, Plasma treatment, Stochastic processes, Extreme ultraviolet lithography, Photomasks, System on a chip, Lithography, Silica, Manufacturing
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