Dr. Sung-Woo Lee Profile

Dr. Sung-Woo Lee

R&D Engineer at Synopsys Korea Inc

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 1 October 2013 Paper

Model-driven target optimization to resolve design hotspots through image quality enhancement

Sung-Woo Lee, Tom Cecil, Guangming Xiao, Mindy Lee, Jung-Hoe Choi, Seung-Hee Baek, Jin-Hyuck Jeon, Chan Ha Park, Dave Kim, Kevin Lucas

Proceedings Volume 8880, 88801U (2013) https://doi.org/10.1117/12.2026140

KEYWORDS: Optical proximity correction, Image quality, Optimization (mathematics), Nanoimprint lithography, Image enhancement, Image processing, Design for manufacturing, Resolution enhancement technologies, Neodymium, Nano opto mechanical systems

Read Abstract +

Proceedings Article | 12 April 2013 Paper

Mask compensation for process flare in 193nm very low k1 lithography

Jeonkyu Lee, Taehyeong Lee, Sangjin Oh, Chunsoo Kang, Jungchan Kim, Jaeseung Choi, Chanha Park, Hyunjo Yang, Donggyu Yim, Munhoe Do, Irene Su, Hua Song, Jung-Hoe Choi, Yongfa Fan, Anthony Wang, Sung-Woo Lee, Robert Boone, Kevin Lucas

Proceedings Volume 8683, 86830F (2013) https://doi.org/10.1117/12.2012463

KEYWORDS: Optical proximity correction, Lithography, Extreme ultraviolet, Transistors, Critical dimension metrology, Model-based design, 193nm lithography, Cadmium, Photomasks, Optical lithography

Read Abstract +

Proceedings Article | 23 March 2011 Paper

Enhancing fullchip ILT mask synthesis capability for IC manufacturability

Thomas Cecil, Chris Ashton, David Irby, Lan Luan, D. H. Son, Guangming Xiao, Xin Zhou, David Kim, Bob Gleason, H. J. Lee, W. J. Sim, M. J. Hong, S. G. Jung, S. S. Suh, S. W. Lee

Proceedings Volume 7973, 79731C (2011) https://doi.org/10.1117/12.882814

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Manufacturing, SRAF, Image segmentation, Inverse problems, Optimization (mathematics), Electronics, Electroluminescence

Read Abstract +

Proceedings Article | 29 September 2010 Paper

Improving model prediction accuracy for ILT with aggressive SRAFs

Sunggon Jung, Woojoo Sim, Moongyu Jeong, Junghoon Ser, Sungwoo Lee, Seoung-woon Choi, Xin Zhou, Lan Luan, Thomas Cecil, Donghwan Son, Robert Gleason, David Kim

Proceedings Volume 7823, 782311 (2010) https://doi.org/10.1117/12.864528

KEYWORDS: SRAF, Optical proximity correction, Scanning electron microscopy, Calibration, Diffusion, Photomasks, Lithography, Performance modeling, Cadmium sulfide, Critical dimension metrology

Read Abstract +

Proceedings Article | 22 March 2010 Paper

Comparison of OPC models with and without 3D-mask effect

Jung-Hoon Ser, Tae-Hoon Park, Moon-Gyu Jeong, Eun-Mi Lee, Sung-Woo Lee, Chun-Suk Suh, Seong-Woon Choi, Chan-Hoon Park, Joo-Tae Moon

Proceedings Volume 7640, 76401T (2010) https://doi.org/10.1117/12.848317

KEYWORDS: 3D modeling, Optical proximity correction, Photomasks, Cadmium, Semiconducting wafers, Scanning electron microscopy, Semiconductors, Electronics, Scanners, Lithography

Read Abstract +

Proceedings Article | 23 September 2009 Paper

Revisit to aberration: a simulation study of lens aberration induced overlay misalignment and its experimental validation

Hoyeon Kim, Sung-Woo Lee, Byeongcheol Lee, Sanghwa Lee, Kyoungyong Cho, Seong-Woon Choi, Chan-Hoon Park

Proceedings Volume 7488, 74883E (2009) https://doi.org/10.1117/12.833345

KEYWORDS: Semiconducting wafers, Overlay metrology, Projection systems, Scanners, Monochromatic aberrations, Lithography, Solids, Aberration correction, Metrology, Optical alignment

Read Abstract +

Proceedings Article | 11 May 2009 Paper

Model-based assist feature insertion for sub-40nm memory device

Sungsoo Suh, Suk-joo Lee, Seong-woon Choi, Sung-Woo Lee, Chan-hoon Park

Proceedings Volume 7379, 73792T (2009) https://doi.org/10.1117/12.824343

KEYWORDS: SRAF, Photomasks, Lithography, Optical proximity correction, Instrument modeling, Optical lithography, Manufacturing, Model-based design, Inspection, Optimization (mathematics)

Read Abstract +

Proceedings Article | 15 May 2007 Paper

Robust approach to determine the optimized illumination condition using process window analysis

Yong-Jin Chun, Sung-Woo Lee, Sooryong Lee, Young-Mi Lee, Sungsoo Suh, Suk-Joo Lee, Han-Ku Cho, Ho-Jin Park, Brad Falch

Proceedings Volume 6607, 660737 (2007) https://doi.org/10.1117/12.729026

KEYWORDS: Photomasks, Optical proximity correction, Nanoimprint lithography, Fiber optic illuminators, Image enhancement, Design for manufacturing, Critical dimension metrology, Semiconducting wafers, Lithography, Diffraction

Read Abstract +

Several criteria are applied to optimize the best illumination and bias condition for a layer. Normalized image log-slope (NILS) and mask error enhancement factor (MEEF) are promising candidates to simply decide the optimized condition. NILS represents imaging capability and MEEF represents the mask uniformity influence on wafer image. MEEF has inversely relationship with NILS, but the optimized point of NILS does not exactly coincide with that of MEEF. Besides NILS and MEEF, the depth of focus (DoF) is an important factor for defining the process margin. The process window (PW) is expressed by DoF and exposure Latitude (EL). PW is general parameter used to determine the best lithographic condition. Large EL can be obtained at the condition with good image performance. In order to include mask uniformity effect in PW analysis, the common PW overlapping the final layout with positive and negative biased layouts is adopted. Starting with the minimum NA, sigma and threshold, OPC is performed to satisfy the target layout using aerial image model, and the final OPCed layout is obtained. The positive and negative biased layouts are generated from the final OPCed layout. The bias limit is determined considering mask uniformity. The common PW obtained by overlapping the final layout with positive and negative biased layouts is calculated. Then, NA, sigma and threshold are increased until the maximum values are reached. The common PW at each NA, sigma and threshold value is obtained using the same flow sequence. Comparing among calculated PWs, the NA, sigma and threshold of the maximum PW can be chosen as the best illuminator and bias condition. In this paper, the optimized illumination and bias condition is determined using PW for 60 nm memory device. The process flow is implemented by an OPC tool. By using the OPC tool for the illuminator optimization, the actual layout and multiple monitoring points can be measured. In spite of a large number of calculations, the fast calculation speed can be obtained by using the distributed process.

Proceedings Article | 26 March 2007 Paper

Fast and accurate 3D mask model for full-chip OPC and verification

Peng Liu, Yu Cao, Luoqi Chen, Guangqing Chen, Mu Feng, Jiong Jiang, Hua-yu Liu, Sungsoo Suh, Sung-Woo Lee, Sukjoo Lee

Proceedings Volume 6520, 65200R (2007) https://doi.org/10.1117/12.712171

KEYWORDS: 3D modeling, Photomasks, Data modeling, Optical proximity correction, Calibration, Binary data, Semiconducting wafers, Performance modeling, Systems modeling, Fourier transforms

Read Abstract +

Proceedings Article | 20 October 2006 Paper

OPC to account for thick mask effect using simplified boundary layer model

Sangwook Kim, Young-Chang Kim, Sungsoo Suh, Sook Lee, Sungwoo Lee, Sukjoo Lee, Hanku Cho, Jootae Moon, Jonathan Cobb, Sooryong Lee

Proceedings Volume 6349, 63493I (2006) https://doi.org/10.1117/12.686394

KEYWORDS: Optical proximity correction, Near field, Polarization, 3D modeling, Photomasks, Critical dimension metrology, Chromium, Binary data, Optical lithography, Transmittance

Read Abstract +

Proceedings Article | 21 June 2006 Paper

Analysis method to determine and characterize the mask mean-to-target and uniformity specification

Sung-Woo Lee, Leonardus Leunissen, Jeroen Van de Kerkhove, Vicky Philipsen, Rik Jonckheere, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6281, 62810U (2006) https://doi.org/10.1117/12.692804

KEYWORDS: Photomasks, Critical dimension metrology, Tolerancing, Cadmium, Manufacturing, Semiconducting wafers, Polarization, Logic devices, Fiber optic illuminators, Mask making

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

Sang-Wook Kim, Sung-Woo Lee, Chang-Min Park, Soo-Han Choi, Young-Mi Lee, Yool Kang, Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536268

KEYWORDS: Optical proximity correction, Logic devices, Model-based design, Critical dimension metrology, Instrument modeling, Data modeling, Transistors, Resistance, Materials processing, Optical lithography

Read Abstract +

Proceedings Article | 24 May 2004 Paper

Assessments on process parameters' influences to the proximity correction

Eun-Mi Lee, Sung-Woo Lee, Doo-Youl Lee, Soo-Han Choi, Joo-On Park, Sung-Gon Jung, Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536341

KEYWORDS: Optical proximity correction, Critical dimension metrology, Atrial fibrillation, Cadmium, Resolution enhancement technologies, Data modeling, Logic devices, Photomasks, Line edge roughness, Scanning electron microscopy

Read Abstract +

Proceedings Article | 26 June 2003 Paper

Challenge for effective OCV control in 90-nm logic gate using ArF lithography

Hyun-Jae Kang, Sung-Woo Lee, Doo-Youl Lee, Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485472

KEYWORDS: Optical proximity correction, Lithography, Logic devices, Photoresist materials, Line edge roughness, Photomasks, Critical dimension metrology, Atrial fibrillation, Logic, Transistors

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Comprehensive approach to determining the specification for mask mean to target

Sung-Woo Lee, In-Sung Kim, Jung-Hyun Lee, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467479

KEYWORDS: Tolerancing, Critical dimension metrology, Photomasks, Electroluminescence, Cadmium, Diffusion, Convolution, Optical lithography, Semiconducting wafers, Scanners

Read Abstract +

Proceedings Article | 11 March 2002 Paper

Analysis of dry etch loading effect in mask fabrication

Jeong-Yun Lee, Sung-Yong Cho, Chang-Hwan Kim, Sung-Woo Lee, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458341

KEYWORDS: Etching, Chromium, Critical dimension metrology, Photomasks, Oxygen, Plasma etching, Dry etching, Mask making, Plasma, Optical proximity correction

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks

Sung-Woo Lee, Dong-Hoon Chung, In-Gyun Shin, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435775

KEYWORDS: Cadmium, Photomasks, Optical lithography, Tolerancing, Lithography, Phase shifts, Resolution enhancement technologies, Phase measurement, Quartz, Etching

Read Abstract +

Proceedings Article | 9 April 2001 Paper

Doubly exposed patterning characteristics using two alternating phase-shift masks

Sung-Woo Lee, In-Gyun Shin, Yonghoon Kim, Seong-Woon Choi, Woo-Sung Han, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425100

KEYWORDS: Photomasks, Optical lithography, Tolerancing, Lithography, Phase shifts, Cadmium, Resolution enhancement technologies, Critical dimension metrology, Manufacturing, Optical alignment

Read Abstract +

Showing 5 of 18 publications

Conference Committee Involvement (4)

Alternative Lithographic Technologies III

1 March 2011 | San Jose, California, United States

Alternative Lithographic Technologies II

23 February 2010 | San Jose, California, United States

Alternative Lithographic Technologies

24 February 2009 | San Jose, California, United States

Emerging Lithographic Technologies XII

26 February 2008 | San Jose, California, United States

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years