Dr. Stanley E. Stokowski Profile

Dr. Stanley E. Stokowski

Consultant at Stokowski and Associates

SPIE Involvement:

Author

Proceedings Article | 26 May 2010 Paper

Inspecting EUV mask blanks with a 193-nm system

Joshua Glasser, Stan Stokowski, Gregg Inderhees

Proceedings Volume 7748, 774808 (2010) https://doi.org/10.1117/12.865490

KEYWORDS: Inspection, Extreme ultraviolet, Optical spheres, Quartz, Particles, Silica, Photomasks, Defect detection, Deep ultraviolet, Defect inspection

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Proceedings Article | 20 March 2010 Paper

Inspecting EUV mask blanks with a 193nm system

Stan Stokowski, Joshua Glasser, Gregg Inderhees, Phani Sankuratri

Proceedings Volume 7636, 76360Z (2010) https://doi.org/10.1117/12.850825

KEYWORDS: Inspection, Extreme ultraviolet, Optical spheres, Particles, Quartz, Photomasks, Silica, Deep ultraviolet, Defect detection, Signal to noise ratio

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Proceedings Article | 9 November 2005 Paper

Measuring line-edge roughness of masks with DUV light

Stan Stokowski, David Alles

Proceedings Volume 5992, 59924P (2005) https://doi.org/10.1117/12.633184

KEYWORDS: Photomasks, Line edge roughness, Inspection, Deep ultraviolet, Spatial frequencies, Critical dimension metrology, Image analysis, Image processing, Semiconducting wafers, Lithography

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Proceedings Article | 6 December 2004 Paper

Optical inspection of NGL masks

Donald Pettibone, Stanley Stokowski

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569366

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Charged-particle lithography, Lithography, Optical inspection, Image transmission, Semiconducting wafers, Reflectivity, Extreme ultraviolet lithography

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Proceedings Article | 28 May 2003 Paper

Inspection of alternating phase-shift masks through the use of phase contrast techniques

Larry Zurbrick, Maciej Rudzinski, Stanley Stokowski, Long He, Kurt Kimmel, Nishrin Kashwala

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515102

KEYWORDS: Inspection, Quartz, Defect detection, Phase contrast, Photomasks, Etching, Lithography, Detection and tracking algorithms, Phase shift keying, Phase shifts

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Proceedings Article | 27 December 2002 Paper

Alternating phase-shift mask inspection through the use of phase contrast enhancement techniques

Larry Zurbrick, Maciej Rudzinski, Stanley Stokowski, Long He, Kurt Kimmel, Nishrin Kashwala

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468086

KEYWORDS: Inspection, Quartz, Defect detection, Photomasks, Phase contrast, Lithography, Etching, Manufacturing, Binary data, Phase shifts

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Proceedings Article | 27 December 2002 Paper

Impact of EUV mask quality on optical inspection sensitivity

Donald Pettibone, Aditya Dayal, Stanley Stokowski

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467439

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Modulation, Reflectivity, Extreme ultraviolet lithography, Optical inspection, Autoregressive models, Glasses, Printing

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Proceedings Article | 1 August 2002 Paper

Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques

Larry Zurbrick, Jan Heumann, Maciej Rudzinski, Stanley Stokowski, Jan-Peter Urbach, Lantian Wang

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476919

KEYWORDS: Inspection, Phase shift keying, Defect detection, Phase shifts, Photomasks, Defect inspection, Detection and tracking algorithms, Algorithm development, Quartz, Etching

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Proceedings Article | 11 March 2002 Paper

New approaches to alternating phase-shift mask inspection

Larry Zurbrick, Jan Heumann, Maciej Rudzinski, Stanley Stokowski, Jan-Peter Urbach, Lantian Wang

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458285

KEYWORDS: Inspection, Phase shifts, Photomasks, Defect detection, Reticles, Etching, Quartz, Algorithm development, Image transmission, Semiconducting wafers

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Proceedings Article | 5 September 2001 Paper

Optical inspection of EUV and SCALPEL reticles

Donald Pettibone, Stanley Stokowski

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438384

KEYWORDS: Inspection, Photomasks, Deep ultraviolet, Ultraviolet radiation, Extreme ultraviolet, Reflectivity, Reticles, Charged-particle lithography, Optical inspection, Silicon

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Proceedings Article | 19 July 2000 Paper

Next-generation lithography mask inspection

Noah Bareket, Steve Biellak, Donald Pettibone, Stanley Stokowski

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392104

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Particles, Lithography, Defect detection, Reflectivity, Semiconducting wafers, Glasses, Multilayers

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Proceedings Article | 18 September 1995 Paper

New laser scanning techniques for wafer inspection

Mehrdad Nikoonahad, Brian Leslie, Stanley Stokowski, Brian Trafas, Keith Wells

Proceedings Volume 2638, (1995) https://doi.org/10.1117/12.221207

KEYWORDS: Semiconducting wafers, Particles, Scattering, Laser scanners, Silicon, Inspection, Light scattering, Dielectric polarization, Wafer inspection, Polarization

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Proceedings Article | 22 May 1995 Paper

Extendibility of laser scanning tools for advanced wafer inspection

Brian Trafas, Mehrdad Nikoonahad, Keith Wells, R. Johnson, Stanley Stokowski

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209199

KEYWORDS: Semiconducting wafers, Laser scanners, Laser systems engineering, Light scattering, Wafer inspection, Wafer-level optics, Inspection, Particles, Signal detection, Scattering

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Proceedings Article | 1 July 1991 Paper

Measuring films on and below polycrystalline silicon using reflectometry

Herbert Engstrom, Stanley Stokowski

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44467

KEYWORDS: Silicon, Reflectivity, Semiconducting wafers, Silicon films, Reflectometry, Visible radiation, Crystals, Thin films, Refractive index, Ultraviolet radiation

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Proceedings Article | 1 June 1990 Paper

Measuring refractive indices of films on semiconductors by microreflectometry

Stanley Stokowski

Proceedings Volume 1261, (1990) https://doi.org/10.1117/12.20052

KEYWORDS: Refractive index, Silicon, Reflectivity, Silicon films, Reflectometry, Ellipsometry, Semiconducting wafers, Ultraviolet radiation, Integrated circuits, Inspection

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Showing 5 of 15 publications

Conference Committee Involvement (6)

Extreme Ultraviolet (EUV) Lithography IV

25 February 2013 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography III

13 February 2012 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography II

28 February 2011 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography

22 February 2010 | San Jose, California, United States

Photomask Technology

3 October 2005 | Monterey, California, United States

Showing 5 of 6 Conference Committees

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