Dr. Stephen F. Horne Profile

Dr. Stephen F. Horne

Senior Scientist at Energetiq Technology Inc

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Author

Publications (10)

SPIE Journal Paper | 21 May 2012

Extreme-ultraviolet light source development to enable pre-production mask inspection

Matthew Partlow, Matthew Besen, Paul Blackborow, Ron Collins, Deborah Gustafson, Stephen Horne, Donald Smith

JM3, Vol. 11, Issue 02, 021105, (May 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021105

KEYWORDS: Extreme ultraviolet, Plasma, Light sources, Photomasks, Metrology, Inspection, Modulators, Xenon, Extreme ultraviolet lithography, Magnetism

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Proceedings Article | 23 March 2012 Paper

High brightness electrodeless Z-Pinch EUV source for mask inspection tools

Stephen Horne, Matthew Partlow, Deborah Gustafson, Matthew Besen, Donald Smith, Paul Blackborow

Proceedings Volume 8322, 83222M (2012) https://doi.org/10.1117/12.916476

KEYWORDS: Plasma, Inspection, Extreme ultraviolet, Xenon, Photomasks, Physics, Light sources, Extreme ultraviolet lithography, Pulsed laser operation, Data modeling

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Proceedings Article | 14 October 2011 Paper

EQ-10 electrodeless Z-pinch EUV source for metrology applications

Deborah Gustafson, Stephen Horne, Matthew Partlow, Matthew Besen, Donald Smith, Paul Blackborow

Proceedings Volume 8166, 81662U (2011) https://doi.org/10.1117/12.899141

KEYWORDS: Plasma, Extreme ultraviolet, Metrology, Photomasks, Modulators, Inspection, Light sources, Magnetism, Copper, Xenon

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Proceedings Article | 8 April 2011 Paper

Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications

Stephen Horne, Deborah Gustafson, Matthew Partlow, Matthew Besen, Donald Smith, Paul Blackborow

Proceedings Volume 7969, 79692Z (2011) https://doi.org/10.1117/12.880794

KEYWORDS: Extreme ultraviolet, Plasma, Modulators, Metrology, Extreme ultraviolet lithography, Xenon, Diodes, Chaos, Switches, Light sources

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Proceedings Article | 28 April 2010 Paper

A novel high-brightness broadband light-source technology from the VUV to the IR

Stephen Horne, Don Smith, Matthew Besen, Matthew Partlow, Daniil Stolyarov, Huiling Zhu, William Holber

Proceedings Volume 7680, 76800L (2010) https://doi.org/10.1117/12.850269

KEYWORDS: Lamps, Plasma, Xenon, Physics, Vacuum ultraviolet, Electrodes, Ultraviolet radiation, Semiconductor lasers, Infrared imaging, Laser optics

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Proceedings Article | 18 March 2010 Paper

EUV source development for AIMS and blank inspection

Paul Blackborow, Matthew Partlow, Stephen Horne, Matthew Besen, Donald Smith, Deborah Gustafson

Proceedings Volume 7636, 763609 (2010) https://doi.org/10.1117/12.846559

KEYWORDS: Extreme ultraviolet, Inspection, Plasma, Light sources, Photomasks, Metrology, Extreme ultraviolet lithography, Reliability, Electrodes, Copper

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Proceedings Article | 18 March 2009 Paper

Development of a high-pulse-rate EUV source

Stephen Horne, Fred Niell, Matthew Partlow, Matthew Besen, Donald Smith, Paul Blackborow, Deborah Gustafson

Proceedings Volume 7271, 72713A (2009) https://doi.org/10.1117/12.813765

KEYWORDS: Plasma, Extreme ultraviolet, Magnetism, Capacitors, Modulators, Switches, Mirrors, Inductance, Xenon, Copper

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Proceedings Article | 20 March 2008 Paper

EUV source development at Energetiq

Paul Blackborow, Matthew Partlow, Stephen Horne, Matthew Besen, Donald Smith, Deborah Gustafson

Proceedings Volume 6921, 692121 (2008) https://doi.org/10.1117/12.772890

KEYWORDS: Extreme ultraviolet, Plasma, Zirconium, Xenon, Light sources, Mirrors, Diodes, Manufacturing, Light, EUV optics

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Proceedings Article | 15 March 2007 Paper

Application of the Energetiq EQ-10 electrodeless Z-Pinch EUV light source in outgassing and exposure of EUV photoresist

Paul Blackborow, Deborah Gustafson, Donald Smith, Matthew Besen, Stephen Horne, Robert D'Agostino, Youichi Minami, Gregory Denbeaux

Proceedings Volume 6517, 65171W (2007) https://doi.org/10.1117/12.711457

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Mirrors, Electrodes, Plasma, Light sources, Contamination, Floods, Photoresist materials, Metals

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Proceedings Article | 23 March 2006 Paper

Application of a high-brightness electrodeless Z-pinch EUV source for metrology, inspection, and resist development

Stephen Horne, Matthew Besen, Donald Smith, Paul Blackborow, Robert D'Agostino

Proceedings Volume 6151, 61510P (2006) https://doi.org/10.1117/12.655696

KEYWORDS: Plasma, Extreme ultraviolet, Electrodes, Semiconducting wafers, Magnetism, Zirconium, Mirrors, Xenon, Metrology, Diodes

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Showing 5 of 10 publications

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