Mr. Soung Su Cornell Woo Profile

Soung Su Cornell Woo

Principal Engineer at ASML

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Publications (4)

Proceedings Article | 28 July 2014 Paper

Use of ILT-based mask optimization for local printability enhancement

Alexander Tritchkov, Sergey Kobelkov, Sergei Rodin, Kyohei Sakajiri, Evgueni Egorov, Soung-Su Woo

Proceedings Volume 9256, 92560X (2014) https://doi.org/10.1117/12.2068493

KEYWORDS: Photomasks, Liquid phase epitaxy, SRAF, Optical proximity correction, Lithography, Resolution enhancement technologies, Manufacturing, Atrial fibrillation, Source mask optimization, Neodymium

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Proceedings Article | 13 March 2012 Paper

Model based OPC for implant layer patterning considering wafer topography proximity (W3D) effects

Songyi Park, Hyungjoo Youn, Noyoung Chung, Jaeyeol Maeng, Sukjoo Lee, Jahum Ku, Xiaobo Xie, Song Lan, Mu Feng, Venu Vellanki, Joobyoung Kim, Stanislas Baron, Hua-Yu Liu, Stefan Hunsche, Soung-Su Woo, Seung-Hoon Park, Jong-Tai Yoon

Proceedings Volume 8326, 83260O (2012) https://doi.org/10.1117/12.918000

KEYWORDS: Semiconducting wafers, Optical proximity correction, Calibration, Photomasks, Optical lithography, Critical dimension metrology, Data modeling, Silicon, Photoresist materials, Reflection

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Proceedings Article | 21 March 2007 Paper

Lithography enhanced manufacturability analysis by using multilevel simulated contours

Beom-Seok Seo, Woon-Hyuk Choi, Jong-Woon Park, Soung-Su Woo, Sung-Ho Lee

Proceedings Volume 6521, 65210Y (2007) https://doi.org/10.1117/12.711825

KEYWORDS: Optical proximity correction, Diffusion, Lithography, Resolution enhancement technologies, Manufacturing, Critical dimension metrology, Logic, Design for manufacturability, Photomasks, Electroluminescence

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Proceedings Article | 30 July 2002 Paper

Intrafield CD variation by stray light from neighboring field

Chang-Moon Lim, Jung-Ho Song, Sung-Soo Woo, Ki-Sung Kwon, Chang-Nam Ahn, Ki-Soo Shin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474525

KEYWORDS: Stray light, Critical dimension metrology, Photomasks, Scanners, Light scattering, Optical lithography, Lithographic illumination, Semiconducting wafers, Binary data, Chromium

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