Dr. Subrata Ghosh Profile

Dr. Subrata Ghosh

at Indian Institute of Technology Mandi

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 26 March 2020 Presentation + Paper

All-new nickel-based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning

Satinder Sharma, Rudra Kumar, Manvendra Chauhan, Mohamad Moinuddin, Jerome Peter, Subrata Ghosh, Chullikkattil Pradeep, Kenneth Gonsalves

Proceedings Volume 11326, 1132604 (2020) https://doi.org/10.1117/12.2552189

KEYWORDS: Electron beam lithography, Nickel, Metals, Etching, Line edge roughness, Line width roughness, Silicon, Helium, Resistance, Thin films

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Proceedings Article | 23 March 2020 Paper

Focusing on nanoparticles-based photomultiplier in n-CARs

Satinder Sharma, Mohamad Moinuddin, Midathala Yogesh, Shivani Sharma, Manoj Sahani, Subrata Ghosh, Kenneth Gonsalves

Proceedings Volume 11326, 113261C (2020) https://doi.org/10.1117/12.2552190

KEYWORDS: Nanoparticles, Electron beam lithography, Silver, Line edge roughness, Helium, Photomultipliers, Extreme ultraviolet, Lithography, Absorbance, Ions

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Proceedings Article | 19 March 2018 Paper

Evaluation of high-resolution and sensitivity of n-CAR hybrid resist for sub-16nm or below technology node

Satinder Sharma, Mohamad Ghulam Moinuddin, Pulikanti Guruprasad Reddy, Chullikkattil Pradeep, Subrata Ghosh, Kenneth Gonsalves

Proceedings Volume 10583, 105831Q (2018) https://doi.org/10.1117/12.2297565

KEYWORDS: Electron beam lithography, Extreme ultraviolet lithography, Thin films, Lithography, Line edge roughness, Line width roughness, Tin, Resolution enhancement technologies, Photoresist developing, Atomic force microscopy

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Proceedings Article | 19 March 2018 Paper

Helium ion active hybrid non-chemically amplified resist (n-CAR) for sub-10 nm patterning applications

Satinder Sharma, Pulikanti Guruprasad Reddy, Mohamad Ghulam Moinuddin, Subrata Ghosh, Chullikkattil Pradeep, Kenneth Gonsalves

Proceedings Volume 10584, 1058409 (2018) https://doi.org/10.1117/12.2297537

KEYWORDS: Ions, Electron beam lithography, Monte Carlo methods, Helium, Thin films, Electrons, Line edge roughness, Lithography, Optical lithography, Line width roughness

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SPIE Journal Paper | 16 October 2014

Performance evaluation of nonchemically amplified negative tone photoresists for e-beam and EUV lithography

Vikram Singh, Vardhineedi Sri Venkata Satyanarayana, Nikola Batina, Israel Morales Reyes, Satinder Sharma, Felipe Kessler, Francine Scheffer, Daniel Weibel, Subrata Ghosh, Kenneth Gonsalves

JM3, Vol. 13, Issue 04, 043002, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043002

KEYWORDS: Extreme ultraviolet lithography, Polymers, Photoresist materials, Extreme ultraviolet, Electron beam lithography, Etching, Line edge roughness, Resistance, Silicon, Lithography

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Proceedings Article | 17 April 2014 Paper

Optimization of processing parameters and metrology for novel NCA negative resists for NGL

Vikram Singh, V. S. V. Satyanarayana, Felipe Kessler, Francine Scheffer, Daniel Weibel, Satinder Sharma, Subrata Ghosh, Kenneth Gonsalves

Proceedings Volume 9048, 90481Y (2014) https://doi.org/10.1117/12.2045882

KEYWORDS: Etching, Electron beam lithography, Resistance, Extreme ultraviolet lithography, Extreme ultraviolet, Polymers, Thin films, Lithography, Surface roughness, Silicon

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Proceedings Article | 17 April 2014 Paper

Design and synthesis of novel resist materials for EUVL

V. S. V. Satyanarayana, Vikram Singh, Subrata Ghosh, Satinder Sharma, Kenneth Gonsalves

Proceedings Volume 9048, 90481W (2014) https://doi.org/10.1117/12.2045736

KEYWORDS: Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Polymers, Polymerization, Silicon, Semiconducting wafers, Electron beam lithography, Line edge roughness, Scanning electron microscopy

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Proceedings Article | 27 March 2014 Paper

Organic-inorganic hybrid resists for EUVL

Vikram Singh, Vishwanath Kalyani, V. S. Satyanarayana, Chullikkattil Pradeep, Subrata Ghosh, Satinder Sharma, Kenneth Gonsalves

Proceedings Volume 9051, 90511W (2014) https://doi.org/10.1117/12.2041907

KEYWORDS: Polymethylmethacrylate, Photoresist materials, Polymers, Molybdenum, Medium wave, Extreme ultraviolet lithography, Etching, Resistance, Photoresist developing, Electron beam lithography

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Proceedings Article | 27 March 2014 Paper

Novel non-chemically amplified (n-CARs) negative resists for EUVL

Vikram Singh, V. S. Satyanarayana, Satinder Sharma, Subrata Ghosh, Kenneth Gonsalves

Proceedings Volume 9051, 905106 (2014) https://doi.org/10.1117/12.2041183

KEYWORDS: Extreme ultraviolet lithography, Electron beam lithography, Extreme ultraviolet, Polymers, Chemically amplified resists, Etching, Lithography, Line edge roughness, Resistance, Photoresist materials

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Showing 5 of 9 publications

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