Dr. Sungsoo Suh
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 5 April 2011 Paper
Proceedings Volume 7974, 79740Y (2011) https://doi.org/10.1117/12.881472
KEYWORDS: Etching, Photomasks, Critical dimension metrology, Personal protective equipment, Performance modeling, Transistors, Control systems, Instrument modeling, Scanning electron microscopy, Calibration

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731L (2011) https://doi.org/10.1117/12.879781
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Data modeling, Lithography, SRAF, Calibration, Nanoimprint lithography, Resolution enhancement technologies

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731C (2011) https://doi.org/10.1117/12.882814
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Manufacturing, SRAF, Image segmentation, Inverse problems, Optimization (mathematics), Electronics, Electroluminescence

Proceedings Article | 26 May 2010 Paper
Proceedings Volume 7748, 77481T (2010) https://doi.org/10.1117/12.867995
KEYWORDS: SRAF, Photomasks, Image segmentation, Lithography, Control systems, Stereolithography, Critical dimension metrology, Electron beam lithography, Manufacturing, Resolution enhancement technologies

Proceedings Article | 30 September 2009 Paper
Byung-Gook Kim, Sung Soo Suh, Sang Gyun Woo, HanKu Cho, Guangming Xiao, Dong Hwan Son, Dave Irby, David Kim, Ki-Ho Baik
Proceedings Volume 7488, 748812 (2009) https://doi.org/10.1117/12.833572
KEYWORDS: Photomasks, Inspection, Lithography, Manufacturing, SRAF, Optical proximity correction, Image segmentation, Error analysis, Resolution enhancement technologies, Scanning electron microscopy

Proceedings Article | 9 June 2009 Paper
Proceedings Volume 7379, 73791M (2009) https://doi.org/10.1117/12.824299
KEYWORDS: Photomasks, Lithography, Inspection, Logic, Manufacturing, Optical proximity correction, Model-based design, Scanning electron microscopy, Image processing, Systems modeling

Proceedings Article | 11 May 2009 Paper
Sungsoo Suh, Suk-joo Lee, Seong-woon Choi, Sung-Woo Lee, Chan-hoon Park
Proceedings Volume 7379, 73792T (2009) https://doi.org/10.1117/12.824343
KEYWORDS: SRAF, Photomasks, Lithography, Optical proximity correction, Instrument modeling, Optical lithography, Manufacturing, Model-based design, Inspection, Optimization (mathematics)

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70280Y (2008) https://doi.org/10.1117/12.793040
KEYWORDS: Atrial fibrillation, Optical proximity correction, Printing, Photomasks, Manufacturing, Scanners, Image segmentation, Process modeling, Optical lithography, Data modeling

Proceedings Article | 12 March 2008 Paper
Young-Chang Kim, Sangwook Kim, Sungsoo Suh, Yongjin Cheon, Sukjoo Lee, Junghyeon Lee, Seong-Woon Choi, Woosung Han, Sooryong Lee, Kyoil Koo
Proceedings Volume 6924, 69243Q (2008) https://doi.org/10.1117/12.773819
KEYWORDS: Optical proximity correction, Photomasks, Diffusion, Printing, Critical dimension metrology, Instrument modeling, Statistical modeling, Optical lithography, Semiconducting wafers, Polymers

Proceedings Article | 4 March 2008 Paper
Sungsoo Suh, Sukjoo Lee
Proceedings Volume 6925, 69251P (2008) https://doi.org/10.1117/12.774098
KEYWORDS: Lithography, Optical proximity correction, Calibration, Data modeling, Lithographic illumination, Image quality, Optical lithography, Critical dimension metrology, Image analysis, Optimization (mathematics)

Proceedings Article | 30 October 2007 Paper
Woosuk Shim, Sungsoo Suh, Frank Amoroso, Robert Lugg, Sooryung Lee, Sukjoo Lee, Seok-Hwan Oh, Junghyeon Lee, Tae-Hyuk Ahn, Chang-Jin Kang
Proceedings Volume 6730, 67302P (2007) https://doi.org/10.1117/12.747661
KEYWORDS: Optical proximity correction, SRAF, Photomasks, Data modeling, Semiconducting wafers, Lithography, Calibration, Process modeling, Printing, Inspection

Proceedings Article | 29 May 2007 Paper
Young-Chang Kim, Donghyun Kim, Insung Kim, Sangwook Kim, Sungsoo Suh, Yong-Jin Chun, Sukjoo Lee, Junghyeon Lee, Chang-Jin Kang, Jootae Moon, Kunal Taravade, Sooryong Lee
Proceedings Volume 6607, 66071M (2007) https://doi.org/10.1117/12.728969
KEYWORDS: Optical proximity correction, Stereolithography, Stray light, Convolution, Photomasks, Modulation transfer functions, Spatial light modulators, Semiconducting wafers, Image quality, Critical dimension metrology

Proceedings Article | 15 May 2007 Paper
Yong-Jin Chun, Sung-Woo Lee, Sooryong Lee, Young-Mi Lee, Sungsoo Suh, Suk-Joo Lee, Han-Ku Cho, Ho-Jin Park, Brad Falch
Proceedings Volume 6607, 660737 (2007) https://doi.org/10.1117/12.729026
KEYWORDS: Photomasks, Optical proximity correction, Nanoimprint lithography, Fiber optic illuminators, Image enhancement, Design for manufacturing, Critical dimension metrology, Semiconducting wafers, Lithography, Diffraction

Proceedings Article | 14 May 2007 Paper
Sungsoo Suh, Sangwook Kim, Sukjoo Lee, Youngchang Kim, Junghyeon Lee, Changjin Kang
Proceedings Volume 6607, 66071O (2007) https://doi.org/10.1117/12.728971
KEYWORDS: Optical proximity correction, Data modeling, Calibration, Image processing, Semiconducting wafers, Statistical modeling, Photomasks, Model-based design, Etching, Process modeling

Proceedings Article | 27 March 2007 Paper
Proceedings Volume 6520, 65203X (2007) https://doi.org/10.1117/12.711827
KEYWORDS: Optical proximity correction, Binary data, Photomasks, Chromium, Lithography, Data modeling, Computer simulations, Virtual reality, Scanners, Calibration

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65200R (2007) https://doi.org/10.1117/12.712171
KEYWORDS: 3D modeling, Photomasks, Data modeling, Optical proximity correction, Calibration, Binary data, Semiconducting wafers, Performance modeling, Systems modeling, Fourier transforms

Proceedings Article | 26 March 2007 Paper
Young-Chang Kim, Insung Kim, JeongGeun Park, Sangwook Kim, Sungsoo Suh, Yongjin Cheon, Sukjoo Lee, Junghyeon Lee, Chang-Jin Kang, Jootae Moon, Jonathan Cobb, Sooryong Lee
Proceedings Volume 6520, 65200T (2007) https://doi.org/10.1117/12.711832
KEYWORDS: Optical proximity correction, 3D modeling, Photomasks, Near field, Polarization, Chromium, 3D image processing, Transmittance, Binary data, Optical lithography

Proceedings Article | 21 March 2007 Paper
Sungsoo Suh, SukJoo Lee, Kyoung-yoon Back, Sook Lee, Youngchang Kim, Sangwook Kim, Yong-Jin Chun
Proceedings Volume 6521, 652103 (2007) https://doi.org/10.1117/12.711946
KEYWORDS: Photomasks, 3D modeling, Optical proximity correction, Molybdenum, Semiconducting wafers, Polarization, Critical dimension metrology, Diffraction, Instrument modeling, 3D image processing

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63493I (2006) https://doi.org/10.1117/12.686394
KEYWORDS: Optical proximity correction, Near field, Polarization, 3D modeling, Photomasks, Critical dimension metrology, Chromium, Binary data, Optical lithography, Transmittance

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61542E (2006) https://doi.org/10.1117/12.655026
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Electroluminescence, Logic devices, Tolerancing, Resolution enhancement technologies, Instrument modeling, Model-based design, Semiconductor manufacturing

Proceedings Article | 14 March 2006 Paper
Proceedings Volume 6156, 61560L (2006) https://doi.org/10.1117/12.655482
KEYWORDS: Optical proximity correction, Design for manufacturing, Photomasks, Semiconducting wafers, Visualization, Image quality, Lithography, Manufacturing, Image processing, Critical dimension metrology

Proceedings Article | 5 November 2005 Paper
Sungsoo Suh, Young-seog Kang, In-sung Kim, Sang-gyun Woo, Hanku Cho, Joo-tae Moon
Proceedings Volume 5992, 599220 (2005) https://doi.org/10.1117/12.632376
KEYWORDS: Optical proximity correction, Data modeling, Calibration, Semiconducting wafers, Reticles, Image processing, Process modeling, Photomasks, Signal processing, Model-based design

Proceedings Article | 10 May 2005 Paper
S. Suh, I. Kim, E. Lee, Y. Kang, S. Lee, S. Woo, H. Cho
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598698
KEYWORDS: Optical proximity correction, Scatterometry, Metrology, Data modeling, Semiconducting wafers, Critical dimension metrology, Model-based design, Optical testing, Inspection, Calibration

Showing 5 of 23 publications
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