Mr. Tae-Joong Ha Profile

Tae-Joong Ha

Principal Engineer at TDNJ INC.

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Author

Publications (19)

Proceedings Article | 12 November 2024 Poster + Paper

Development of a porous patterned membrane with a large field size for EUV pellicles

Tae Joong Ha, Gi-sung Lee, Haneul Kim, Jungyeon Kim, Jinho Ahn

Proceedings Volume 13215, 132150V (2024) https://doi.org/10.1117/12.3033641

KEYWORDS: Porosity, Etching, Silicon, Pellicles, Extreme ultraviolet, Transmittance, Silicon nitride, Dry etching, Surface roughness, Semiconductors, Wet etching

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Proceedings Article | 23 October 2015 Paper

Novel CD control of HTPSM by advanced process for sub-20nm tech

Sangjin Jo, Chungseon Choi, Sunghyun Oh, Taejoong Ha, Youngmo Lee, Sangpyo Kim, Donggyu Yim

Proceedings Volume 9635, 96351T (2015) https://doi.org/10.1117/12.2196938

KEYWORDS: Critical dimension metrology, Etching, Chromium, Scanning electron microscopy, Photomasks, Transmission electron microscopy, Double patterning technology, Phase shifts, Image processing, Signal processing

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Proceedings Article | 29 October 2014 Paper

A method of utilizing AIMS to quantify lithographic performance of high transmittance mask

Chun Seon Choi, Dong Sik Jang, Sung Hyun Oh, Jae Cheon Shin, Byungho Nam, Tae Joong Ha, Sang Pyo Kim, Dong Gyu Yim

Proceedings Volume 9235, 92351R (2014) https://doi.org/10.1117/12.2066283

KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Nanoimprint lithography, Lithography, Binary data, Chromium, Etching, Image analysis, Extreme ultraviolet

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Proceedings Article | 17 October 2014 Paper

Particle reduction and control in EUV etching process

JeaYoung Jun, TaeJoong Ha, SangPyo Kim, DongGyu Yim

Proceedings Volume 9235, 92351E (2014) https://doi.org/10.1117/12.2066297

KEYWORDS: Etching, Extreme ultraviolet, Photomasks, Inspection, Particles, Plasma, Control systems, Manufacturing, Scanning electron microscopy, Plasma etching

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Proceedings Article | 9 September 2013 Paper

Analysis of EUV mask durability under various absorber etch conditions

Dong Wook Lee, Sang Jin Jo, Sung Hyun Oh, Tae Joong Ha, Sang Pyo Kim, Dong Gyu Yim

Proceedings Volume 8880, 88801Y (2013) https://doi.org/10.1117/12.2026206

KEYWORDS: Etching, Ruthenium, Photomasks, Reflectivity, Extreme ultraviolet, Multilayers, Semiconducting wafers, Ultraviolet radiation, Scanning probe microscopy, Transmission electron microscopy

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Proceedings Article | 8 November 2012 Paper

Advanced photomask fabrication process to increase pattern reliability for sub-20nm node

Dong Shin, Sang Jo, Hee Jang, Yun Hong, Dae Hwang, Chung Choi, Dong Jang, Ho Jung, Tae Ha, Sang Kim, Dong Yim

Proceedings Volume 8522, 85220R (2012) https://doi.org/10.1117/12.964974

KEYWORDS: Etching, Chromium, Photomasks, Particles, Critical dimension metrology, Inspection, Reliability, Optics manufacturing, Manufacturing

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Proceedings Article | 29 September 2010 Paper

Advanced mask CD MTT correction technique through improvement of CD measurement repeatability of CD SEM

Choong Han Ryu, Ho Yong Jung, Jea Young Jun, Tae Joong Ha, Chang Reol Kim, Oscar Han

Proceedings Volume 7823, 78232J (2010) https://doi.org/10.1117/12.864522

KEYWORDS: Critical dimension metrology, Chromium, Scanning electron microscopy, Etching, Dry etching, Image processing, Reliability, Electron beam lithography, Calibration, Photomasks

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Proceedings Article | 27 May 2010 Paper

Compensating for image placement errors for the HP 3X nm node

Eui Sang Park, Sang Pyo Kim, Tae Joong Ha, Chang Reol Kim

Proceedings Volume 7748, 77481E (2010) https://doi.org/10.1117/12.867721

KEYWORDS: Photomasks, Double patterning technology, Error analysis, Overlay metrology, Image registration, Pellicles, Electrons, Manufacturing, Scanners, Lithography

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Proceedings Article | 1 November 2007 Paper

Self-aligned resist patterning with 172nm and 193nm backside flood exposure on attenuated phase shift masks

Jun Chun, Taejoong Ha, Hoyong Jung, Sangjin Jo, Oscar Han

Proceedings Volume 6730, 673044 (2007) https://doi.org/10.1117/12.746638

KEYWORDS: Light sources, Quartz, Floods, Optical lithography, Phase shifts, Photoresist processing, Photomasks, Chromium, Transmittance, Optical properties

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Proceedings Article | 30 October 2007 Paper

The advanced mask CD MTT control using dry etch process for sub 65 nm tech

Sang Jin Jo, Ho Yong Jung, Dong Wook Lee, Jae Cheon Shin, Jea Young Jun, Tae Joong Ha, Oscar Han

Proceedings Volume 6730, 673008 (2007) https://doi.org/10.1117/12.746646

KEYWORDS: Etching, Chromium, Dry etching, Critical dimension metrology, Photomasks, Reliability, Electron beams, Scanning electron microscopy, Process control, Semiconductors

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Proceedings Article | 20 October 2006 Paper

Mask CD correction method using dry-etch process

Ho Yong Jung, Tae Joong Ha, Jae Cheon Shin, Ku Cheol Jeong, Young Kee Kim, Oscar Han

Proceedings Volume 6349, 63490B (2006) https://doi.org/10.1117/12.686537

KEYWORDS: Critical dimension metrology, Chromium, Etching, Dry etching, Photoresist processing, Photomasks, Reliability, Scanning electron microscopy, Phase shifts, Electron beam lithography

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Proceedings Article | 20 October 2006 Paper

Self-aligned resist patterning by backside flood exposure in photomask

Taejoong Ha, Byunggu Gyun, Oscar Han

Proceedings Volume 6349, 63494D (2006) https://doi.org/10.1117/12.686540

KEYWORDS: Optical lithography, Chromium, Quartz, Photomasks, Transmittance, Photoresist processing, Floods, Light sources, Positioning equipment, Photoresist materials

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Proceedings Article | 20 August 2004 Paper

Spin stream develop process for ZEP resist

Jaecheon Shin, Tae-Joong Ha, Bo-Kyung Choi, Oscar Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557710

KEYWORDS: Photomasks, Photoresist processing, Critical dimension metrology, Manufacturing, Semiconducting wafers, Phase shifts, Halftones, Mask making, Semiconductors, Electron beam lithography

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Proceedings Article | 20 August 2004 Paper

Improvement of develop loading effect in the FEP-171 process

Tae-Joong Ha, Young-Mo Lee, Bo Choi, Yongkyoo Choi, Oscar Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557709

KEYWORDS: Critical dimension metrology, Photomasks, Standards development, Error analysis, Photomask technology, Quartz, Semiconductors, Chemically amplified resists, Photoresist processing

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Proceedings Article | 17 December 2003 Paper

Mask patterning technology with KrF photomask repeater

Taejoong Ha, Munki Lim, Youngmo Lee, Bo-Kyung Choi, Yongkyoo Choi, Oscar Han

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518249

KEYWORDS: Photomasks, Optical proximity correction, Image processing, Image registration, Electron beam lithography, Mask making, Etching, Chromium, X-ray technology, Critical dimension metrology

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Proceedings Article | 26 June 2003 Paper

Enhancement of CD uniformity and throughput with KrF photomask repeater

Tae-Joong Ha, Yong-Kyoo Choi, Oscar Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485359

KEYWORDS: Photomasks, Image processing, Optical proximity correction, Mask making, Critical dimension metrology, Electron beam lithography, Photoresist processing, Image registration, X-ray technology, Contamination

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Proceedings Article | 27 December 2002 Paper

Enhancement of CD uniformity and throughput with KrF photomask repeater

Tae-Joong Ha, Yong-Kyoo Choi, Oscar Han

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467494

KEYWORDS: Photomasks, Image processing, Critical dimension metrology, Optical proximity correction, Mask making, Electron beam lithography, Photoresist processing, Contamination, Image registration, X-ray technology

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Proceedings Article | 30 July 2002 Paper

New photomask patterning method based on KrF stepper

Tae-Jung Ha, Yong-Kyoo Choi, Oscar Han

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474517

KEYWORDS: Photomasks, Critical dimension metrology, Electron beam lithography, Mask making, Contamination, Coating, Scanning electron microscopy, X-ray technology, Distortion, Photoresist processing

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Proceedings Article | 11 March 2002 Paper

New photomask patterning method based on KrF stepper

Tae-Jung Ha, Yong-Kyoo Choi, Oscar Han

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458329

KEYWORDS: Photomasks, Critical dimension metrology, Electron beam lithography, Mask making, Image registration, Contamination, Photoresist processing, Semiconducting wafers, Scanning electron microscopy, Coating

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Showing 5 of 19 publications

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