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Dr. Shruti Jambaldinni
at Lam Research Belgium BV
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 13 November 2024 Presentation
Advancements in dry resist patterning towards high NA EUV enablement
Ali Haider, Shruti Jambaldini, Mohand Brouri, Francesco Gullo, Zhengtao Chen, Anuja De Silva, Rich Wise, Matteo Beggiato, Christophe Beral, Hyo Seon Suh, Danilo De Simone
Proceedings Volume PC13215, PC1321506 (2024) https://doi.org/10.1117/12.3034635
KEYWORDS: Extreme ultraviolet, Optical lithography, Photoresist processing, Printing, Plasma, Inspection, Extreme ultraviolet lithography, Chemistry, Chemical composition, Capillaries
Proceedings Article | 10 April 2024 Presentation + Paper
Improving OPC model accuracy of dry resist for low k1 EUV patterning
Proceedings Volume 12954, 129540L (2024) https://doi.org/10.1117/12.3010127
KEYWORDS: SRAF, Printing, Semiconducting wafers, Optical proximity correction, Photoresist processing, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet
Proceedings Article | 30 April 2023 Presentation
Dry resist patterning readiness towards high-NA EUV lithography
Hyo Seon Suh, Danilo De Simone, Christophe Beral, Mihir Gupta, Nadia Vandenbroeck, Anuja De Silva, Ali Haider, Ching-Chung Huang, Mohand Brouri, Francesco Gullo, Shruti Jambaldinni, Benjamin Kam, Hicham Zaid, Elisseos Verveniotis, Samantha Tan, Tim Weidman, Jengyi Yu, Da Li, Jun Xue, Younghee Lee
Proceedings Volume 12498, 1249803 (2023) https://doi.org/10.1117/12.2661652
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist processing, Materials processing, Interfaces
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